JPH028413B2 - - Google Patents
Info
- Publication number
- JPH028413B2 JPH028413B2 JP15449979A JP15449979A JPH028413B2 JP H028413 B2 JPH028413 B2 JP H028413B2 JP 15449979 A JP15449979 A JP 15449979A JP 15449979 A JP15449979 A JP 15449979A JP H028413 B2 JPH028413 B2 JP H028413B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- metal
- electron
- foil
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 87
- 239000011888 foil Substances 0.000 claims description 61
- 238000000034 method Methods 0.000 claims description 56
- 239000000463 material Substances 0.000 claims description 46
- 239000000758 substrate Substances 0.000 claims description 44
- 229910052751 metal Inorganic materials 0.000 claims description 41
- 239000002184 metal Substances 0.000 claims description 41
- 239000008188 pellet Substances 0.000 claims description 32
- 238000009825 accumulation Methods 0.000 claims description 16
- 239000003870 refractory metal Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 6
- 238000000206 photolithography Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000003486 chemical etching Methods 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 4
- CBFCDTFDPHXCNY-UHFFFAOYSA-N icosane Chemical group CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 claims description 4
- 239000012260 resinous material Substances 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 239000000020 Nitrocellulose Substances 0.000 claims description 3
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 3
- 239000000292 calcium oxide Substances 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 3
- 238000003801 milling Methods 0.000 claims description 3
- 229920001220 nitrocellulos Polymers 0.000 claims description 3
- 238000000227 grinding Methods 0.000 claims description 2
- 238000005498 polishing Methods 0.000 claims description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 16
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 12
- 239000011148 porous material Substances 0.000 description 12
- 239000001569 carbon dioxide Substances 0.000 description 8
- 229910002092 carbon dioxide Inorganic materials 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 230000004913 activation Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 239000010937 tungsten Substances 0.000 description 6
- 238000003466 welding Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 4
- 229910001863 barium hydroxide Inorganic materials 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
- H01J1/28—Dispenser-type cathodes, e.g. L-cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Solid Thermionic Cathode (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US96486778A | 1978-11-30 | 1978-11-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5576538A JPS5576538A (en) | 1980-06-09 |
JPH028413B2 true JPH028413B2 (enrdf_load_stackoverflow) | 1990-02-23 |
Family
ID=25509102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15449979A Granted JPS5576538A (en) | 1978-11-30 | 1979-11-30 | Dispensing cathode |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5576538A (enrdf_load_stackoverflow) |
CA (1) | CA1150763A (enrdf_load_stackoverflow) |
DE (2) | DE2954658C2 (enrdf_load_stackoverflow) |
GB (2) | GB2043991B (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56118242A (en) * | 1980-02-23 | 1981-09-17 | New Japan Radio Co Ltd | Thermion emission cathode |
JPS56130057A (en) * | 1980-03-18 | 1981-10-12 | Matsushita Electric Ind Co Ltd | Hot cathode |
JPS587740A (ja) * | 1981-06-30 | 1983-01-17 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | カソード用の電子放出層を形成する方法 |
DE3374738D1 (en) * | 1982-10-12 | 1988-01-07 | Hughes Aircraft Co | Method for fabricating a dispenser-reservoir housing for a dispenser cathode |
DE4114856A1 (de) * | 1991-05-07 | 1992-11-12 | Licentia Gmbh | Vorratskathode und verfahren zu deren herstellung |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2881512A (en) * | 1954-06-16 | 1959-04-14 | Cie Generale De Telegraphite S | Composition for sintered barium cathodes |
DE1071849B (enrdf_load_stackoverflow) * | 1955-02-05 | 1959-12-24 | ||
BE550302A (enrdf_load_stackoverflow) * | 1955-08-15 | |||
US2874077A (en) * | 1957-10-23 | 1959-02-17 | Rauland Corp | Thermionic cathodes |
US3159461A (en) * | 1958-10-20 | 1964-12-01 | Bell Telephone Labor Inc | Thermionic cathode |
NL108689C (enrdf_load_stackoverflow) * | 1959-01-23 | 1900-01-01 | ||
US3243638A (en) * | 1962-10-31 | 1966-03-29 | Gen Electric | Dispenser cathode |
DE2010479C3 (de) * | 1970-03-05 | 1973-11-22 | Siemens Ag, 1000 Berlin U. 8000 Muenchen | Metallkapillar Kathode mit gegen Luftfeuchtigkeit geschütztem porösem Emissionsstofftrager |
US4101800A (en) * | 1977-07-06 | 1978-07-18 | The United States Of America As Represented By The Secretary Of The Navy | Controlled-porosity dispenser cathode |
-
1979
- 1979-11-20 GB GB7940153A patent/GB2043991B/en not_active Expired
- 1979-11-20 GB GB8210616A patent/GB2100502B/en not_active Expired
- 1979-11-21 CA CA000340306A patent/CA1150763A/en not_active Expired
- 1979-11-28 DE DE19792954658 patent/DE2954658C2/de not_active Expired - Lifetime
- 1979-11-28 DE DE19792947919 patent/DE2947919A1/de active Granted
- 1979-11-30 JP JP15449979A patent/JPS5576538A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5576538A (en) | 1980-06-09 |
DE2947919C2 (enrdf_load_stackoverflow) | 1991-06-20 |
GB2100502B (en) | 1983-08-03 |
GB2043991A (en) | 1980-10-08 |
DE2947919A1 (de) | 1980-06-12 |
GB2043991B (en) | 1983-05-11 |
GB2100502A (en) | 1982-12-22 |
CA1150763A (en) | 1983-07-26 |
DE2954658C2 (enrdf_load_stackoverflow) | 1991-01-17 |
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