JPH025302B2 - - Google Patents

Info

Publication number
JPH025302B2
JPH025302B2 JP57002120A JP212082A JPH025302B2 JP H025302 B2 JPH025302 B2 JP H025302B2 JP 57002120 A JP57002120 A JP 57002120A JP 212082 A JP212082 A JP 212082A JP H025302 B2 JPH025302 B2 JP H025302B2
Authority
JP
Japan
Prior art keywords
semiconductor
layer
field effect
effect transistor
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57002120A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58119671A (ja
Inventor
Noburo Hashizume
Yutaka Hayashi
Mutsuro Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP57002120A priority Critical patent/JPS58119671A/ja
Publication of JPS58119671A publication Critical patent/JPS58119671A/ja
Publication of JPH025302B2 publication Critical patent/JPH025302B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]

Landscapes

  • Junction Field-Effect Transistors (AREA)
JP57002120A 1982-01-09 1982-01-09 電界効果トランジスタ Granted JPS58119671A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57002120A JPS58119671A (ja) 1982-01-09 1982-01-09 電界効果トランジスタ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57002120A JPS58119671A (ja) 1982-01-09 1982-01-09 電界効果トランジスタ

Publications (2)

Publication Number Publication Date
JPS58119671A JPS58119671A (ja) 1983-07-16
JPH025302B2 true JPH025302B2 (enrdf_load_stackoverflow) 1990-02-01

Family

ID=11520485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57002120A Granted JPS58119671A (ja) 1982-01-09 1982-01-09 電界効果トランジスタ

Country Status (1)

Country Link
JP (1) JPS58119671A (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58170071A (ja) * 1982-03-31 1983-10-06 Nippon Telegr & Teleph Corp <Ntt> 電界効果トランジスタ
JPS5932173A (ja) * 1982-08-16 1984-02-21 Toshiba Corp 電界効果トランジスタの製造方法
US4583105A (en) * 1982-12-30 1986-04-15 International Business Machines Corporation Double heterojunction FET with ohmic semiconductor gate and controllable low threshold voltage
JPS60263475A (ja) * 1984-06-12 1985-12-26 Sony Corp 半導体装置
JPS60263476A (ja) * 1984-06-12 1985-12-26 Sony Corp 半導体装置の製法
US4729000A (en) * 1985-06-21 1988-03-01 Honeywell Inc. Low power AlGaAs/GaAs complementary FETs incorporating InGaAs n-channel gates
JPH0824131B2 (ja) * 1985-10-07 1996-03-06 株式会社日立製作所 電界効果トランジスタ
JP2659181B2 (ja) * 1986-05-08 1997-09-30 日本電気株式会社 半導体装置
JPH02111073A (ja) * 1988-10-20 1990-04-24 Fujitsu Ltd 絶縁ゲート電界効果トランジスタおよびその集積回路装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5161265A (en) * 1974-11-25 1976-05-27 Handotai Kenkyu Shinkokai 335 zokukagobutsuhandotaisoshi
FR2465317A2 (fr) * 1979-03-28 1981-03-20 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
JPS5851574A (ja) * 1981-09-22 1983-03-26 Fujitsu Ltd 半導体装置

Also Published As

Publication number Publication date
JPS58119671A (ja) 1983-07-16

Similar Documents

Publication Publication Date Title
US4755857A (en) Heterostructure semiconductor device
US4556895A (en) Field-effect transistor having a channel region of a Group III-V compound semiconductor and a Group IV semiconductor
TW201611276A (zh) 熱離子-過驅動穿隧場效應電晶體及其製造與操作方法
JP2003533887A (ja) 電荷キャリヤ抽出トランジスタ
US4825274A (en) Bi-CMOS semiconductor device immune to latch-up
TWI529935B (zh) 功率絕緣閘極場效電晶體
KR20130022852A (ko) 튜너블 배리어를 포함하는 그래핀 전계효과 트랜지스터를 구비한 인버터 논리소자
KR100542963B1 (ko) 전계 효과 트랜지스터
JP2000196089A (ja) 半導体装置
US20180012980A1 (en) Lateral insulated gate bipolar transistor
JPH024140B2 (enrdf_load_stackoverflow)
US4605945A (en) Semiconductor device
US7525136B2 (en) JFET device with virtual source and drain link regions and method of fabrication
US20220157978A1 (en) p-GaN HIGH ELECTRON MOBILITY TRANSISTOR
JPH025302B2 (enrdf_load_stackoverflow)
JPH084138B2 (ja) 半導体装置
US7772620B2 (en) Junction field effect transistor using a silicon on insulator architecture
JP2655594B2 (ja) 集積型半導体装置
US20250089343A1 (en) Power semiconductor device including silicon carbide (sic) semiconductor body
JPH0354868B2 (enrdf_load_stackoverflow)
JPH0459785B2 (enrdf_load_stackoverflow)
JP2827595B2 (ja) 半導体装置
JPH10107274A (ja) トンネルトランジスタ及びその製造方法
JPH04369272A (ja) 複合化ダイオード
JPH1050730A (ja) トンネルトランジスタおよびその製造方法