GB2021285A - Phenol-free and Chlorinated Hydrocarbon-free Photoresist Stripper - Google Patents

Phenol-free and Chlorinated Hydrocarbon-free Photoresist Stripper

Info

Publication number
GB2021285A
GB2021285A GB7917616A GB7917616A GB2021285A GB 2021285 A GB2021285 A GB 2021285A GB 7917616 A GB7917616 A GB 7917616A GB 7917616 A GB7917616 A GB 7917616A GB 2021285 A GB2021285 A GB 2021285A
Authority
GB
United Kingdom
Prior art keywords
free
phenol
chlorinated hydrocarbon
carbons
halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7917616A
Other versions
GB2021285B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allied Corp
Original Assignee
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/908,189 external-priority patent/US4165294A/en
Application filed by Allied Chemical Corp filed Critical Allied Chemical Corp
Publication of GB2021285A publication Critical patent/GB2021285A/en
Application granted granted Critical
Publication of GB2021285B publication Critical patent/GB2021285B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/02—Anionic compounds
    • C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
    • C11D1/22—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • C11D3/3418—Toluene -, xylene -, cumene -, benzene - or naphthalene sulfonates or sulfates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

Stripping solutions, free from phenol and chlorinated hydrocarbon compounds, comprising a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and optionally a halogen-free aromatic hydrocarbon solvent with a boiling point above 150 DEG C. The solution can also contain a halogen-free aliphatic hydrocarbon solvent. The stripping compositions effectively remove organic polymeric substances e.g. photoresists, paints, varnishes, and fluxes, from inorganic substrates and are substantially clear water rinsable.
GB7917616A 1978-05-22 1979-05-21 Phenol-free and chlorinated hydrocarbon-free photoresist stripper Expired GB2021285B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/908,189 US4165294A (en) 1976-11-08 1978-05-22 Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids

Publications (2)

Publication Number Publication Date
GB2021285A true GB2021285A (en) 1979-11-28
GB2021285B GB2021285B (en) 1982-09-29

Family

ID=25425341

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7917616A Expired GB2021285B (en) 1978-05-22 1979-05-21 Phenol-free and chlorinated hydrocarbon-free photoresist stripper

Country Status (6)

Country Link
JP (1) JPS54153577A (en)
CA (1) CA1116059A (en)
DE (1) DE2919666A1 (en)
FR (1) FR2426926B1 (en)
GB (1) GB2021285B (en)
IT (1) IT1165205B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8231733B2 (en) * 2002-01-09 2012-07-31 Air Products And Chemicals, Inc. Aqueous stripping and cleaning composition
WO2016142507A1 (en) * 2015-03-12 2016-09-15 AZ Electronic Materials (Luxembourg) S.à.r.l. Compositions and methods that promote charge complexing copper protection during low pka driven polymer stripping
US11994803B2 (en) 2019-07-11 2024-05-28 Merck Patent Gmbh Photoresist remover compositions

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491530A (en) * 1983-05-20 1985-01-01 Allied Corporation Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper
CA1217690A (en) * 1983-07-07 1987-02-10 Clement K. Choy Hard surface acid cleaner
US4759867A (en) * 1983-07-07 1988-07-26 The Clorox Company Hard surface acid cleaner
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2454399C2 (en) * 1974-11-16 1981-09-24 Merck Patent Gmbh, 6100 Darmstadt Release agents for photoresists
IT1125196B (en) * 1975-08-01 1986-05-14 Allied Chem PHENORESISTIVE DEHABSORBOR FREE OF PHENOL

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8231733B2 (en) * 2002-01-09 2012-07-31 Air Products And Chemicals, Inc. Aqueous stripping and cleaning composition
WO2016142507A1 (en) * 2015-03-12 2016-09-15 AZ Electronic Materials (Luxembourg) S.à.r.l. Compositions and methods that promote charge complexing copper protection during low pka driven polymer stripping
US10613442B2 (en) 2015-03-12 2020-04-07 Merck Patent Gmbh Compositions and methods that promote charge complexing copper protection during low pKa driven polymer stripping
US11994803B2 (en) 2019-07-11 2024-05-28 Merck Patent Gmbh Photoresist remover compositions

Also Published As

Publication number Publication date
FR2426926B1 (en) 1986-11-07
JPH0253781B2 (en) 1990-11-19
JPS54153577A (en) 1979-12-03
DE2919666C2 (en) 1987-09-10
CA1116059A (en) 1982-01-12
GB2021285B (en) 1982-09-29
DE2919666A1 (en) 1979-11-29
IT1165205B (en) 1987-04-22
IT7968069A0 (en) 1979-05-21
FR2426926A1 (en) 1979-12-21

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19930521