JPH03108760A - Cmos gate array - Google Patents

Cmos gate array

Info

Publication number
JPH03108760A
JPH03108760A JP24716089A JP24716089A JPH03108760A JP H03108760 A JPH03108760 A JP H03108760A JP 24716089 A JP24716089 A JP 24716089A JP 24716089 A JP24716089 A JP 24716089A JP H03108760 A JPH03108760 A JP H03108760A
Authority
JP
Japan
Prior art keywords
transistor
ground
power supply
line
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24716089A
Other languages
Japanese (ja)
Inventor
Masao Takiguchi
雅雄 瀧口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP24716089A priority Critical patent/JPH03108760A/en
Publication of JPH03108760A publication Critical patent/JPH03108760A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits
    • H01L27/11803Masterslice integrated circuits using field effect technology
    • H01L27/11807CMOS gate arrays

Landscapes

  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To supply a power supply line and a ground line to a part of a traisistor line used as a wiring area and thereby to make it possible to use it as a transistor area by a method wherein a power supply and a ground potential supplied to a different transistor line are supplied to the part of the transistor line used as the wiring area. CONSTITUTION:In a totally-spread-over type CMOS gate array which has a plurality of transistor lines 5, and a first power source and ground zones 3 and 4 prepared beforehand irrespective of the presence or absence of transistors 1 and 2 disposed to construct a logic circuit 7 on the transistor lines 5, and at a right angle to the transistor lines 5, wirings 8 and 9 for supplying a power supply and a ground potential to a transistor line 10 located under a wiring area 6 not connected directly to the first power source and the ground zones 3 and 5 from the transistor lines 5 having a second power source 11 and a ground line 12 connected directly to the first power source and the ground zones 3 and 4 prepared beforehand, are provided. Since transistors in the wiring area 6 are made usable, according to this constitution, the degree of integration can be improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はCMOSゲートアレイに関し、特に全面敷き詰
め型CMOSゲートアレイにおいて集積度を上げるだめ
の配線構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a CMOS gate array, and more particularly to a wiring structure for increasing the degree of integration in a full-coverage CMOS gate array.

〔従来の技術〕[Conventional technology]

従来の全面敷き詰め型CMOSゲートアレイの構造の一
例を第2図に示して説明する。このゲートアレイは、そ
の平面構造を第2図に示すように、チップ内部全面にP
チャネルトランジスタ1とNチャネルトランジスタ2が
敷き詰められ、あらかじめ準備された第」の電源帯3を
介して第2の電源ライン11からPチャネルトランジス
タ1上に電位を供給し、第1のグランド帯4を介して第
2のグランドライン12からNチャネルトランジスタ2
上に電位を供給することにより使用可能となるトランジ
スタ列5と、第2の電源ライン11がらPチャネルトラ
ンジスタ1上に、第2のグランドライン12からNチャ
ネルトランジスタ2上に供給しない使用不可能なトラン
ジスタ上が、配線領域6として形成される。
An example of the structure of a conventional all-over CMOS gate array will be described with reference to FIG. As the planar structure of this gate array is shown in FIG.
Channel transistors 1 and N-channel transistors 2 are lined up, and a potential is supplied from the second power supply line 11 to the P-channel transistor 1 via a prepared "first power supply line 3", and the first ground band 4 is connected to the second power supply line 11. from the second ground line 12 through the N-channel transistor 2
The transistor array 5 becomes usable by supplying a potential to the top, and the second power supply line 11 connects the P-channel transistor 1 to the second ground line 12 to the N-channel transistor 2. A wiring region 6 is formed above the transistor.

そして、Pチャネルトランジスタ1とNチャネルトラン
ジスタ2の組を組み合わせることにょシーつの論理を持
つ論理回路7を構成し、この論理(1) (2) 回路Tを第1層配線8.第2層配線9等によシ結び付け
ることによシーつの機能回路を構成する。
A logic circuit 7 having the same logic is constructed by combining a pair of P-channel transistors 1 and N-channel transistors 2, and this logic (1) (2) circuit T is connected to the first layer wiring 8. By connecting it to the second layer wiring 9, etc., one functional circuit is constructed.

ここで、論理回路Tどうしを結び付ける第1層配線8等
の配線は、配線領域6上に形成し、配線領域6の幅は第
2の電源ライン11及びグランドライン12を配置され
たトランジスタ列5と他のトランジスタ列5に囲まれた
領域となる。また、この領域だけで配線できない場合は
、トランジスタ列上に、第2の電源ライン11、または
グランドライン12を配置せずにトランジスタ列10上
を配線領域6として配線領域幅を広げる。このため、配
線領域幅はPチャネルトランジスタ1.またはNチャネ
ルトランジスタ2のトランジスタ幅ごとに広がる。
Here, the wiring such as the first layer wiring 8 that connects the logic circuits T is formed on the wiring area 6, and the width of the wiring area 6 is equal to the width of the transistor array 5 on which the second power supply line 11 and the ground line 12 are arranged. This is a region surrounded by other transistor rows 5. In addition, if wiring cannot be done only in this area, the width of the wiring area is increased by setting the wiring area 6 above the transistor array 10 without arranging the second power supply line 11 or the ground line 12 on the transistor array. Therefore, the width of the wiring region is the same as that of P channel transistor 1. Alternatively, it expands by the transistor width of N-channel transistor 2.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の全面敷き詰め型CMOSゲートアレイは以上のよ
うに構成されていたので、配線領域6がトランジスタ幅
で広がシ、配線領域にもかかわらず配線に使用していな
い部分も6D、この部分のトランジスタは使用できなく
、また、配線領域6下のトランジスタ列をあらかじめ一
部使用することもでき々いなどの問題があった。
Since the conventional all-over CMOS gate array is configured as described above, the wiring area 6 is expanded by the width of the transistor, and even though it is a wiring area, the part not used for wiring is also 6D, and the transistor in this area is Further, there were problems such as the fact that a part of the transistor array under the wiring area 6 could not be used in advance.

本発明は上記のような問題点を解消するためになされた
もので、配線領域として使用されているトランジスタ列
の一部に電源ライン、グランドラインを供給しトランジ
スタ領域として使用できるCMOSゲートアレイを得る
ことを目的とする。
The present invention has been made to solve the above problems, and provides a CMOS gate array that can be used as a transistor region by supplying a power supply line and a ground line to a part of the transistor row used as a wiring region. The purpose is to

〔課題を解決するための手段〕[Means to solve the problem]

本発明に係るCMOSゲートアレイは、全面敷き詰め型
CMOSゲートアレイにおいて、異なるトランジスタ列
に供給された電源、グランド電位を配線領域として使用
されているトランジスタ列の一部に供給し、トランジス
タを形成するものである。
The CMOS gate array according to the present invention is an all-over type CMOS gate array in which power supply and ground potential supplied to different transistor rows are supplied to a part of the transistor row used as a wiring area to form transistors. It is.

〔作用〕[Effect]

本発明におけるCMOSゲートアレイは、配線領域で使
用されていないトランジスタに他のトランジスタ領域の
電源ライン、グランドラインから配線によって電位を与
えることによシ、その配線領域下のトランジスタが使用
可能になる。
In the CMOS gate array according to the present invention, the transistors under the wiring area can be used by applying a potential to the transistors that are not used in the wiring area from the power supply line and the ground line of other transistor areas through wiring.

〔実施例〕〔Example〕

以下、本発明の実施例を図について説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例によるCMOSゲートアレイ
の構造を示す平面図である。この実施例は、第1図に示
すように、トランジスタ列5が内部チップ全面に敷き詰
められておシ、Pチャネルトランジスタ1.Nチャネル
トランジスタ2にそれぞれ第1の電源帯3.グランド帯
4の電位の供給されている部分が使用可能なトランジス
タ列5を形成し、第1の電源帯3及びグランド帯4の電
位の供給されていない部分が配線領域6を形成する従来
のゲートアレイの配線領域として使用されているトラン
ジスタ列に、第1層配線8.第2層配線9等の配線によ
シ異なるトランジスタ列5に供給された第1の電源帯3
.グランド帯4の電位を供給することにより、配線され
ていない上記配線領域下6に使用可能なトランジスタ列
を形成して論理回路7を構成する。また、あらかじめ配
線領域6下の一部トランジスタ列10上に第1層配線8
第2層配線9等の配線によシ異なるトランジスタ列5に
供給された第1の電源帯3.グランド帯4の電位を供給
することによシ、部分的に使用可能なトランジスタ列を
形成した後、論理回路Tどうしの配線を行うようにした
ものである。
FIG. 1 is a plan view showing the structure of a CMOS gate array according to an embodiment of the present invention. In this embodiment, as shown in FIG. 1, transistor arrays 5 are spread over the entire surface of the internal chip, and P-channel transistors 1. A first power supply band 3. is connected to each N-channel transistor 2. A conventional gate in which a part of the ground band 4 to which a potential is supplied forms a usable transistor array 5, and a part of the first power supply band 3 and the ground band 4 to which a potential is not supplied forms a wiring region 6. The first layer wiring 8. The first power supply band 3 is supplied to different transistor arrays 5 depending on the wiring such as the second layer wiring 9.
.. By supplying the potential of the ground band 4, a usable transistor array is formed in the lower wiring area 6 where no wiring is provided, thereby configuring the logic circuit 7. In addition, the first layer wiring 8 is placed on a part of the transistor row 10 under the wiring area 6 in advance.
The first power supply band 3. is supplied to different transistor arrays 5 depending on the wiring such as the second layer wiring 9. By supplying the potential of the ground band 4, a partially usable transistor array is formed, and then the logic circuits T are interconnected.

このように上記実施例の構成によると、トランジスタ領
域の第1の電源帯3.グランド帯4に直接接続される第
2の電源ライン11及びグランドライン12を有するト
ランジスタ列5から第1の電源帯3及びグランド帯4に
直接接続されていない配線領域6下のトランジスタ列に
第1層配線8゜第2層配線9等によ)電源、グランド電
位を供給することによ)、配線領域6で使用されていな
いトランジスタが使用可能となる。これによって、集積
度を向上させることができる。
As described above, according to the configuration of the above embodiment, the first power supply band 3. The transistor row 5 having the second power supply line 11 and the ground line 12 directly connected to the ground band 4 is connected to the transistor row under the wiring area 6 which is not directly connected to the first power supply band 3 and the ground band 4. By supplying power and ground potential to the layer wiring 8 and the second layer wiring 9, etc., transistors not used in the wiring area 6 can be used. Thereby, the degree of integration can be improved.

〔発明の効果〕〔Effect of the invention〕

以上のように本発明によれば、従来使用できなかった配
線領域下のトランジスタ列に、他のトランジスタ列から
電源、グランド電位を配線によシ供給するように構成し
たので、集積度の高いCMOSゲートアレイが得られる
効果がある。
As described above, according to the present invention, the power supply and ground potential are supplied to the wiring from other transistor rows to the transistor row under the wiring area, which could not be used conventionally, so that the CMOS with high integration This has the effect of providing a gate array.

【図面の簡単な説明】[Brief explanation of drawings]

(5) (6) 第1図は本発明の一実施例によるCMOSゲートアレイ
を示す平面図、tJ2図は従来のCMOSゲートアレイ
を示す平面図である。 1−・・−pチャネルトランジスタ 211+111・
Nチャネルトランジスタ、3・・争・第1の電源帯、4
・・・・第1のグランド帯、5・・・・電源、グランド
ラインを有するトランジスタ列、6・・・・配線領域、
T・・−・論理回路、8・・・・第1層配線、9・・・
・第二層配線、10争・・・配線領域下のトランジスタ
列、11・・・・第2の電源ライン、12・・・φ第2
のグランドライン。
(5) (6) FIG. 1 is a plan view showing a CMOS gate array according to an embodiment of the present invention, and FIG. tJ2 is a plan view showing a conventional CMOS gate array. 1-...-p channel transistor 211+111・
N-channel transistor, 3, first power supply band, 4
...First ground band, 5...Transistor row having a power supply and ground line, 6...Wiring area,
T...Logic circuit, 8...First layer wiring, 9...
・Second layer wiring, 10th row...Transistor row under wiring area, 11...Second power supply line, 12...φ2nd
Grand line.

Claims (1)

【特許請求の範囲】[Claims] 複数のトランジスタ列と、上記トランジスタ列上に論理
回路を構成するために配置されるトランジスタの有無と
は無関係に、かつ上記トランジスタ列と直角に、あらか
じめ準備された第1の電源、及びグランド帯を有する全
面敷き詰め型CMOSゲートアレイにおいて、あらかじ
め準備された上記第1の電源、及びグランド帯に直接接
続される第2の電源、及びグランドラインを有する上記
トランジスタ列から第1の電源、及びグランド帯に直接
接続されていない配線領域下のトランジスタ列に電源、
グランド電位を供給するための配線を施したことを特徴
とするCMOSゲートアレイ。
A first power supply and a ground band prepared in advance are connected to a plurality of transistor rows and at right angles to the transistor rows, regardless of the presence or absence of transistors arranged on the transistor rows to form a logic circuit. In the fully-covered CMOS gate array, the first power source prepared in advance, a second power source directly connected to the ground band, and a ground line connected from the transistor array to the first power source and the ground band. Power supply to transistor columns under wiring areas that are not directly connected,
A CMOS gate array characterized by having wiring for supplying a ground potential.
JP24716089A 1989-09-22 1989-09-22 Cmos gate array Pending JPH03108760A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24716089A JPH03108760A (en) 1989-09-22 1989-09-22 Cmos gate array

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24716089A JPH03108760A (en) 1989-09-22 1989-09-22 Cmos gate array

Publications (1)

Publication Number Publication Date
JPH03108760A true JPH03108760A (en) 1991-05-08

Family

ID=17159334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24716089A Pending JPH03108760A (en) 1989-09-22 1989-09-22 Cmos gate array

Country Status (1)

Country Link
JP (1) JPH03108760A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308798A (en) * 1992-11-12 1994-05-03 Vlsi Technology, Inc. Preplacement method for weighted net placement integrated circuit design layout tools
EP0703617A2 (en) * 1994-09-22 1996-03-27 Nippon Telegraph And Telephone Corporation High frequency monolithic integrated circuit
US5847420A (en) * 1994-03-03 1998-12-08 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit having three wiring layers

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308798A (en) * 1992-11-12 1994-05-03 Vlsi Technology, Inc. Preplacement method for weighted net placement integrated circuit design layout tools
US5847420A (en) * 1994-03-03 1998-12-08 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit having three wiring layers
US6157052A (en) * 1994-03-03 2000-12-05 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit having three wiring layers
US6388329B1 (en) 1994-03-03 2002-05-14 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit having three wiring layers
EP0703617A2 (en) * 1994-09-22 1996-03-27 Nippon Telegraph And Telephone Corporation High frequency monolithic integrated circuit
EP0703617A3 (en) * 1994-09-22 1997-02-26 Nippon Telegraph & Telephone High frequency monolithic integrated circuit
US5739560A (en) * 1994-09-22 1998-04-14 Nippon Telegraph And Telephone Corporation High frequency masterslice monolithic integrated circuit

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