JPH0247852B2 - - Google Patents

Info

Publication number
JPH0247852B2
JPH0247852B2 JP55035020A JP3502080A JPH0247852B2 JP H0247852 B2 JPH0247852 B2 JP H0247852B2 JP 55035020 A JP55035020 A JP 55035020A JP 3502080 A JP3502080 A JP 3502080A JP H0247852 B2 JPH0247852 B2 JP H0247852B2
Authority
JP
Japan
Prior art keywords
liquid
substrate
pattern
laser
liquid nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55035020A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56130930A (en
Inventor
Kazufumi Ogawa
Atsushi Shibata
Shigeru Watari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3502080A priority Critical patent/JPS56130930A/ja
Publication of JPS56130930A publication Critical patent/JPS56130930A/ja
Publication of JPH0247852B2 publication Critical patent/JPH0247852B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302—Non-deposition formation processes
    • H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6306—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Formation Of Insulating Films (AREA)
JP3502080A 1980-03-18 1980-03-18 Manufacture of semiconductor device Granted JPS56130930A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3502080A JPS56130930A (en) 1980-03-18 1980-03-18 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3502080A JPS56130930A (en) 1980-03-18 1980-03-18 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS56130930A JPS56130930A (en) 1981-10-14
JPH0247852B2 true JPH0247852B2 (https=) 1990-10-23

Family

ID=12430375

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3502080A Granted JPS56130930A (en) 1980-03-18 1980-03-18 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56130930A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6372881B2 (ja) * 2014-08-28 2018-08-15 国立大学法人九州大学 不純物導入方法及び半導体素子の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5178185A (https=) * 1974-12-28 1976-07-07 Mitsubishi Electric Corp
JPS51125698A (en) * 1975-04-03 1976-11-02 Mitsubishi Electric Corp The formation of silicon dioxide film
JPS5275181A (en) * 1975-12-13 1977-06-23 Sony Corp Formation of oxide film
JPS53116781A (en) * 1977-03-22 1978-10-12 Nec Corp Selective anodic oxidation method
JPS5538068A (en) * 1978-09-12 1980-03-17 Chiyou Lsi Gijutsu Kenkyu Kumiai Preparation of semiconductor device
JPS55105334A (en) * 1979-02-06 1980-08-12 Mitsubishi Electric Corp Method for surface treatment

Also Published As

Publication number Publication date
JPS56130930A (en) 1981-10-14

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