JPH032284B2 - - Google Patents

Info

Publication number
JPH032284B2
JPH032284B2 JP59075388A JP7538884A JPH032284B2 JP H032284 B2 JPH032284 B2 JP H032284B2 JP 59075388 A JP59075388 A JP 59075388A JP 7538884 A JP7538884 A JP 7538884A JP H032284 B2 JPH032284 B2 JP H032284B2
Authority
JP
Japan
Prior art keywords
light source
beam generating
image
light
reflecting mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59075388A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60218635A (ja
Inventor
Masakatsu Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59075388A priority Critical patent/JPS60218635A/ja
Publication of JPS60218635A publication Critical patent/JPS60218635A/ja
Priority to US06/919,377 priority patent/US4683524A/en
Publication of JPH032284B2 publication Critical patent/JPH032284B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
JP59075388A 1984-04-13 1984-04-13 照明装置 Granted JPS60218635A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59075388A JPS60218635A (ja) 1984-04-13 1984-04-13 照明装置
US06/919,377 US4683524A (en) 1984-04-13 1986-10-16 Illumination apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59075388A JPS60218635A (ja) 1984-04-13 1984-04-13 照明装置

Publications (2)

Publication Number Publication Date
JPS60218635A JPS60218635A (ja) 1985-11-01
JPH032284B2 true JPH032284B2 (US06373033-20020416-M00035.png) 1991-01-14

Family

ID=13574754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59075388A Granted JPS60218635A (ja) 1984-04-13 1984-04-13 照明装置

Country Status (2)

Country Link
US (1) US4683524A (US06373033-20020416-M00035.png)
JP (1) JPS60218635A (US06373033-20020416-M00035.png)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947030A (en) * 1985-05-22 1990-08-07 Canon Kabushiki Kaisha Illuminating optical device
JP2739712B2 (ja) * 1986-05-14 1998-04-15 キヤノン株式会社 照明光学系，焼付装置及び回路製造方法
US4939630A (en) * 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
US4719547A (en) * 1986-09-19 1988-01-12 Minnesota Mining And Manufacturing Company Illumination system for overhead projector
JPH0786647B2 (ja) * 1986-12-24 1995-09-20 株式会社ニコン 照明装置
US4918583A (en) * 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
US4953937A (en) * 1988-05-17 1990-09-04 Olympus Optical Co., Ltd. Illumination optical system
JP2696360B2 (ja) * 1988-10-28 1998-01-14 旭光学工業株式会社 照明光学装置
US4958263A (en) * 1988-11-02 1990-09-18 General Electric Company Centralized lighting system employing a high brightness light source
FR2641928B1 (fr) * 1989-01-17 1996-09-13 Thomson Csf Dispositif de projection d'images
US5218660A (en) * 1989-11-29 1993-06-08 Canon Kabushiki Kaisha Illumination device
JP2657957B2 (ja) * 1990-04-27 1997-09-30 キヤノン株式会社 投影装置及び光照射方法
JP3316936B2 (ja) * 1992-10-22 2002-08-19 株式会社ニコン 照明光学装置、露光装置、及び該露光装置を用いた転写方法
JP3316937B2 (ja) * 1992-11-24 2002-08-19 株式会社ニコン 照明光学装置、露光装置、及び該露光装置を用いた転写方法
US5339228A (en) * 1993-10-13 1994-08-16 Otis Elevator Company Escalator or moving walkway balustrade illumination
JP3239661B2 (ja) * 1994-12-27 2001-12-17 キヤノン株式会社 ノズルプレートの製造方法及び照明光学系
JP3082652B2 (ja) * 1994-12-27 2000-08-28 キヤノン株式会社 照明装置及びそれを用いたデバイスの製造方法
GB9601049D0 (en) * 1996-01-18 1996-03-20 Xaar Ltd Methods of and apparatus for forming nozzles
JP3950553B2 (ja) * 1998-06-30 2007-08-01 キヤノン株式会社 照明光学系及びそれを有する露光装置
US6208411B1 (en) 1998-09-28 2001-03-27 Kla-Tencor Corporation Massively parallel inspection and imaging system
US6867406B1 (en) * 1999-03-23 2005-03-15 Kla-Tencor Corporation Confocal wafer inspection method and apparatus using fly lens arrangement
JP5026788B2 (ja) * 2003-07-30 2012-09-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィの照明システム
CN105223681A (zh) * 2015-11-11 2016-01-06 沈阳理工大学 一种医用电子内窥镜聚光系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT939738B (it) * 1970-08-12 1973-02-10 Rank Organisation Ltd Dispositivo di illuminazione per la stampa fotolitografica dei componenti di microcircuiti
US3815493A (en) * 1972-10-02 1974-06-11 Johnson & Johnson Method and apparatus for embossing tubular items having an open end
US3988066A (en) * 1974-01-12 1976-10-26 Canon Kabushiki Kaisha Light exposure apparatus for printing
US4023904A (en) * 1974-07-01 1977-05-17 Tamarack Scientific Co. Inc. Optical microcircuit printing process
US3941475A (en) * 1974-07-01 1976-03-02 Tamarack Scientific Co., Inc. Optical microcircuit printing system
US3981590A (en) * 1975-08-28 1976-09-21 Amf Incorporated Optical system to optimize field of view uniformity in a multi-color produce sorter
US4241392A (en) * 1978-08-02 1980-12-23 Eastman Kodak Company Light deflector for use in illumination apparatus
FR2455299A1 (fr) * 1979-04-23 1980-11-21 Thomson Csf Illuminateur a lampe a arc et dispositif optique de transfert par projection comportant un tel illuminateur
JPS56813A (en) * 1979-06-15 1981-01-07 Chisso Corp Preparation of improved vinyl chloride resin
US4441817A (en) * 1980-07-29 1984-04-10 Diffracto Ltd. Electro-optical sensors with fiber optic bundles
FR2500201A1 (fr) * 1981-02-17 1982-08-20 Fuji Photo Optical Co Ltd Procede et appareil pour le retablissement de la transmittance optique d'un faisceau de fibres optiques apres reduction par une irradiation
JPS597359A (ja) * 1982-07-02 1984-01-14 Canon Inc 照明装置

Also Published As

Publication number Publication date
JPS60218635A (ja) 1985-11-01
US4683524A (en) 1987-07-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term