JPH0299959U - - Google Patents

Info

Publication number
JPH0299959U
JPH0299959U JP665789U JP665789U JPH0299959U JP H0299959 U JPH0299959 U JP H0299959U JP 665789 U JP665789 U JP 665789U JP 665789 U JP665789 U JP 665789U JP H0299959 U JPH0299959 U JP H0299959U
Authority
JP
Japan
Prior art keywords
electrode rod
vapor
substrate
vacuum container
vapor source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP665789U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP665789U priority Critical patent/JPH0299959U/ja
Publication of JPH0299959U publication Critical patent/JPH0299959U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本考案の一実施例を示す縦断面図、
第2図は、従来のものの例を示す縦断面図である
。 尚、図中12は蒸発源、13は電極棒、14は
絶縁ブツシユ、15は蒸発電源、16は回転ギヤ
、17はピニオン、18はモータ、19,20は
電流導入ブラシ、21は基板、22は回転導入端
子、23は真空容器である。
FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention;
FIG. 2 is a longitudinal sectional view showing an example of a conventional device. In the figure, 12 is an evaporation source, 13 is an electrode rod, 14 is an insulating bush, 15 is an evaporation power source, 16 is a rotating gear, 17 is a pinion, 18 is a motor, 19 and 20 are current introducing brushes, 21 is a substrate, 22 23 is a rotation introduction terminal, and 23 is a vacuum container.

Claims (1)

【実用新案登録請求の範囲】 真空容器内に電極棒を介して蒸気源を支持し、
同蒸気源から発生する蒸気を基板表面に蒸着させ
る真空蒸着装置において、 前記電極棒を前記真空容器に対し回転自在に設
置するとともにその周りに前記基板を固定設置可
能としたことを特徴とする真空蒸着装置。
[Claims for Utility Model Registration] Supporting a vapor source via an electrode rod within a vacuum container,
A vacuum evaporation apparatus for depositing vapor generated from the vapor source onto the surface of a substrate, characterized in that the electrode rod is rotatably installed in the vacuum container, and the substrate can be fixedly installed around the electrode rod. Vapor deposition equipment.
JP665789U 1989-01-24 1989-01-24 Pending JPH0299959U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP665789U JPH0299959U (en) 1989-01-24 1989-01-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP665789U JPH0299959U (en) 1989-01-24 1989-01-24

Publications (1)

Publication Number Publication Date
JPH0299959U true JPH0299959U (en) 1990-08-09

Family

ID=31211008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP665789U Pending JPH0299959U (en) 1989-01-24 1989-01-24

Country Status (1)

Country Link
JP (1) JPH0299959U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102421933A (en) * 2009-05-07 2012-04-18 韩商Snu精密股份有限公司 Thin film deposition apparatus and thin film deposition system comprising same
JP2012522137A (en) * 2009-03-31 2012-09-20 エスエヌユー プレシジョン カンパニー リミテッド Thin film deposition apparatus, thin film deposition method and thin film deposition system
JP2013533922A (en) * 2010-06-10 2013-08-29 エスエヌユー プレシジョン カンパニー リミテッド Thin film deposition apparatus and thin film deposition system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012522137A (en) * 2009-03-31 2012-09-20 エスエヌユー プレシジョン カンパニー リミテッド Thin film deposition apparatus, thin film deposition method and thin film deposition system
CN102421933A (en) * 2009-05-07 2012-04-18 韩商Snu精密股份有限公司 Thin film deposition apparatus and thin film deposition system comprising same
JP2012526199A (en) * 2009-05-07 2012-10-25 エスエヌユー プレシジョン カンパニー リミテッド Thin film deposition apparatus and thin film deposition system including the same
JP2013533922A (en) * 2010-06-10 2013-08-29 エスエヌユー プレシジョン カンパニー リミテッド Thin film deposition apparatus and thin film deposition system

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