JPH0250076B2 - - Google Patents
Info
- Publication number
- JPH0250076B2 JPH0250076B2 JP57030196A JP3019682A JPH0250076B2 JP H0250076 B2 JPH0250076 B2 JP H0250076B2 JP 57030196 A JP57030196 A JP 57030196A JP 3019682 A JP3019682 A JP 3019682A JP H0250076 B2 JPH0250076 B2 JP H0250076B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon nitride
- powder
- sintered body
- volume
- sintering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000843 powder Substances 0.000 claims description 27
- 239000013078 crystal Substances 0.000 claims description 20
- 238000005245 sintering Methods 0.000 claims description 19
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 17
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 17
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 10
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 6
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 239000006185 dispersion Substances 0.000 claims description 5
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 4
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 3
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 claims description 3
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 238000005728 strengthening Methods 0.000 claims description 3
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 3
- 229910017083 AlN Inorganic materials 0.000 claims description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 2
- 229910004166 TaN Inorganic materials 0.000 claims description 2
- 238000010298 pulverizing process Methods 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 238000000465 moulding Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 230000009466 transformation Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 229910016384 Al4C3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- -1 Cr7C3 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910020056 Mg3N2 Inorganic materials 0.000 description 1
- 229910003178 Mo2C Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910034327 TiC Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000001272 pressureless sintering Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Ceramic Products (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57030196A JPS58151371A (ja) | 1982-02-25 | 1982-02-25 | 窒化珪素焼結体の製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57030196A JPS58151371A (ja) | 1982-02-25 | 1982-02-25 | 窒化珪素焼結体の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58151371A JPS58151371A (ja) | 1983-09-08 |
| JPH0250076B2 true JPH0250076B2 (ru) | 1990-11-01 |
Family
ID=12296991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57030196A Granted JPS58151371A (ja) | 1982-02-25 | 1982-02-25 | 窒化珪素焼結体の製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58151371A (ru) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4401589B4 (de) * | 1993-01-22 | 2005-03-17 | Ngk Insulators, Ltd., Nagoya | Siliziumnitridkeramik und Verfahren zur Herstellung der Nitridkeramik |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6027643A (ja) * | 1983-07-27 | 1985-02-12 | 株式会社日立製作所 | 高温構造部材 |
| US5178647A (en) * | 1983-07-29 | 1993-01-12 | Kabushiki Kaisha Toshiba | Wear-resistant member |
| JPS60131865A (ja) * | 1983-12-21 | 1985-07-13 | 株式会社東芝 | 窒化ケイ素セラミツクスの製造方法 |
| DE3423573A1 (de) * | 1984-06-27 | 1986-01-09 | Elektroschmelzwerk Kempten GmbH, 8000 München | Polykristalline sinterkoerper auf basis von siliciumnitrid und sinteradditiven |
| JPS6340711A (ja) * | 1986-08-06 | 1988-02-22 | Ngk Insulators Ltd | β型窒化珪素の製造法 |
| JPH0764640B2 (ja) * | 1986-12-24 | 1995-07-12 | 住友電気工業株式会社 | 切削工具用窒化ケイ素焼結体の製造方法 |
| JPH0764639B2 (ja) * | 1986-10-03 | 1995-07-12 | 住友電気工業株式会社 | 窒化ケイ素焼結体の製造方法 |
| JPS63235437A (ja) * | 1986-10-24 | 1988-09-30 | Ube Ind Ltd | β型窒化珪素ウイスカー成形体及びその製法 |
| EP0306001B1 (en) * | 1987-09-02 | 1992-11-11 | NGK Spark Plug Co. Ltd. | Silicon nitride sintered product |
| JPH0625039B2 (ja) * | 1988-07-08 | 1994-04-06 | 日本タングステン株式会社 | 窒化珪素質焼結体及びその製造方法 |
| JPH02255573A (ja) * | 1989-03-29 | 1990-10-16 | Natl Inst For Res In Inorg Mater | 高靭性窒化珪素焼結体の製造法 |
| US5096859A (en) * | 1990-02-09 | 1992-03-17 | Ngk Insulators, Ltd. | Silicon nitride sintered body and method of producing the same |
| JPH0699192B2 (ja) * | 1990-04-09 | 1994-12-07 | 科学技術庁無機材質研究所長 | 高靭性窒化けい素焼結体の製造法 |
| JP2927919B2 (ja) * | 1990-09-14 | 1999-07-28 | 本田技研工業株式会社 | 窒化珪素質焼結体の結晶化熱処理方法 |
| DE4038003C2 (de) * | 1990-11-29 | 1997-01-02 | Bayer Ag | Verfahren zur Herstellung von Sinterwerkstoffen auf Si¶3¶N¶4¶-Basis |
| JP2506519B2 (ja) * | 1991-09-25 | 1996-06-12 | 科学技術庁無機材質研究所長 | 低温・低圧焼結窒化ケイ素質焼結体の製造方法 |
| US5401450A (en) * | 1991-12-20 | 1995-03-28 | Nissan Motor Co., Ltd | β-silicon nitride sintered body and method of producing same |
| JP2602000B2 (ja) * | 1994-09-22 | 1997-04-23 | 株式会社東芝 | 被覆パターン形成用マスク |
| JP4497787B2 (ja) | 2002-04-04 | 2010-07-07 | 株式会社東芝 | 転動ボール |
| CN107245624A (zh) * | 2017-06-12 | 2017-10-13 | 长沙伟徽高科技新材料股份有限公司 | 一种五元固溶体及其制备方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53118409A (en) * | 1977-03-25 | 1978-10-16 | Tokyo Shibaura Electric Co | Method of manufacturing heat resistant material |
| JPS5527843A (en) * | 1978-08-16 | 1980-02-28 | Toshiba Corp | Production of silicon nitride ceramic powder material |
-
1982
- 1982-02-25 JP JP57030196A patent/JPS58151371A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53118409A (en) * | 1977-03-25 | 1978-10-16 | Tokyo Shibaura Electric Co | Method of manufacturing heat resistant material |
| JPS5527843A (en) * | 1978-08-16 | 1980-02-28 | Toshiba Corp | Production of silicon nitride ceramic powder material |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4401589B4 (de) * | 1993-01-22 | 2005-03-17 | Ngk Insulators, Ltd., Nagoya | Siliziumnitridkeramik und Verfahren zur Herstellung der Nitridkeramik |
| DE4401589C5 (de) * | 1993-01-22 | 2008-02-14 | Ngk Insulators, Ltd., Nagoya | Siliziumnitridkeramik und Verfahren zur Herstellung der Nitridkeramik |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58151371A (ja) | 1983-09-08 |
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