JPH03115658U - - Google Patents
Info
- Publication number
- JPH03115658U JPH03115658U JP1990024083U JP2408390U JPH03115658U JP H03115658 U JPH03115658 U JP H03115658U JP 1990024083 U JP1990024083 U JP 1990024083U JP 2408390 U JP2408390 U JP 2408390U JP H03115658 U JPH03115658 U JP H03115658U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- crucible
- electromagnet
- accelerated
- beam source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 8
- 238000010408 sweeping Methods 0.000 claims description 6
- 238000005566 electron beam evaporation Methods 0.000 claims description 5
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 4
- 238000004804 winding Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2408390U JPH0726359Y2 (ja) | 1990-03-09 | 1990-03-09 | 電子ビーム蒸着用電子銃 |
| US07/557,095 US5034590A (en) | 1989-08-02 | 1990-07-25 | Electron gun arrangement for use in the electron beam evaporation process |
| EP19900114411 EP0411482A3 (en) | 1989-08-02 | 1990-07-27 | Electron gun arrangement for use in the electron beam evaporation process |
| KR1019900011706A KR960005808B1 (ko) | 1989-08-02 | 1990-07-31 | 전자비임 증착용 전자총 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2408390U JPH0726359Y2 (ja) | 1990-03-09 | 1990-03-09 | 電子ビーム蒸着用電子銃 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03115658U true JPH03115658U (enExample) | 1991-11-29 |
| JPH0726359Y2 JPH0726359Y2 (ja) | 1995-06-14 |
Family
ID=31527057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2408390U Expired - Lifetime JPH0726359Y2 (ja) | 1989-08-02 | 1990-03-09 | 電子ビーム蒸着用電子銃 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0726359Y2 (enExample) |
-
1990
- 1990-03-09 JP JP2408390U patent/JPH0726359Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0726359Y2 (ja) | 1995-06-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US2717323A (en) | Electron beam centering apparatus | |
| JPH03115658U (enExample) | ||
| US4314218A (en) | Magnetic system for rearranging or regrouping charged particles within a pulsed beam | |
| JPS6256623B2 (enExample) | ||
| JPH0243866Y2 (enExample) | ||
| US5034590A (en) | Electron gun arrangement for use in the electron beam evaporation process | |
| JPH047650U (enExample) | ||
| US2457773A (en) | Deflecting coil | |
| JPS6223061Y2 (enExample) | ||
| SU741349A1 (ru) | Магнитна отклон юща система | |
| JPH0264200U (enExample) | ||
| JP2700687B2 (ja) | ウィグラー装置 | |
| JPH0762240B2 (ja) | 電子ビーム蒸着用電子銃 | |
| JPS63141549U (enExample) | ||
| JPH0297800U (enExample) | ||
| JPH0442037U (enExample) | ||
| JPS6433149U (enExample) | ||
| JPS642351U (enExample) | ||
| JPH0131257B2 (enExample) | ||
| JPS6169266U (enExample) | ||
| JPH0376353U (enExample) | ||
| KR970006871B1 (en) | Deflection yoke | |
| JPS5960954A (ja) | 電子ビ−ム露光装置 | |
| JPS6241372B2 (enExample) | ||
| JPH0440456U (enExample) |