JPH0246597B2 - - Google Patents
Info
- Publication number
- JPH0246597B2 JPH0246597B2 JP61020315A JP2031586A JPH0246597B2 JP H0246597 B2 JPH0246597 B2 JP H0246597B2 JP 61020315 A JP61020315 A JP 61020315A JP 2031586 A JP2031586 A JP 2031586A JP H0246597 B2 JPH0246597 B2 JP H0246597B2
- Authority
- JP
- Japan
- Prior art keywords
- tris
- amine
- formula
- chr
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 22
- 150000001412 amines Chemical class 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- 239000007983 Tris buffer Substances 0.000 claims description 14
- XGLVDUUYFKXKPL-UHFFFAOYSA-N 2-(2-methoxyethoxy)-n,n-bis[2-(2-methoxyethoxy)ethyl]ethanamine Chemical compound COCCOCCN(CCOCCOC)CCOCCOC XGLVDUUYFKXKPL-UHFFFAOYSA-N 0.000 claims description 13
- 239000003513 alkali Substances 0.000 claims description 12
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 239000003054 catalyst Substances 0.000 claims description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 239000003352 sequestering agent Substances 0.000 claims description 8
- -1 3,6,9-trioxaundecyl Chemical group 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 150000004678 hydrides Chemical class 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- YLZHYYKWIIHFLZ-UHFFFAOYSA-N 2-(2-propoxyethoxy)-n,n-bis[2-(2-propoxyethoxy)ethyl]ethanamine Chemical compound CCCOCCOCCN(CCOCCOCCC)CCOCCOCCC YLZHYYKWIIHFLZ-UHFFFAOYSA-N 0.000 claims description 2
- AZBZSIZLBRMZFW-UHFFFAOYSA-N 2-[2-[2-(2-methoxyethoxy)ethoxy]ethoxy]-n,n-bis[2-[2-[2-(2-methoxyethoxy)ethoxy]ethoxy]ethyl]ethanamine Chemical compound COCCOCCOCCOCCN(CCOCCOCCOCCOC)CCOCCOCCOCCOC AZBZSIZLBRMZFW-UHFFFAOYSA-N 0.000 claims description 2
- QYOCMIVPWWBWGX-UHFFFAOYSA-N 2-methoxy-n,n-bis(2-methoxyethyl)ethanamine Chemical group COCCN(CCOC)CCOC QYOCMIVPWWBWGX-UHFFFAOYSA-N 0.000 claims 2
- RULYNRDLKTTWGC-UHFFFAOYSA-N 2-(2-butoxyethoxy)-n,n-bis[2-(2-butoxyethoxy)ethyl]ethanamine Chemical compound CCCCOCCOCCN(CCOCCOCCCC)CCOCCOCCCC RULYNRDLKTTWGC-UHFFFAOYSA-N 0.000 claims 1
- XZGIHWAIIZHXKX-UHFFFAOYSA-N 2-(2-ethoxyethoxy)-n,n-bis[2-(2-ethoxyethoxy)ethyl]ethanamine Chemical compound CCOCCOCCN(CCOCCOCC)CCOCCOCC XZGIHWAIIZHXKX-UHFFFAOYSA-N 0.000 claims 1
- HPRCCXIECBBMPJ-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]-n,n-bis[2-[2-(2-methoxyethoxy)ethoxy]ethyl]ethanamine Chemical compound COCCOCCOCCN(CCOCCOCCOC)CCOCCOCCOC HPRCCXIECBBMPJ-UHFFFAOYSA-N 0.000 claims 1
- CMGGYFAMOBSZDP-UHFFFAOYSA-N 2-[2-(2-propoxyethoxy)ethoxy]-n,n-bis[2-[2-(2-propoxyethoxy)ethoxy]ethyl]ethanamine Chemical compound CCCOCCOCCOCCN(CCOCCOCCOCCC)CCOCCOCCOCCC CMGGYFAMOBSZDP-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 20
- 229910000103 lithium hydride Inorganic materials 0.000 description 20
- 238000006722 reduction reaction Methods 0.000 description 19
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 description 14
- 239000011541 reaction mixture Substances 0.000 description 14
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 12
- 238000002347 injection Methods 0.000 description 12
- 239000007924 injection Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000460 chlorine Substances 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 239000012071 phase Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 239000012429 reaction media Substances 0.000 description 5
- 229910000104 sodium hydride Inorganic materials 0.000 description 5
- 238000004587 chromatography analysis Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 4
- 239000003507 refrigerant Substances 0.000 description 4
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 3
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 3
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910004721 HSiCl3 Inorganic materials 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 2
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 2
- 229940083124 ganglion-blocking antiadrenergic secondary and tertiary amines Drugs 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical group 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000005054 phenyltrichlorosilane Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000012312 sodium hydride Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 229910010082 LiAlH Inorganic materials 0.000 description 1
- 229910010084 LiAlH4 Inorganic materials 0.000 description 1
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- GTPDFCLBTFKHNH-UHFFFAOYSA-N chloro(phenyl)silicon Chemical compound Cl[Si]C1=CC=CC=C1 GTPDFCLBTFKHNH-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- JZZIHCLFHIXETF-UHFFFAOYSA-N dimethylsilicon Chemical compound C[Si]C JZZIHCLFHIXETF-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 239000004434 industrial solvent Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910012375 magnesium hydride Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical class [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0896—Compounds with a Si-H linkage
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR85.01486 | 1985-02-04 | ||
| FR8501486A FR2576902B1 (fr) | 1985-02-04 | 1985-02-04 | Procede de fabrication d'hydrogeno-silanes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61233692A JPS61233692A (ja) | 1986-10-17 |
| JPH0246597B2 true JPH0246597B2 (en, 2012) | 1990-10-16 |
Family
ID=9315891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61020315A Granted JPS61233692A (ja) | 1985-02-04 | 1986-02-03 | ヒドロゲノシランの製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4629801A (en, 2012) |
| EP (1) | EP0192528B1 (en, 2012) |
| JP (1) | JPS61233692A (en, 2012) |
| CA (1) | CA1258359A (en, 2012) |
| DE (1) | DE3663521D1 (en, 2012) |
| FR (1) | FR2576902B1 (en, 2012) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4824657A (en) * | 1985-11-27 | 1989-04-25 | E. I. Du Pont De Nemours And Company | Process for reducing silicon, germanium and tin halides |
| US4774347A (en) * | 1988-02-29 | 1988-09-27 | Dow Corning Corporation | Removal of chlorinated hydrocarbons from alkylsilanes |
| US4927616A (en) * | 1989-10-02 | 1990-05-22 | Ethyl Corporation | Preparation of silane and amine alanes |
| JP2551901B2 (ja) * | 1991-07-26 | 1996-11-06 | エフ エム シー コーポレーション | 接触アルキル化方法 |
| DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
| EP3684778B1 (en) * | 2017-09-20 | 2023-08-02 | Momentive Performance Materials Inc. | Integrated process for the manufacture of methylchlorohydridomonosilanes |
| EP3853235A1 (en) * | 2017-09-20 | 2021-07-28 | Momentive Performance Materials Inc. | Process for the production of organohydridochlorosilanes |
| CN120058769A (zh) * | 2023-11-28 | 2025-05-30 | 江苏南大光电材料股份有限公司 | 提高芳香基氯硅烷还原制备芳香基硅烷转化率的制备方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1473374A (fr) * | 1965-03-03 | 1967-03-17 | Ceskoslovenska Akademie Ved | Procédé pour la réduction de combinaisons d'halogéno-silicium |
| US4295986A (en) * | 1979-05-14 | 1981-10-20 | Gordon Roy G | Low temperature catalytic reduction |
| US4291167A (en) * | 1980-07-28 | 1981-09-22 | Nalco Chemical Company | Preparation of tetramethyldisilane from 1,2-tetramethyldichlorodisilane |
| JPS57196716A (en) * | 1981-05-29 | 1982-12-02 | Mitsubishi Metal Corp | Manufacture of monosilane |
| FR2552434B1 (fr) * | 1983-09-28 | 1985-10-25 | Rhone Poulenc Spec Chim | Procede de fabrication de silane a partir de methyldichlorosilane et de chlorosilanes |
-
1985
- 1985-02-04 FR FR8501486A patent/FR2576902B1/fr not_active Expired
-
1986
- 1986-01-29 DE DE8686400175T patent/DE3663521D1/de not_active Expired
- 1986-01-29 EP EP86400175A patent/EP0192528B1/fr not_active Expired
- 1986-02-03 JP JP61020315A patent/JPS61233692A/ja active Granted
- 1986-02-03 CA CA000500917A patent/CA1258359A/fr not_active Expired
- 1986-02-04 US US06/825,818 patent/US4629801A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0192528B1 (fr) | 1989-05-24 |
| EP0192528A1 (fr) | 1986-08-27 |
| FR2576902A1 (fr) | 1986-08-08 |
| JPS61233692A (ja) | 1986-10-17 |
| US4629801A (en) | 1986-12-16 |
| CA1258359A (fr) | 1989-08-15 |
| FR2576902B1 (fr) | 1987-02-13 |
| DE3663521D1 (en) | 1989-06-29 |
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