JPH0260048B2 - - Google Patents
Info
- Publication number
- JPH0260048B2 JPH0260048B2 JP9874585A JP9874585A JPH0260048B2 JP H0260048 B2 JPH0260048 B2 JP H0260048B2 JP 9874585 A JP9874585 A JP 9874585A JP 9874585 A JP9874585 A JP 9874585A JP H0260048 B2 JPH0260048 B2 JP H0260048B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- pores
- film
- titanium
- deposited film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 37
- 239000011148 porous material Substances 0.000 claims description 27
- 239000010936 titanium Substances 0.000 claims description 27
- 229910052719 titanium Inorganic materials 0.000 claims description 27
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 26
- 239000010406 cathode material Substances 0.000 claims description 18
- 239000003990 capacitor Substances 0.000 claims description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- 239000011888 foil Substances 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Electric Double-Layer Capacitors Or The Like (AREA)
- Primary Cells (AREA)
- Secondary Cells (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9874585A JPS6258609A (ja) | 1985-05-08 | 1985-05-08 | 電解コンデンサ用陰極材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9874585A JPS6258609A (ja) | 1985-05-08 | 1985-05-08 | 電解コンデンサ用陰極材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6258609A JPS6258609A (ja) | 1987-03-14 |
| JPH0260048B2 true JPH0260048B2 (enrdf_load_stackoverflow) | 1990-12-14 |
Family
ID=14228008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9874585A Granted JPS6258609A (ja) | 1985-05-08 | 1985-05-08 | 電解コンデンサ用陰極材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6258609A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2006013812A1 (ja) * | 2004-08-05 | 2008-05-01 | 松下電器産業株式会社 | コンデンサ用アルミニウム電極箔の製造方法およびエッチング用アルミニウム箔 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008166602A (ja) * | 2006-12-28 | 2008-07-17 | Sachiko Ono | 電解コンデンサ電極用アルミニウム材及びその製造方法、アルミニウム電解コンデンサ用電極材ならびにアルミニウム電解コンデンサ |
| JP5329686B2 (ja) * | 2012-02-03 | 2013-10-30 | 幸子 小野 | 電解コンデンサ電極用アルミニウム材及びその製造方法、アルミニウム電解コンデンサ用電極材ならびにアルミニウム電解コンデンサ |
-
1985
- 1985-05-08 JP JP9874585A patent/JPS6258609A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2006013812A1 (ja) * | 2004-08-05 | 2008-05-01 | 松下電器産業株式会社 | コンデンサ用アルミニウム電極箔の製造方法およびエッチング用アルミニウム箔 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6258609A (ja) | 1987-03-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |