JPH0250064B2 - - Google Patents
Info
- Publication number
- JPH0250064B2 JPH0250064B2 JP8104082A JP8104082A JPH0250064B2 JP H0250064 B2 JPH0250064 B2 JP H0250064B2 JP 8104082 A JP8104082 A JP 8104082A JP 8104082 A JP8104082 A JP 8104082A JP H0250064 B2 JPH0250064 B2 JP H0250064B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- membrane
- porous
- glass tube
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 76
- 239000012528 membrane Substances 0.000 claims description 41
- 239000005373 porous glass Substances 0.000 claims description 33
- 238000007496 glass forming Methods 0.000 claims description 13
- 239000002994 raw material Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000005191 phase separation Methods 0.000 claims description 10
- 239000010419 fine particle Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 description 31
- 239000007789 gas Substances 0.000 description 24
- 229910004298 SiO 2 Inorganic materials 0.000 description 16
- 239000011148 porous material Substances 0.000 description 16
- 229910003902 SiCl 4 Inorganic materials 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 238000000926 separation method Methods 0.000 description 13
- 239000012071 phase Substances 0.000 description 12
- 238000000151 deposition Methods 0.000 description 9
- 230000008021 deposition Effects 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- 238000010306 acid treatment Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 229920000620 organic polymer Polymers 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- -1 C1 chemistry Chemical compound 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000003034 coal gas Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Glass Melting And Manufacturing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8104082A JPS58199745A (ja) | 1982-05-14 | 1982-05-14 | 管状多孔質ガラス膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8104082A JPS58199745A (ja) | 1982-05-14 | 1982-05-14 | 管状多孔質ガラス膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58199745A JPS58199745A (ja) | 1983-11-21 |
| JPH0250064B2 true JPH0250064B2 (enrdf_load_stackoverflow) | 1990-11-01 |
Family
ID=13735326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8104082A Granted JPS58199745A (ja) | 1982-05-14 | 1982-05-14 | 管状多孔質ガラス膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58199745A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61209012A (ja) * | 1985-03-13 | 1986-09-17 | Ngk Insulators Ltd | 分離膜の製造方法 |
| JPS61209004A (ja) * | 1985-03-13 | 1986-09-17 | Ngk Insulators Ltd | 分離膜及びその製造方法 |
| JP2002160941A (ja) * | 2000-11-22 | 2002-06-04 | Miyazaki Prefecture | ２層構造多孔質ガラス膜及びその製造方法 |
| JP4738163B2 (ja) * | 2005-12-22 | 2011-08-03 | Ｎｏｋ株式会社 | 無機複合中空管の製造方法 |
| JP4742852B2 (ja) * | 2005-12-22 | 2011-08-10 | Ｎｏｋ株式会社 | 無機複合中空管の製造方法 |
| JP5757186B2 (ja) * | 2011-07-25 | 2015-07-29 | 住友電気工業株式会社 | 流体分離材料及びその製造方法 |
-
1982
- 1982-05-14 JP JP8104082A patent/JPS58199745A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58199745A (ja) | 1983-11-21 |
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