JPH0258769B2 - - Google Patents

Info

Publication number
JPH0258769B2
JPH0258769B2 JP8009381A JP8009381A JPH0258769B2 JP H0258769 B2 JPH0258769 B2 JP H0258769B2 JP 8009381 A JP8009381 A JP 8009381A JP 8009381 A JP8009381 A JP 8009381A JP H0258769 B2 JPH0258769 B2 JP H0258769B2
Authority
JP
Japan
Prior art keywords
solution
semiconductor substrate
chamber
reservoir
raw material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8009381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57196527A (en
Inventor
Keijiro Hirahara
Tadashi Komatsubara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP8009381A priority Critical patent/JPS57196527A/ja
Publication of JPS57196527A publication Critical patent/JPS57196527A/ja
Publication of JPH0258769B2 publication Critical patent/JPH0258769B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/06Reaction chambers; Boats for supporting the melt; Substrate holders
    • C30B19/063Sliding boat system

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP8009381A 1981-05-28 1981-05-28 Method and device for growing epitaxial layer of semiconductor crystal Granted JPS57196527A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8009381A JPS57196527A (en) 1981-05-28 1981-05-28 Method and device for growing epitaxial layer of semiconductor crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8009381A JPS57196527A (en) 1981-05-28 1981-05-28 Method and device for growing epitaxial layer of semiconductor crystal

Publications (2)

Publication Number Publication Date
JPS57196527A JPS57196527A (en) 1982-12-02
JPH0258769B2 true JPH0258769B2 (enrdf_load_stackoverflow) 1990-12-10

Family

ID=13708575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8009381A Granted JPS57196527A (en) 1981-05-28 1981-05-28 Method and device for growing epitaxial layer of semiconductor crystal

Country Status (1)

Country Link
JP (1) JPS57196527A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS57196527A (en) 1982-12-02

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