JPH03115190A - 混晶組成比決定法 - Google Patents
混晶組成比決定法Info
- Publication number
- JPH03115190A JPH03115190A JP24511090A JP24511090A JPH03115190A JP H03115190 A JPH03115190 A JP H03115190A JP 24511090 A JP24511090 A JP 24511090A JP 24511090 A JP24511090 A JP 24511090A JP H03115190 A JPH03115190 A JP H03115190A
- Authority
- JP
- Japan
- Prior art keywords
- growth
- crystal
- image
- mixed crystal
- composition ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24511090A JPH03115190A (ja) | 1990-09-14 | 1990-09-14 | 混晶組成比決定法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24511090A JPH03115190A (ja) | 1990-09-14 | 1990-09-14 | 混晶組成比決定法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16912584A Division JPS61222986A (ja) | 1984-08-13 | 1984-08-13 | 結晶成長膜厚制御法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03115190A true JPH03115190A (ja) | 1991-05-16 |
| JPH0465033B2 JPH0465033B2 (enExample) | 1992-10-16 |
Family
ID=17128772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24511090A Granted JPH03115190A (ja) | 1990-09-14 | 1990-09-14 | 混晶組成比決定法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03115190A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0689230A3 (en) * | 1994-06-21 | 1996-07-03 | At & T Corp | Method for the growth of semiconductor layers with suitable lattice parameters |
-
1990
- 1990-09-14 JP JP24511090A patent/JPH03115190A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0689230A3 (en) * | 1994-06-21 | 1996-07-03 | At & T Corp | Method for the growth of semiconductor layers with suitable lattice parameters |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0465033B2 (enExample) | 1992-10-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |