JPS6293365U - - Google Patents

Info

Publication number
JPS6293365U
JPS6293365U JP18154285U JP18154285U JPS6293365U JP S6293365 U JPS6293365 U JP S6293365U JP 18154285 U JP18154285 U JP 18154285U JP 18154285 U JP18154285 U JP 18154285U JP S6293365 U JPS6293365 U JP S6293365U
Authority
JP
Japan
Prior art keywords
target
ground electrode
electrode
insulating material
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18154285U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18154285U priority Critical patent/JPS6293365U/ja
Publication of JPS6293365U publication Critical patent/JPS6293365U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は本考案の一実施例のスパツタ
リング装置の構造を示す断面図である。 1…真空容器、2…絶縁物、3…ターゲツト、
4…ターゲツト電極、5…高周波電源、6…基板
、7…基板電極、9…絶縁カバー、10…絶縁物
1 and 2 are cross-sectional views showing the structure of a sputtering apparatus according to an embodiment of the present invention. 1... Vacuum container, 2... Insulator, 3... Target,
4... Target electrode, 5... High frequency power supply, 6... Substrate, 7... Substrate electrode, 9... Insulating cover, 10... Insulator.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ターゲツト電極およびターゲツトの近傍に接地
電極を有し、該ターゲツト電極およびターゲツト
と接地電極との間隔が放電が生じない距離である
か、または該間隙に石英等の絶縁物を設置する高
周波を用いたスパツタリング装置において接地電
極表面の周囲の少なくとも一部に放電が生じない
程度に近接して絶縁物を覆つたことを特徴とする
スパツタリング装置。
A target electrode and a ground electrode near the target are provided, and the distance between the target electrode and the ground electrode is such that no discharge occurs, or an insulating material such as quartz is installed in the gap. 1. A sputtering device characterized in that at least a portion of the periphery of a ground electrode surface is covered with an insulating material so close as to prevent generation of electric discharge.
JP18154285U 1985-11-27 1985-11-27 Pending JPS6293365U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18154285U JPS6293365U (en) 1985-11-27 1985-11-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18154285U JPS6293365U (en) 1985-11-27 1985-11-27

Publications (1)

Publication Number Publication Date
JPS6293365U true JPS6293365U (en) 1987-06-15

Family

ID=31126506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18154285U Pending JPS6293365U (en) 1985-11-27 1985-11-27

Country Status (1)

Country Link
JP (1) JPS6293365U (en)

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