JPH029115B2 - - Google Patents
Info
- Publication number
- JPH029115B2 JPH029115B2 JP57002915A JP291582A JPH029115B2 JP H029115 B2 JPH029115 B2 JP H029115B2 JP 57002915 A JP57002915 A JP 57002915A JP 291582 A JP291582 A JP 291582A JP H029115 B2 JPH029115 B2 JP H029115B2
- Authority
- JP
- Japan
- Prior art keywords
- rhodium
- bath
- acid
- pyridine
- phosphate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052703 rhodium Inorganic materials 0.000 claims description 20
- 239000010948 rhodium Substances 0.000 claims description 20
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 20
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 8
- DVECLMOWYVDJRM-UHFFFAOYSA-N pyridine-3-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CN=C1 DVECLMOWYVDJRM-UHFFFAOYSA-N 0.000 claims description 6
- 238000009713 electroplating Methods 0.000 claims description 5
- WMFZVLIHQVUVGO-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanol Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(O)C1=CC=CC=C1 WMFZVLIHQVUVGO-UHFFFAOYSA-N 0.000 claims description 5
- YWFDDXXMOPZFFM-UHFFFAOYSA-H rhodium(3+);trisulfate Chemical compound [Rh+3].[Rh+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O YWFDDXXMOPZFFM-UHFFFAOYSA-H 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 239000002932 luster Substances 0.000 claims description 3
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 2
- 239000000080 wetting agent Substances 0.000 claims description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 229910052697 platinum Inorganic materials 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910001514 alkali metal chloride Inorganic materials 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 231100000925 very toxic Toxicity 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3100997A DE3100997C2 (de) | 1981-01-15 | 1981-01-15 | Bad zum galvanischen Abscheiden von Rhodiumüberzügen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57137492A JPS57137492A (en) | 1982-08-25 |
| JPH029115B2 true JPH029115B2 (no) | 1990-02-28 |
Family
ID=6122621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57002915A Granted JPS57137492A (en) | 1981-01-15 | 1982-01-13 | Electroplating for precipitate rhodium film |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0056590B1 (no) |
| JP (1) | JPS57137492A (no) |
| BR (1) | BR8200158A (no) |
| DE (2) | DE3100997C2 (no) |
| HK (1) | HK51088A (no) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE323789T1 (de) * | 1999-12-23 | 2006-05-15 | Umicore Galvanotechnik Gmbh | Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür |
| US8372744B2 (en) * | 2007-04-20 | 2013-02-12 | International Business Machines Corporation | Fabricating a contact rhodium structure by electroplating and electroplating composition |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5224131A (en) * | 1975-08-14 | 1977-02-23 | Dowa Mining Co | Luster* thick rhodium plating method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3528895A (en) * | 1967-07-10 | 1970-09-15 | Sel Rex Corp | Plating low stress bright rhodium |
| US3671408A (en) * | 1971-05-25 | 1972-06-20 | Sel Rex Corp | Rhodium-platinum plating bath and process |
| DD109409A1 (no) * | 1974-01-31 | 1974-11-05 | ||
| DE2506467C2 (de) * | 1975-02-07 | 1986-07-17 | Schering AG, 1000 Berlin und 4709 Bergkamen | Bad und Verfahren zur galvanischen Abscheidung von Palladium-Nickel-Legierungen |
| EP0048929B1 (en) * | 1980-09-25 | 1987-12-09 | Nippon Mining Company Limited | Rhodium-plated article with black or blue color, process for making the same and bath therefor |
-
1981
- 1981-01-15 DE DE3100997A patent/DE3100997C2/de not_active Expired
-
1982
- 1982-01-09 DE DE8282100109T patent/DE3263183D1/de not_active Expired
- 1982-01-09 EP EP82100109A patent/EP0056590B1/de not_active Expired
- 1982-01-13 BR BR8200158A patent/BR8200158A/pt not_active IP Right Cessation
- 1982-01-13 JP JP57002915A patent/JPS57137492A/ja active Granted
-
1988
- 1988-07-07 HK HK510/88A patent/HK51088A/xx not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5224131A (en) * | 1975-08-14 | 1977-02-23 | Dowa Mining Co | Luster* thick rhodium plating method |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0056590B1 (de) | 1985-04-24 |
| DE3100997A1 (de) | 1982-08-05 |
| JPS57137492A (en) | 1982-08-25 |
| BR8200158A (pt) | 1982-11-03 |
| HK51088A (en) | 1988-07-15 |
| DE3263183D1 (en) | 1985-05-30 |
| EP0056590A1 (de) | 1982-07-28 |
| DE3100997C2 (de) | 1986-08-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA1292093C (en) | High-efficiency chromium plating bath with alkyl sulfonic acid for non-iridescent plate | |
| JPS6179799A (ja) | クロムメッキ方法 | |
| JP2007162123A (ja) | 亀裂のない耐食の硬質クロム及びクロム合金層の堆積方法 | |
| US3247082A (en) | Electrodeposition of a corrosion resistant coating | |
| US4384929A (en) | Process for electro-depositing composite nickel layers | |
| US4411965A (en) | Process for high speed nickel and gold electroplate system and article having improved corrosion resistance | |
| US4402802A (en) | Electrolytic bath for the deposition of rhodium coatings | |
| JP2781362B2 (ja) | クロムめっき製品の製造方法 | |
| US3183067A (en) | Metal having two coats of sulfurcontaining nickel and method of making same | |
| US5620583A (en) | Platinum plating bath | |
| JPS61190089A (ja) | 金／インジウム合金被膜を電気メツキによつて析出する浴 | |
| JPH029115B2 (no) | ||
| US4487665A (en) | Electroplating bath and process for white palladium | |
| JPS6021235B2 (ja) | コバルト−亜鉛合金電気メツキ浴組成物とメツキ方法 | |
| US4293620A (en) | Process for the deposition of thick chromium films from trivalent chromium plating solutions and article so produced | |
| JPS6223078B2 (no) | ||
| US4007099A (en) | Cathodic production of micropores in chromium | |
| US3620935A (en) | Process of black chromium plating | |
| US3753872A (en) | Method of and bath for producing microcrack chromium coatings | |
| US4549942A (en) | Process for electrodepositing composite nickel layers | |
| JPH05171468A (ja) | ニッケル−クロムめっき製品 | |
| US4828656A (en) | High performance electrodeposited chromium layers | |
| JP2022528163A (ja) | 無煙炭／黒色ロジウム／ルテニウム合金層の析出のための電解質 | |
| GB2094348A (en) | Electrolytic deposition of palladium nickel alloy | |
| US4927506A (en) | High-performance electrodeposited chromium layers formed at high current efficiencies |