JPH0318737B2 - - Google Patents
Info
- Publication number
- JPH0318737B2 JPH0318737B2 JP59269084A JP26908484A JPH0318737B2 JP H0318737 B2 JPH0318737 B2 JP H0318737B2 JP 59269084 A JP59269084 A JP 59269084A JP 26908484 A JP26908484 A JP 26908484A JP H0318737 B2 JPH0318737 B2 JP H0318737B2
- Authority
- JP
- Japan
- Prior art keywords
- transparent conductive
- conductive film
- etching
- temperature
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005530 etching Methods 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 7
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 6
- 229940071870 hydroiodic acid Drugs 0.000 claims description 5
- 238000000059 patterning Methods 0.000 claims description 3
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims description 3
- 230000001603 reducing effect Effects 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Of Electric Cables (AREA)
- Liquid Crystal (AREA)
- Weting (AREA)
- Light Receiving Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59269084A JPS61145529A (ja) | 1984-12-19 | 1984-12-19 | 透明電極パタ−ンの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59269084A JPS61145529A (ja) | 1984-12-19 | 1984-12-19 | 透明電極パタ−ンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61145529A JPS61145529A (ja) | 1986-07-03 |
| JPH0318737B2 true JPH0318737B2 (ko) | 1991-03-13 |
Family
ID=17467444
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59269084A Granted JPS61145529A (ja) | 1984-12-19 | 1984-12-19 | 透明電極パタ−ンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61145529A (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2644743B2 (ja) * | 1987-01-28 | 1997-08-25 | 株式会社日立製作所 | 液晶表示装置の製造方法 |
| JP2808480B2 (ja) * | 1990-07-18 | 1998-10-08 | キヤノン株式会社 | 液晶カラー表示素子用基板の製造方法 |
| JP4897148B2 (ja) * | 2001-03-29 | 2012-03-14 | 富士技研工業株式会社 | 透明導電膜のエッチング液 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5789480A (en) * | 1980-11-26 | 1982-06-03 | Seiko Epson Corp | Etchant for transparent electric conductive film |
-
1984
- 1984-12-19 JP JP59269084A patent/JPS61145529A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5789480A (en) * | 1980-11-26 | 1982-06-03 | Seiko Epson Corp | Etchant for transparent electric conductive film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61145529A (ja) | 1986-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4252841A (en) | Process for producing transparent conductive film | |
| US4238276A (en) | Process for producing liquid crystal display element | |
| KR20040028698A (ko) | 도전성 산화 주석 막의 패터닝 방법 | |
| JPH0859297A (ja) | 微細パターンを有するネサ膜の製造方法 | |
| US4093504A (en) | Method for producing electrically conductive indium oxide patterns on an insulating support by etching with hydrochloric acid and ferric chloride | |
| JP3611618B2 (ja) | 非晶質導電膜のパターニング方法 | |
| GB2032641A (en) | Electrochromic films having improved etch resistance and method for making same | |
| JPH0318737B2 (ko) | ||
| CA1104699A (en) | Method of forming matt display electrode | |
| KR101151952B1 (ko) | 인듐산화막의 식각용액 및 그 식각방법 | |
| JPS5826121B2 (ja) | 透明導電膜精密パタ−ン形成法 | |
| JPH05274917A (ja) | 酸化錫透明導電膜 | |
| JPH05270865A (ja) | 透明導電膜を有するガラス基板 | |
| JP3332409B2 (ja) | 透明導電膜を有するガラス基板 | |
| JPS5872922A (ja) | 液晶表示装置の製造方法 | |
| KR830001799B1 (ko) | 액정표시소자의 제조 방법 | |
| JPS5810722A (ja) | エレクトロクロミツク表示装置の製造方法 | |
| JPS61243613A (ja) | 透明導電層の形成方法 | |
| JPH11231335A (ja) | 埋設電極付き基板の製造方法 | |
| JPS6227154B2 (ko) | ||
| JPH07153332A (ja) | 透明電極の形成方法 | |
| JPS6058795B2 (ja) | Ｎｉ薄膜エツチング方法 | |
| JP2002150857A (ja) | 透明導電膜の処理方法および透明導電膜を備える基体 | |
| JPH0658476B2 (ja) | 液晶表示素子用基板の製造方法 | |
| JPS58194083A (ja) | 表示パネルの製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |