JPH0253781B2 - - Google Patents

Info

Publication number
JPH0253781B2
JPH0253781B2 JP54063155A JP6315579A JPH0253781B2 JP H0253781 B2 JPH0253781 B2 JP H0253781B2 JP 54063155 A JP54063155 A JP 54063155A JP 6315579 A JP6315579 A JP 6315579A JP H0253781 B2 JPH0253781 B2 JP H0253781B2
Authority
JP
Japan
Prior art keywords
sulfonic acid
photoresist
weight
acid
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP54063155A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54153577A (en
Inventor
Edowaado Bandaa Mei Jon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EICHI EMU SHII PATENTSU HOORUDEINGU CO Inc
Original Assignee
EICHI EMU SHII PATENTSU HOORUDEINGU CO Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/908,189 external-priority patent/US4165294A/en
Application filed by EICHI EMU SHII PATENTSU HOORUDEINGU CO Inc filed Critical EICHI EMU SHII PATENTSU HOORUDEINGU CO Inc
Publication of JPS54153577A publication Critical patent/JPS54153577A/ja
Publication of JPH0253781B2 publication Critical patent/JPH0253781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
    • C11D1/22—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • C11D3/3418—Toluene -, xylene -, cumene -, benzene - or naphthalene sulfonates or sulfates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP6315579A 1978-05-22 1979-05-22 Photoresist separator containing no phenol and chlorinated hydrocarbon Granted JPS54153577A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/908,189 US4165294A (en) 1976-11-08 1978-05-22 Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids

Publications (2)

Publication Number Publication Date
JPS54153577A JPS54153577A (en) 1979-12-03
JPH0253781B2 true JPH0253781B2 (en, 2012) 1990-11-19

Family

ID=25425341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6315579A Granted JPS54153577A (en) 1978-05-22 1979-05-22 Photoresist separator containing no phenol and chlorinated hydrocarbon

Country Status (6)

Country Link
JP (1) JPS54153577A (en, 2012)
CA (1) CA1116059A (en, 2012)
DE (1) DE2919666A1 (en, 2012)
FR (1) FR2426926B1 (en, 2012)
GB (1) GB2021285B (en, 2012)
IT (1) IT1165205B (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491530A (en) * 1983-05-20 1985-01-01 Allied Corporation Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper
CA1217690A (en) * 1983-07-07 1987-02-10 Clement K. Choy Hard surface acid cleaner
US4759867A (en) * 1983-07-07 1988-07-26 The Clorox Company Hard surface acid cleaner
US6943142B2 (en) * 2002-01-09 2005-09-13 Air Products And Chemicals, Inc. Aqueous stripping and cleaning composition
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates
WO2016142507A1 (en) * 2015-03-12 2016-09-15 AZ Electronic Materials (Luxembourg) S.à.r.l. Compositions and methods that promote charge complexing copper protection during low pka driven polymer stripping
CN114080571B (zh) 2019-07-11 2025-04-04 默克专利股份有限公司 光致抗蚀剂去除剂组合物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2454399C2 (de) * 1974-11-16 1981-09-24 Merck Patent Gmbh, 6100 Darmstadt Ablösemittel für Fotolacke
IT1125196B (it) * 1975-08-01 1986-05-14 Allied Chem Disassorbitore fotoresistivo privo di fenolo

Also Published As

Publication number Publication date
DE2919666A1 (de) 1979-11-29
GB2021285B (en) 1982-09-29
IT1165205B (it) 1987-04-22
IT7968069A0 (it) 1979-05-21
FR2426926B1 (fr) 1986-11-07
FR2426926A1 (fr) 1979-12-21
GB2021285A (en) 1979-11-28
JPS54153577A (en) 1979-12-03
CA1116059A (en) 1982-01-12
DE2919666C2 (en, 2012) 1987-09-10

Similar Documents

Publication Publication Date Title
US4165294A (en) Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4992108A (en) Photoresist stripping compositions
US5091103A (en) Photoresist stripper
US5334332A (en) Cleaning compositions for removing etching residue and method of using
US3871929A (en) Polymeric etch resist strippers and method of using same
US6949495B2 (en) Cleaning solution for removing residue
US6475292B1 (en) Photoresist stripping method
US4242218A (en) Phenol-free photoresist stripper
KR20020012141A (ko) 스트리핑 조성물
US6000411A (en) Cleaning compositions for removing etching residue and method of using
JP2631849B2 (ja) 剥離剤組成物
KR870000680B1 (ko) 포토레지스트 제거 탈막액조성물
KR100846057B1 (ko) 포토레지스트용 스트리퍼 조성물
US5863346A (en) Photoresist stripping composition
JPH0253781B2 (en, 2012)
US7183245B2 (en) Stripper for cured negative-tone isoprene-based photoresist and bisbenzocyclobutene coatings
CA1074219A (en) Phenol-free photoresist stripper
KR100794465B1 (ko) 포토레지스트용 스트리퍼 조성물
EP0258417A1 (en) Photoresist stripper composition and process of use
EP0843841B1 (en) Stripping composition
US20060043070A1 (en) High temperature functioning stripper for cured difficult to remove photoresist coatings
KR20090078524A (ko) 포토레지스트 잔류물 제거용 박리액 조성물 및 이를 이용한박리 방법
KR800000892B1 (ko) 중합성 내부식 탈막액 조성물
EP0043438A2 (en) Methylene chloride-methane sulfonic acid stripping compositions and methods for using same