JPH025302B2 - - Google Patents
Info
- Publication number
- JPH025302B2 JPH025302B2 JP57002120A JP212082A JPH025302B2 JP H025302 B2 JPH025302 B2 JP H025302B2 JP 57002120 A JP57002120 A JP 57002120A JP 212082 A JP212082 A JP 212082A JP H025302 B2 JPH025302 B2 JP H025302B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- layer
- field effect
- effect transistor
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57002120A JPS58119671A (ja) | 1982-01-09 | 1982-01-09 | 電界効果トランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57002120A JPS58119671A (ja) | 1982-01-09 | 1982-01-09 | 電界効果トランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58119671A JPS58119671A (ja) | 1983-07-16 |
| JPH025302B2 true JPH025302B2 (cs) | 1990-02-01 |
Family
ID=11520485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57002120A Granted JPS58119671A (ja) | 1982-01-09 | 1982-01-09 | 電界効果トランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58119671A (cs) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58170071A (ja) * | 1982-03-31 | 1983-10-06 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果トランジスタ |
| JPS5932173A (ja) * | 1982-08-16 | 1984-02-21 | Toshiba Corp | 電界効果トランジスタの製造方法 |
| US4583105A (en) * | 1982-12-30 | 1986-04-15 | International Business Machines Corporation | Double heterojunction FET with ohmic semiconductor gate and controllable low threshold voltage |
| JPS60263476A (ja) * | 1984-06-12 | 1985-12-26 | Sony Corp | 半導体装置の製法 |
| JPS60263475A (ja) * | 1984-06-12 | 1985-12-26 | Sony Corp | 半導体装置 |
| US4729000A (en) * | 1985-06-21 | 1988-03-01 | Honeywell Inc. | Low power AlGaAs/GaAs complementary FETs incorporating InGaAs n-channel gates |
| JPH0824131B2 (ja) * | 1985-10-07 | 1996-03-06 | 株式会社日立製作所 | 電界効果トランジスタ |
| JP2659181B2 (ja) * | 1986-05-08 | 1997-09-30 | 日本電気株式会社 | 半導体装置 |
| JPH02111073A (ja) * | 1988-10-20 | 1990-04-24 | Fujitsu Ltd | 絶縁ゲート電界効果トランジスタおよびその集積回路装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5161265A (en) * | 1974-11-25 | 1976-05-27 | Handotai Kenkyu Shinkokai | 335 zokukagobutsuhandotaisoshi |
| FR2465317A2 (fr) * | 1979-03-28 | 1981-03-20 | Thomson Csf | Transistor a effet de champ a frequence de coupure elevee |
| JPS5851574A (ja) * | 1981-09-22 | 1983-03-26 | Fujitsu Ltd | 半導体装置 |
-
1982
- 1982-01-09 JP JP57002120A patent/JPS58119671A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58119671A (ja) | 1983-07-16 |
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