JPH0259561U - - Google Patents
Info
- Publication number
- JPH0259561U JPH0259561U JP13842088U JP13842088U JPH0259561U JP H0259561 U JPH0259561 U JP H0259561U JP 13842088 U JP13842088 U JP 13842088U JP 13842088 U JP13842088 U JP 13842088U JP H0259561 U JPH0259561 U JP H0259561U
- Authority
- JP
- Japan
- Prior art keywords
- filament
- ion
- sample
- power supply
- neutralization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000006386 neutralization reaction Methods 0.000 claims description 7
- 238000000605 extraction Methods 0.000 claims description 4
- 230000001133 acceleration Effects 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims 13
- 238000010884 ion-beam technique Methods 0.000 claims 2
- 230000007246 mechanism Effects 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13842088U JPH0259561U (un) | 1988-10-24 | 1988-10-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13842088U JPH0259561U (un) | 1988-10-24 | 1988-10-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0259561U true JPH0259561U (un) | 1990-05-01 |
Family
ID=31400741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13842088U Pending JPH0259561U (un) | 1988-10-24 | 1988-10-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0259561U (un) |
-
1988
- 1988-10-24 JP JP13842088U patent/JPH0259561U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1356828B1 (en) | Sterilizing apparatus and method using the same | |
| TWI489513B (zh) | An ion bombardment device and a substrate surface cleaning method using the device | |
| JP2000054125A (ja) | 表面処理方法および装置 | |
| JPS596024B2 (ja) | イオン源用電源装置 | |
| EP0095311B1 (en) | Ion source apparatus | |
| US6285025B1 (en) | Source of fast neutral molecules | |
| JPH0259561U (un) | ||
| CA2011644A1 (en) | Vacuum switch apparatus | |
| WO2002019379A1 (en) | Device and process for producing dc glow discharge | |
| CA2220605A1 (en) | Ion source block filament with labyrinth conductive path | |
| RU96113928A (ru) | Способ импульсно-периодической ионной и плазменной обработки изделий и устройство для его осуществления | |
| JPH0620640A (ja) | イオン注入装置 | |
| JP4029495B2 (ja) | イオン源 | |
| JPH059315A (ja) | 表面処理装置 | |
| JPH0752635B2 (ja) | イオン源装置 | |
| JPH06124673A (ja) | イオン注入装置におけるプラズマ発生方法 | |
| JPS63279552A (ja) | イオンビ−ム照射装置 | |
| KR940025403A (ko) | 저에너지 중성입자빔의 생성방법 및 장치 | |
| JP3127636B2 (ja) | イオン源 | |
| JP2822528B2 (ja) | イオン源装置 | |
| JP3535402B2 (ja) | イオンビーム装置 | |
| JP2586836B2 (ja) | イオン源装置 | |
| JPH05136078A (ja) | イオン注入装置 | |
| JPS6453422A (en) | Dry etching device | |
| JPS57161060A (en) | Ion working device |