JPH0322689B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an apparatus for producing a liquid phase epitaxial growth solution for liquid phase epitaxial growth performed in the production of compound semiconductor devices such as semiconductor lasers.

BACKGROUND ART Conventionally, liquid phase epitaxial growth has been widely used in the production of compound semiconductor devices such as semiconductor lasers, but during growth, a predetermined amount of the necessary semiconductor material must be weighed. This weighing operation would be quite time-consuming if performed for each growth, so a jig as shown in Figure 5 is used to manufacture a large number of growth solutions from semiconductor materials at once (in particular Publication No. 1989-89411). In FIG. 5, 11 is a solution storage jig, 12 is a solution storage recess,
13 is an auxiliary solution storage jig, 14 is an auxiliary solution storage section, 15 is a solution reservoir, 16 is a growth solution, 17 is a slide rod for the auxiliary solution storage jig, and 18 is a slide rod for the solution reservoir. To explain the manufacturing process of the growth solution using FIG. 5, first, a predetermined amount of the necessary semiconductor material is charged into the solution reservoir 15, and the temperature is raised to a temperature higher than the saturation temperature to dissolve and mix to form the growth solution 16. (Figure 5a). After remaining in this state for a certain period of time,
The solution reservoir 15 is slid on the auxiliary solution storage jig 13 using the solution reservoir slide rod 18, and a portion of the growth solution 16 is distributed into the auxiliary solution storage section 14 (FIG. 5b). Next, the auxiliary solution storage jig 13 is slid using the auxiliary solution storage jig slide rod 17 so that the auxiliary solution storage part 14 is placed above the solution storage recess 12, and the growth in the auxiliary solution storage part 14 in the previous step is removed. A portion of the solution 16 is moved into the solution storage recess 12 (FIG. 5c). Next, use the slide rod 17 for the auxiliary solution storage jig to move the auxiliary solution storage jig 1 so that the auxiliary solution storage part is above and outside the solution storage recess 12.
3 and repeat the above steps to distribute the growth solution 16 in the solution reservoir 15 into the solution storage recess 12.

Problems to be Solved by the Invention In the manufacturing process described above, when the temperature is raised to the saturation temperature or higher and maintained for a certain period of time, the growth solution 16 in the solution reservoir 15 does not dissolve and mix completely and uniformly. Although the growth solution 16 is distributed little by little through the auxiliary solution storage part 14 so as not to cause variations in composition among the growth solutions to be distributed, it takes three It requires several sliding steps. These three sliding steps must be repeated many times to dispense everything, and as the amount of growth solution 16 increases, the number of repetitions increases and becomes more complicated. Furthermore, in the final sliding step where the distribution of the growth solution 16 is completed, the same amount is not necessarily distributed into each of the auxiliary solution storage sections 14, resulting in variations among the distributed growth solutions. This is a problem because it increases the variation in film thickness between the liquid phase epitaxially grown layers obtained using these growth solutions.

In order to solve the above-mentioned problems, the present invention reduces the number of sliding steps in the manufacturing process to eliminate complexity, has a uniform composition and no variation in weight, and is therefore advantageous when used. An object of the present invention is to provide a method for producing a liquid phase epitaxial growth solution in which the composition and film thickness are uniform between the liquid phase epitaxial growth layers.

Means for Solving the Problems The present invention includes a solution storage jig having a plurality of solution storage through holes, a solution storage jig that is slidable with respect to the solution storage jig, and is sandwiched from above and below, and the solution storage jig is sandwiched between the upper and lower parts. It has a plurality of upper through-holes and a lower recess corresponding to the plurality of solution storage through-holes, and also has a top removal part and a top drop receiving recess for removing the top of the growth solution of the semiconductor material charged in the solution reservoir. The above object is achieved by manufacturing a liquid phase epitaxial growth solution using a base and a solution reservoir that is slidable on the base and has a through hole in its lower part for distributing the solution.

Effects According to the above-mentioned structure, when the solution reservoir containing the growth solution is slid on the base, the top of the growth solution, which has a non-uniform composition, is removed through the top removal part of the base. In order to distribute the growth solution to the solution storage through holes of the solution storage jig, it is possible to eliminate variations in composition among the distributed growth solutions and by sliding the base with respect to the solution storage jig. In order to reliably store the growth solution in the full volume of the solution storage through-hole, the weight of each distributed growth solution can be made equal.

Embodiment An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a sectional view of a jig used in an embodiment of the present invention. 21 is a base, 22 is a solution storage jig, 23 is a solution reservoir, 24 is a growth solution, 25 is a solution storage jig support rod, 26 is a solution reservoir slide rod, 27 is a base slide rod, 28 is a substrate, 29 3 is a top plate, 30 is a through hole, 31 is a recess, 3
Reference numeral 2 denotes a sag removing portion, and 33 a sagging receiving recess. To explain the manufacturing process, first, in each positional relationship as shown in FIG. do. This is maintained for a certain period of time so that the composition of the growth solution becomes uniform. Generally, when a large amount of growth solution is charged, the composition does not become completely uniform over a certain period of time, and the position, particularly in the upper part of the solution, becomes non-uniform. In this embodiment, as explained in the following steps, the problem is solved by removing the top of the growth solution before distributing the growth solution in the solution reservoir to each solution storage through hole.

To explain the following process, the solution reservoir slide groove 2
6, slide the solution reservoir 23 as shown in FIG.
The growth solution is distributed to the recesses 31 provided in the substrate 28 of 1, and the growth is removed by the growth removal section 32 of the base 21 to the growth receiving recess 33 of the base 21. FIG. 3 shows a state in which the sliding of the solution reservoir 23 has been completed, and the growth solution 24 is dispensed as shown in the figure. When examining the weight of each individual growth solution distributed in this way, it is found that due to the slide speed of the solution reservoir 23 and the viscosity of the solution, a gap is created at the bottom, resulting in variations in the amount distributed and the weight cannot be distributed evenly. . However, in this example, the fourth
As shown in the figure, by sliding the base 21 with the base slide rod 27 and removing the upper and lower parts of the growth solution distributed as shown in Figure 3, the growth solution is filled to the full volume of the solution storage through hole. can be obtained. Each of the growth solutions obtained in the above manner has a uniform weight, and as mentioned above, the growth solution in the solution reservoir is distributed by removing the top layer that makes the composition of the solution non-uniform. Therefore, there was no variation in composition, and liquid phase epitaxial layers using these growth solutions were extremely uniform in both thickness and composition.

Effects of the Invention As described above, the present invention distributes the growth solution after removing the upper part of the growth solution, in particular where the composition is non-uniform, and further calculates the weight of the distributed growth solution based on the viscosity. Since it is possible to achieve uniformity by removing the space between the storage part and the gap, liquid-phase epitaxial growth using the growth solution produced using the present invention has a uniform composition and a uniform film thickness. A high-quality epitaxial layer with very little variation can be obtained with good reproducibility, and the solution manufacturing process of the present invention is easy, requiring only two sliding steps, and its effects are great.

[Brief explanation of drawings]

Fig. 1 is a cross-sectional view of a jig used in one embodiment of the present invention, Figs. 2 to 4 are diagrams explaining the manufacturing process using the jig shown in Fig. 1, and Fig. 5 is a cross-sectional view of a jig used in an embodiment of the present invention. It is a figure explaining the manufacturing process in the jig. 21... Base, 22... Solution storage jig, 23...
...Solution reservoir, 24...Growth solution, 25...Solution storage jig support rod, 26...Sliding rod for solution reservoir,
27... Base slide rod, 28... Board, 29...
...Upper plate, 30...Through hole, 31...Recess, 32...
... Swelling removal part, 33... Swelling receiving recessed part.

Claims (1)

[Scope of Claims] 1. A solution storage jig having a plurality of solution storage through holes, and an upper plate and a substrate that are slidable relative to the solution storage jig and sandwich the solution storage jig from above and below, A base having a plurality of through holes and recesses at positions corresponding to the plurality of solution storage through holes of the upper plate and the substrate, and a through hole for distributing a solution that is slidable on the upper plate. A liquid phase epitaxial growth solution manufacturing device having a solution reservoir. 2. The apparatus for manufacturing a liquid phase epitaxial growth solution according to claim 1, wherein the base has a top removal section for removing top of the growth solution of the semiconductor material charged in the solution reservoir.