JPH0259618B2 - - Google Patents

Info

Publication number
JPH0259618B2
JPH0259618B2 JP16146283A JP16146283A JPH0259618B2 JP H0259618 B2 JPH0259618 B2 JP H0259618B2 JP 16146283 A JP16146283 A JP 16146283A JP 16146283 A JP16146283 A JP 16146283A JP H0259618 B2 JPH0259618 B2 JP H0259618B2
Authority
JP
Japan
Prior art keywords
oxide film
silicon oxide
etching
conductor wiring
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16146283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6053051A (ja
Inventor
Ryoichi Hazuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP16146283A priority Critical patent/JPS6053051A/ja
Publication of JPS6053051A publication Critical patent/JPS6053051A/ja
Publication of JPH0259618B2 publication Critical patent/JPH0259618B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP16146283A 1983-09-02 1983-09-02 半導体装置の製造方法 Granted JPS6053051A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16146283A JPS6053051A (ja) 1983-09-02 1983-09-02 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16146283A JPS6053051A (ja) 1983-09-02 1983-09-02 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6053051A JPS6053051A (ja) 1985-03-26
JPH0259618B2 true JPH0259618B2 (enrdf_load_stackoverflow) 1990-12-13

Family

ID=15735562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16146283A Granted JPS6053051A (ja) 1983-09-02 1983-09-02 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6053051A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0889320A (ja) * 1994-09-26 1996-04-09 Masao Wakaizumi ネックレス等の止め金具

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0821572B2 (ja) * 1985-07-10 1996-03-04 ソニー株式会社 半導体装置の製造方法
US4789648A (en) * 1985-10-28 1988-12-06 International Business Machines Corporation Method for producing coplanar multi-level metal/insulator films on a substrate and for forming patterned conductive lines simultaneously with stud vias
US4767724A (en) * 1986-03-27 1988-08-30 General Electric Company Unframed via interconnection with dielectric etch stop
JPH1092810A (ja) * 1996-09-10 1998-04-10 Mitsubishi Electric Corp 半導体装置
JP2024028041A (ja) * 2022-08-19 2024-03-01 株式会社Sumco Ｓｏｉウェーハ及びその製造方法
JP2024031692A (ja) * 2022-08-26 2024-03-07 株式会社Sumco Ｓｏｉウェーハ及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0889320A (ja) * 1994-09-26 1996-04-09 Masao Wakaizumi ネックレス等の止め金具

Also Published As

Publication number Publication date
JPS6053051A (ja) 1985-03-26

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