JPH0317905B2 - - Google Patents
Info
- Publication number
- JPH0317905B2 JPH0317905B2 JP29095985A JP29095985A JPH0317905B2 JP H0317905 B2 JPH0317905 B2 JP H0317905B2 JP 29095985 A JP29095985 A JP 29095985A JP 29095985 A JP29095985 A JP 29095985A JP H0317905 B2 JPH0317905 B2 JP H0317905B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- target material
- sputtering
- raw material
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013077 target material Substances 0.000 claims description 30
- 239000000843 powder Substances 0.000 claims description 28
- 239000002994 raw material Substances 0.000 claims description 19
- 238000004544 sputter deposition Methods 0.000 claims description 17
- 239000000956 alloy Substances 0.000 claims description 14
- 229910045601 alloy Inorganic materials 0.000 claims description 14
- 238000003754 machining Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 8
- 239000013013 elastic material Substances 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- 238000005245 sintering Methods 0.000 claims description 3
- 238000009694 cold isostatic pressing Methods 0.000 claims description 2
- 238000005477 sputtering target Methods 0.000 claims 5
- 238000003825 pressing Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 15
- 239000000203 mixture Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 238000005266 casting Methods 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000009849 vacuum degassing Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29095985A JPS62149827A (ja) | 1985-12-24 | 1985-12-24 | スパツタリング用タ−ゲツト材の製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29095985A JPS62149827A (ja) | 1985-12-24 | 1985-12-24 | スパツタリング用タ−ゲツト材の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62149827A JPS62149827A (ja) | 1987-07-03 |
| JPH0317905B2 true JPH0317905B2 (enrdf_load_stackoverflow) | 1991-03-11 |
Family
ID=17762671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29095985A Granted JPS62149827A (ja) | 1985-12-24 | 1985-12-24 | スパツタリング用タ−ゲツト材の製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62149827A (enrdf_load_stackoverflow) |
-
1985
- 1985-12-24 JP JP29095985A patent/JPS62149827A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62149827A (ja) | 1987-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3342898B2 (ja) | 硅素焼結体およびこれを用いて形成したウェハ保持用ボード、スパッタリングターゲットおよびシリコンウェハ | |
| TW201641727A (zh) | 磁性材濺鍍靶及其製造方法 | |
| JP4729253B2 (ja) | 一酸化けい素焼結体および一酸化けい素焼結ターゲット | |
| JP2757287B2 (ja) | タングステンターゲットの製造方法 | |
| JP2970813B2 (ja) | スパッタリングターゲットおよびその製造方法，およびそのターゲットを用いて形成された記録薄膜，光ディスク | |
| US3778261A (en) | Manufacturing composite articles | |
| JPH10183341A (ja) | タングステンまたはモリブデンターゲット | |
| JPS63227771A (ja) | 高純度チタンシリサイドからなるスパツタリング用タ−ゲツト及びその製造方法 | |
| JP4634567B2 (ja) | タングステンスパッタリングターゲットの製造方法 | |
| JPH0254733A (ja) | Ｔｉ焼結材料の製造方法 | |
| JPH0317905B2 (enrdf_load_stackoverflow) | ||
| JP3998972B2 (ja) | スパッタリング用タングステンターゲットの製造方法 | |
| KR20160050485A (ko) | 루테늄 또는 루테늄 합금계 스퍼터링 타겟의 제조방법 및 이로부터 제조된 루테늄 또는 루테늄 합금계 스퍼터링 타겟 | |
| JPS63162863A (ja) | スパツタリング用クロムタ−ゲツトの製造方法 | |
| JPS62148362A (ja) | スパツタリング用タ−ゲツト材の製造法 | |
| JPS61124565A (ja) | テルルまたはテルル合金タ−ゲツト材の製造方法 | |
| JPS6328987B2 (enrdf_load_stackoverflow) | ||
| JPS6058289B2 (ja) | 高クロム合金材の製造法 | |
| JP2725331B2 (ja) | ターゲット材の製造方法 | |
| JPH01309961A (ja) | Ｃｒ−Ｃｕターゲット材およびターゲット材の製造方法 | |
| JPS62114137A (ja) | 光記録用スパツタリングタ−ゲツトの製造方法 | |
| JP3837069B2 (ja) | スパッタリング用タングステンターゲットの製造方法 | |
| JPS6347344A (ja) | 低酸素合金成形体の製造法 | |
| JPH0119449B2 (enrdf_load_stackoverflow) | ||
| JPS62263939A (ja) | 合金タ−ゲツト材の製造法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |