JPH0374662U - - Google Patents
Info
- Publication number
- JPH0374662U JPH0374662U JP13415689U JP13415689U JPH0374662U JP H0374662 U JPH0374662 U JP H0374662U JP 13415689 U JP13415689 U JP 13415689U JP 13415689 U JP13415689 U JP 13415689U JP H0374662 U JPH0374662 U JP H0374662U
- Authority
- JP
- Japan
- Prior art keywords
- magnet
- plasma
- annular
- annular electrodes
- cylindrical base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Description
図は本考案ＣＶＤ装置の実施例を示し、第１図
は一実施例の縦断面図、第２図は円筒基体と多極
円筒磁石の回転を説明するための上面図、第３図
は多極円筒磁石と円筒基体との磁界分布との関係
を説明するための模式的断面図、第４図は他の実
施例の縦断面図、第５図は円筒基体の自公転を説
明するための上面図、第６図は多極円筒磁石の側
面図、第７図は更に他の実施例の縦断面図、第８
図は回転磁石の模式的断面図、第９図は回転磁石
と円筒基体との磁界分布との関係を説明するため
の上面図である。
１……反応容器、６……外側電極、７……内側
電極、８……円筒基体、２２，２２′……多極円
筒磁石、２９……回転磁石。
The figures show an embodiment of the CVD apparatus of the present invention. Fig. 1 is a longitudinal sectional view of one embodiment, Fig. 2 is a top view for explaining the rotation of the cylindrical base and the multipolar cylindrical magnet, and Fig. 3 is a multipolar cylindrical magnet. A schematic cross-sectional view for explaining the relationship between the magnetic field distribution between the polar cylindrical magnet and the cylindrical base, FIG. 4 is a longitudinal cross-sectional view of another embodiment, and FIG. 5 is a schematic cross-sectional view for explaining the rotation and revolution of the cylindrical base. 6 is a side view of a multipolar cylindrical magnet, FIG. 7 is a longitudinal sectional view of another embodiment, and FIG. 8 is a top view.
The figure is a schematic cross-sectional view of the rotating magnet, and FIG. 9 is a top view for explaining the relationship between the magnetic field distribution of the rotating magnet and the cylindrical base. DESCRIPTION OF SYMBOLS 1... Reaction container, 6... Outer electrode, 7... Inner electrode, 8... Cylindrical base, 22, 22'... Multipolar cylindrical magnet, 29... Rotating magnet.
Claims (1)
プラズマを発生させる一対の環状電極を有し、当
該環状電極間に成膜される膜を支持する円筒基体
を回転可能に保持すると共に、上記環状電極の中
心又は外側の少なくとも一方に磁石を設け、この
磁石による磁界分布を時間的に可変すべく当該磁
石を可動自在とすることを特徴とするプラズマＣ
ＶＤ装置。 It has a pair of annular electrodes that generate plasma concentrically between opposing sides in a reaction vessel that can be depressurized, rotatably holds a cylindrical base that supports a film to be formed between the annular electrodes, and A plasma C characterized in that a magnet is provided at least on either the center or the outside of the annular electrode, and the magnet is movable in order to temporally vary the magnetic field distribution caused by the magnet.
VD device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13415689U JPH0623571Y2 (en) | 1989-11-17 | 1989-11-17 | Plasma CVD equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13415689U JPH0623571Y2 (en) | 1989-11-17 | 1989-11-17 | Plasma CVD equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0374662U true JPH0374662U (en) | 1991-07-26 |
| JPH0623571Y2 JPH0623571Y2 (en) | 1994-06-22 |
Family
ID=31681515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13415689U Expired - Fee Related JPH0623571Y2 (en) | 1989-11-17 | 1989-11-17 | Plasma CVD equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0623571Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014169469A (en) * | 2013-03-01 | 2014-09-18 | Denso Corp | Vacuum film deposition device |
-
1989
- 1989-11-17 JP JP13415689U patent/JPH0623571Y2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014169469A (en) * | 2013-03-01 | 2014-09-18 | Denso Corp | Vacuum film deposition device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0623571Y2 (en) | 1994-06-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |