JPH0323304Y2 - - Google Patents

Info

Publication number
JPH0323304Y2
JPH0323304Y2 JP14560285U JP14560285U JPH0323304Y2 JP H0323304 Y2 JPH0323304 Y2 JP H0323304Y2 JP 14560285 U JP14560285 U JP 14560285U JP 14560285 U JP14560285 U JP 14560285U JP H0323304 Y2 JPH0323304 Y2 JP H0323304Y2
Authority
JP
Japan
Prior art keywords
reflected power
microwave
plasma generation
plasma
meter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14560285U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6256137U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14560285U priority Critical patent/JPH0323304Y2/ja
Publication of JPS6256137U publication Critical patent/JPS6256137U/ja
Application granted granted Critical
Publication of JPH0323304Y2 publication Critical patent/JPH0323304Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
JP14560285U 1985-09-24 1985-09-24 Expired JPH0323304Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14560285U JPH0323304Y2 (enrdf_load_stackoverflow) 1985-09-24 1985-09-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14560285U JPH0323304Y2 (enrdf_load_stackoverflow) 1985-09-24 1985-09-24

Publications (2)

Publication Number Publication Date
JPS6256137U JPS6256137U (enrdf_load_stackoverflow) 1987-04-07
JPH0323304Y2 true JPH0323304Y2 (enrdf_load_stackoverflow) 1991-05-21

Family

ID=31057294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14560285U Expired JPH0323304Y2 (enrdf_load_stackoverflow) 1985-09-24 1985-09-24

Country Status (1)

Country Link
JP (1) JPH0323304Y2 (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6256137U (enrdf_load_stackoverflow) 1987-04-07

Similar Documents

Publication Publication Date Title
US20060042546A1 (en) Plasma processing apparatus and controlling method therefor
JPS6457391A (en) Sensor and method for detecting changes in number of object
JPH0323304Y2 (enrdf_load_stackoverflow)
KR880004328A (ko) 용기내 물질의 레벨과 유동 검출 센서 및 그 방법
JPS61130485A (ja) 真空モニタ装置
JPS62136579A (ja) エツチング方法
US3586854A (en) Method of measuring the rate of evaporation in a vacuum,a gauge for carrying this method into effect,and an application of this method
JP2000019107A (ja) 紫外線吸収式のオゾン濃度測定方法及び装置
JPS6359233B2 (enrdf_load_stackoverflow)
JP2714035B2 (ja) エッチングの終点検出方法及び装置
JPS6223113A (ja) 終点検出方法
JPS59192904A (ja) 膜厚測定装置
JPH09229841A (ja) 匂い測定装置
JPH03272136A (ja) ドライエッチング装置
JPH0314229A (ja) 終点検出装置
JPH05121041A (ja) 高周波誘導結合プラズマ質量分析計
JPS60104244A (ja) 金属イオン検知器
JPH1183759A (ja) 濃度測定方法および装置
JPH065555A (ja) プラズマ装置
JPH10325818A (ja) Tmbガス検知器
JP2000258362A (ja) マイクロ波式濃度計
JPH0437400B2 (enrdf_load_stackoverflow)
JPS6466937A (en) On-site measurement of quantity of etching in rie device
JPH0136885Y2 (enrdf_load_stackoverflow)
JPH0240543A (ja) マイクロ波による水分測定方法