JPH0290662U - - Google Patents
Info
- Publication number
- JPH0290662U JPH0290662U JP17079788U JP17079788U JPH0290662U JP H0290662 U JPH0290662 U JP H0290662U JP 17079788 U JP17079788 U JP 17079788U JP 17079788 U JP17079788 U JP 17079788U JP H0290662 U JPH0290662 U JP H0290662U
- Authority
- JP
- Japan
- Prior art keywords
- oven
- evaporation
- source
- separated
- introduction pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008020 evaporation Effects 0.000 claims description 10
- 238000001704 evaporation Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 6
- 238000005192 partition Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims 7
- 239000007787 solid Substances 0.000 claims 4
- 239000013078 crystal Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000005468 ion implantation Methods 0.000 claims 2
- 238000007740 vapor deposition Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17079788U JPH0290662U (enExample) | 1988-12-27 | 1988-12-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17079788U JPH0290662U (enExample) | 1988-12-27 | 1988-12-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0290662U true JPH0290662U (enExample) | 1990-07-18 |
Family
ID=31462051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17079788U Pending JPH0290662U (enExample) | 1988-12-27 | 1988-12-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0290662U (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009057614A (ja) * | 2007-09-03 | 2009-03-19 | Canon Inc | 蒸着装置及び蒸着方法 |
| JP2010121215A (ja) * | 2010-01-14 | 2010-06-03 | Semiconductor Energy Lab Co Ltd | 蒸着装置および蒸着方法 |
-
1988
- 1988-12-27 JP JP17079788U patent/JPH0290662U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009057614A (ja) * | 2007-09-03 | 2009-03-19 | Canon Inc | 蒸着装置及び蒸着方法 |
| JP2010121215A (ja) * | 2010-01-14 | 2010-06-03 | Semiconductor Energy Lab Co Ltd | 蒸着装置および蒸着方法 |
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