JPH031759B2 - - Google Patents
Info
- Publication number
- JPH031759B2 JPH031759B2 JP59038827A JP3882784A JPH031759B2 JP H031759 B2 JPH031759 B2 JP H031759B2 JP 59038827 A JP59038827 A JP 59038827A JP 3882784 A JP3882784 A JP 3882784A JP H031759 B2 JPH031759 B2 JP H031759B2
- Authority
- JP
- Japan
- Prior art keywords
- memory cell
- transistor
- gate
- section
- capacitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003990 capacitor Substances 0.000 claims description 39
- 230000000694 effects Effects 0.000 claims description 4
- 230000004044 response Effects 0.000 claims description 2
- 230000003068 static effect Effects 0.000 description 15
- 230000010354 integration Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000005641 tunneling Effects 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C14/00—Digital stores characterised by arrangements of cells having volatile and non-volatile storage properties for back-up when the power is down
Landscapes
- Static Random-Access Memory (AREA)
- Read Only Memory (AREA)
- Dram (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59038827A JPS60185294A (ja) | 1984-03-02 | 1984-03-02 | 不揮発性ランダムアクセスメモリ装置 |
US06/659,191 US4630238A (en) | 1983-10-14 | 1984-10-09 | Semiconductor memory device |
EP91121355A EP0481532B1 (de) | 1983-10-14 | 1984-10-12 | Halbleiterspeicheranordnung |
EP84306978A EP0147019B1 (de) | 1983-10-14 | 1984-10-12 | Halbleiterspeicheranordnung |
DE3486418T DE3486418T2 (de) | 1983-10-14 | 1984-10-12 | Halbleiterspeicheranordnung |
DE8484306978T DE3486094T2 (de) | 1983-10-14 | 1984-10-12 | Halbleiterspeicheranordnung. |
KR8406376A KR900006190B1 (en) | 1983-10-14 | 1984-10-13 | Semiconductor memory device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59038827A JPS60185294A (ja) | 1984-03-02 | 1984-03-02 | 不揮発性ランダムアクセスメモリ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60185294A JPS60185294A (ja) | 1985-09-20 |
JPH031759B2 true JPH031759B2 (de) | 1991-01-11 |
Family
ID=12536062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59038827A Granted JPS60185294A (ja) | 1983-10-14 | 1984-03-02 | 不揮発性ランダムアクセスメモリ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60185294A (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62256296A (ja) * | 1986-04-30 | 1987-11-07 | Fujitsu Ltd | 半導体不揮発性記憶装置 |
JPH0227593A (ja) * | 1988-07-14 | 1990-01-30 | Sharp Corp | 半導体記憶装置 |
JPH07111836B2 (ja) * | 1988-08-05 | 1995-11-29 | セイコー電子工業株式会社 | 半導体不揮発性記憶装置およびその動作方法 |
-
1984
- 1984-03-02 JP JP59038827A patent/JPS60185294A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60185294A (ja) | 1985-09-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4924278A (en) | EEPROM using a merged source and control gate | |
US5140182A (en) | Plural stage voltage booster circuit with efficient electric charge transfer between successive stages | |
US4432072A (en) | Non-volatile dynamic RAM cell | |
US20030235095A1 (en) | Semiconductor memory device with an improved memory cell structure and method of operating the same | |
JP2002324400A (ja) | 半導体記憶装置のデータ書き込み方法及び半導体記憶装置 | |
JPH0568799B2 (de) | ||
US4630238A (en) | Semiconductor memory device | |
JPS6233672B2 (de) | ||
JPS5858759B2 (ja) | メモリ装置 | |
JPS58143494A (ja) | メモリ・アレイ | |
JPH0574948B2 (de) | ||
JP2500871B2 (ja) | 半導体不揮発性ram | |
JPH0154796B2 (de) | ||
JPH031759B2 (de) | ||
JPS5922317B2 (ja) | 半導体メモリ | |
JPH0415556B2 (de) | ||
JPH0130240B2 (de) | ||
JP2506159B2 (ja) | 半導体記憶装置 | |
JPH039559B2 (de) | ||
JPH033315B2 (de) | ||
JPH0379800B2 (de) | ||
JPH031760B2 (de) | ||
JPH0963283A (ja) | 半導体不揮発性メモリ素子およびその使用方法 | |
JPH11273367A (ja) | 半導体集積回路装置 | |
JP2648099B2 (ja) | 不揮発性半導体メモリ装置およびそのデータ消去方法 |