EP0192528B1 - Procédé de fabrication d'hydrogeno-silanes - Google Patents
Procédé de fabrication d'hydrogeno-silanes Download PDFInfo
- Publication number
- EP0192528B1 EP0192528B1 EP86400175A EP86400175A EP0192528B1 EP 0192528 B1 EP0192528 B1 EP 0192528B1 EP 86400175 A EP86400175 A EP 86400175A EP 86400175 A EP86400175 A EP 86400175A EP 0192528 B1 EP0192528 B1 EP 0192528B1
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- EP
- European Patent Office
- Prior art keywords
- formula
- tris
- amine
- equal
- process according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 238000000034 method Methods 0.000 title claims description 28
- -1 hydrogen silanes Chemical class 0.000 title claims description 27
- 239000001257 hydrogen Substances 0.000 title description 6
- 229910052739 hydrogen Inorganic materials 0.000 title description 6
- 150000001412 amines Chemical class 0.000 claims description 27
- 239000007983 Tris buffer Substances 0.000 claims description 26
- 230000009467 reduction Effects 0.000 claims description 22
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 239000003352 sequestering agent Substances 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 239000003054 catalyst Substances 0.000 claims description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 125000000524 functional group Chemical group 0.000 claims description 9
- 150000003254 radicals Chemical class 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 150000004678 hydrides Chemical class 0.000 claims description 7
- 229920000620 organic polymer Polymers 0.000 claims description 7
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 230000014759 maintenance of location Effects 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 3
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims 2
- 150000001340 alkali metals Chemical class 0.000 claims 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 2
- 150000001342 alkaline earth metals Chemical class 0.000 claims 2
- 238000006722 reduction reaction Methods 0.000 description 26
- 229910000103 lithium hydride Inorganic materials 0.000 description 23
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000012429 reaction media Substances 0.000 description 14
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 10
- 239000003513 alkali Substances 0.000 description 9
- 239000000460 chlorine Substances 0.000 description 9
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 9
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 8
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 7
- 238000005266 casting Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 6
- XGLVDUUYFKXKPL-UHFFFAOYSA-N 2-(2-methoxyethoxy)-n,n-bis[2-(2-methoxyethoxy)ethyl]ethanamine Chemical compound COCCOCCN(CCOCCOC)CCOCCOC XGLVDUUYFKXKPL-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 229910000095 alkaline earth hydride Inorganic materials 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 229910000104 sodium hydride Inorganic materials 0.000 description 5
- 230000009466 transformation Effects 0.000 description 5
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 229910004721 HSiCl3 Inorganic materials 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 230000001174 ascending effect Effects 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- 229910003828 SiH3 Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 239000005054 phenyltrichlorosilane Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 3
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 101100369068 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) TDA1 gene Proteins 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 2
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- JZZIHCLFHIXETF-UHFFFAOYSA-N dimethylsilicon Chemical compound C[Si]C JZZIHCLFHIXETF-UHFFFAOYSA-N 0.000 description 2
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 150000003335 secondary amines Chemical class 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 239000012312 sodium hydride Substances 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GCRPYRGGTDLAOS-UHFFFAOYSA-N 2-[bis(1-hydroxypropan-2-yl)amino]propan-1-ol Chemical compound OCC(C)N(C(C)CO)C(C)CO GCRPYRGGTDLAOS-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- AOJDZKCUAATBGE-UHFFFAOYSA-N bromomethane Chemical compound Br[CH2] AOJDZKCUAATBGE-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 239000004434 industrial solvent Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910012375 magnesium hydride Inorganic materials 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical class [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- PPDADIYYMSXQJK-UHFFFAOYSA-N trichlorosilicon Chemical compound Cl[Si](Cl)Cl PPDADIYYMSXQJK-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0896—Compounds with a Si-H linkage
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
Definitions
- the present invention relates to a process for the production of hydrogen silanes; it relates more particularly to the manufacture of monosilane.
- European Patent No. 86,191 also describes a process for the reduction of compound MX with a sodium hydride, the reducing agent used being a sodium hydroborate.
- Such compounds are already used in combination with an ionic mineral salt to catalyze the disproportionation and distribution reactions of haloalkalisanes, as described in European Patent No. 138,669.
- halosilanes which are used according to the process of the invention are those which have the formula R n H m SiX 4 ( n + m) in which n can have the values 0, 1, 2 or 3 and m the values 1, 2 or 3 and R, when it exists, is chosen from alkyl or aryl and / or alkoxy radicals and preferably the radicals: methyl, ethyl, propyl, isopropyl and / or phenyl, X is chosen from halogen and preferably represents chlorine and alkoxy groups and preferably represents methoxy or ethoxy groups.
- silicon tetrachloride, trichlorosilane, dichlorosilane, dimethyldichlorosilane, methylhydrogenodichlorosilane, diphenyldichlorosilane, phenyltrichlorosilane, methylphenyl dichlorosilane or methylphenyl dichlorosilane are used.
- the alkali or alkaline earth hydrides MHp used according to the invention are preferably chosen from: lithium hydride, sodium hydride, calcium hydride or magnesium hydride.
- the catalyst is a sequestering agent of formula: N- [CHR 1 -CHR 2 -O- (CHR 3 -CHR 4 -O) n -R 5 ] 3 (I) in which n is an integer greater than or equal to 0 and less than or equal to 10 (0 ⁇ n ⁇ 10), R 1 R 2 , R 3 and R 4 identical or different represent a hydrogen atom or an alkyl radical having from 1 to 4 carbon atoms and R s represents an alkyl or cycloalkyl radical having from 1 to 12 carbon atoms, a phenyl radical or a radical -CmH2m-0 or C m H 2m + 1 -0-, where m is between 1 and 12 (1 ⁇ m ⁇ 12).
- a sequestering agent of formula (I) is used in which Ri, R 2 , R 3 and R 4 represent a hydrogen atom or a methyl radical, Rs and n having the meaning former.
- n is greater than or equal to 0 and less than or equal to 6 and for which Rs represents an alkyl radical having from 1 to 4 carbon atoms.
- the amines used are known as such in the prior art.
- the French patent 1,302,365 cites the production of tertiary amines N- (CH 2 -CH 2 -O-CH 3 ) 3 and N- (CH 2 -CH 2 -0-CH 2 -CH 2 -O-CH 3 ) 3 as by-products of the synthesis of the corresponding primary and secondary amines, these primary and secondary amines being products of interest as intermediates for the synthesis of pharmaceutical substances, as corrosion inhibitors, as intermediates for the synthesis of chemicals of interest in agriculture and as emulsifiers.
- the sequestering agent can be grafted onto a crosslinked organic polymer, thus the present invention also relates to a process for the production of hydrogen silane by reduction of halosilane by an alkali hydride in a solvent.
- a catalyst characterized in that the catalyst is a grafted sequestering agent constituted by a crosslinked organic polymer support and by a plurality of functional groups, fixed on said support, of general formula: in which Ri, R2, R 3 , R 5 , R 6 and R 7, which are identical or different, are each a hydrogen atom or an alkyl radical having from 1 to 4 carbon atoms, R ' 5 and R' 8, which are identical or different, represent a hydrogen atom, an alkyl or cycloalkyl radical having from 1 to 12 carbon atoms, a phenyl radical, a -C q , H 2 q ' -0 ⁇ - or C q' H 2q '+ 1 -0 ⁇ - radical with q 'greater than or equal to 1 and less than or equal to about 12, and in which n', m ', and p' identical or different are greater than or equal to 1 and less than or equal to 10.
- a supported sequestering agent consisting of a crosslinked organic polymer support and by a plurality of functional groups attached to said support, of general formula (II) in which Ri, R2, R3, R 5 , R 6 and R 7 identical or different, represent a hydrogen atom or the methyl radical and R ' 5 and R 8 identical or different represent a hydrogen atom or an alkyl radical having from 1 to 4 carbon atoms.
- n ', m' and p ', identical or different are greater than or equal to 1 and less than or equal to 6.
- the support can be derived from any crosslinked organic polymer comprising groups which can be substituted by the functional groups of formula (II).
- organic polymers suitable for the present invention mention may be made of polymers derived from vinylaromatic compounds such as styrene, methylstyrene and copolymers of vinylaromatic compounds and of C 4 -C 6 conjugated dienes such as copolymers of styrene and butadiene and styrene and isoprene.
- polystyrene As the organic polymer, the crosslinking agent then being, according to a preferred embodiment, divinylbenzene.
- the cross-linking rate is an important factor. It is indeed necessary that the functional groups of formula (II) grafted onto the polystyrene are active. For this, it is necessary that the molecules of the solvent in which the sequestering agent supported will be used, in the applications specified below, penetrate inside the polymer. For this purpose, it is necessary that the degree of crosslinking is not too great in order not to prevent the penetration of the solvent and of the reagents. It is preferred to use a polystyrene whose crosslinking rate by divinylbenzene is less than about 10%. Even more preferably, the crosslinking rate is less than approximately 5%.
- the substitutable group is preferably chlorine or bromine of the chloro or bromo methyl radical - CH 2 CI or -CH 2 Br attached to the benzene nucleus of the polystyrene.
- the percentage of benzene nuclei of the polystyrene carrying a functional group is greater than 5%. Even more preferably, this percentage is greater than 10%.
- Preferred supported sequestering agents can be represented by the following formula: derived from chloro or methyl bromo polystyrene crosslinked by divinylbenzene of formula: where X represents Ci or Br.
- the process according to the invention is generally carried out and preferably in the presence of a solvent, the sequestering agent being able to play the role of solvent itself.
- This solvent must meet a certain number of conditions: it must be solubilizes the starting halosilane; it must also be chemically inert with respect to the silanes introduced or formed and the alkali or alkaline earth hydride used.
- the minimum amount of solvent used is preferably such that the alkali or alkaline earth hydride is in suspension in the reaction medium.
- a solvent is chosen such as, for example, chlorobenzene, orthodichlorobenzene, benzene, toluene, cyclohexane, heptane, dichloroethane, methylene chloride, tetrahydrofuran, dioxane, dimethoxyethane .
- the process of the invention is carried out at a temperature between -30 ° C and the boiling temperature of the reaction medium, preferably between room temperature and the boiling temperature of the reaction mixture.
- the hydrogen silane obtained can be separated as it is formed. It is possible to operate at a temperature close to ambient temperature, that is to say between 0 and 50 ° C., this constitutes one of the fundamental advantages of the process according to the invention.
- the molar ratio between the sequestering compound and the alkali or alkaline earth hydride is between 5 and 0.0001 and preferably between 0.5 and 0.001.
- the molar proportion between the hydride and the halosilane is generally close to stoichiometry. A slight excess of hydride may, however, be preferable to completely reduce the halosilane. This excess is preferably between 10 and 300 mol%.
- the reduction reaction is preferably carried out by slowly introducing the halosilane into the reaction medium, moreover it may be advantageous to cool the reaction medium to avoid an excessive increase in temperature which would favor the secondary reactions of formation of by-products.
- the hydrogen silanes obtained by the reduction reaction can be separated as they are formed.
- the grafted sequestering compounds used according to the invention make it possible to work preferably continuously on a column, while the non-grafted sequestering compounds make it possible to work preferably discontinuously.
- Sequestering agents of formula (I) used in the process according to the invention can be prepared as described in the French patent application published under No. 2,450,120.
- the present invention thus makes it possible to effect the reduction of the halosilanes at room temperature and with exceptional productivity and using small amounts of catalyst.
- the reaction medium is heated to 50 ° C. at the start of casting in order to initiate the reduction reaction of diphenyldichlorosilane. Once the reaction has started, the significant exotherm makes it possible to maintain the temperature of the medium at approximately 120 ° C. A slight heating is necessary at the end of casting to maintain this temperature.
- the reaction medium is heated to 130-150 ° C for 1 hour after the pouring of (C 6 , H 5 ) 2 SiCl 2 .
- Apparatus used 50 ml flask with magnetic stirring, surmounted by an ascending cooler and a dropping funnel.
- Phenyltrichlorosilane is introduced, via the dropping funnel, into the flask containing TDA 1, the solvent and lithium hydride.
- the reaction begins at the start of the casting, at room temperature; significant exotherm requires cooling the reactor in order to keep the temperature below 80 ° C.
- the reaction medium is heated to 120 ° C.
- reaction medium is then brought to 95 ° C. for 4 h.
- the temperature of the reaction medium is up to 40 ° C.
- the apparatus used in this example is as follows:
- TDA 1 and lithium hydride are charged after inerting the argon apparatus (test carried out in the absence of solvent).
- HSiCl 3 is introduced at constant flow rate via a positive displacement pump.
- the reduction reaction which takes place even at 0 ° C is strongly exothermic.
- the temperature of the reaction medium rises rapidly to 45 ° C., despite the vigorous cooling.
- the reaction stops when the transformation rate of LiH reaches approximately 60%.
- the low level of TDA 1 in the medium necessitates limiting the cooling to approximately 15 ° C. at the start of the reaction in order to initiate it, which does not start at 0 ° C.
- the cryogenic fluid is again cooled to 0 ° C in order to limit the temperature in the reactor.
- the flow rate of SiH 4 produced is 1.86 moles / h.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8501486 | 1985-02-04 | ||
FR8501486A FR2576902B1 (fr) | 1985-02-04 | 1985-02-04 | Procede de fabrication d'hydrogeno-silanes |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0192528A1 EP0192528A1 (fr) | 1986-08-27 |
EP0192528B1 true EP0192528B1 (fr) | 1989-05-24 |
Family
ID=9315891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP86400175A Expired EP0192528B1 (fr) | 1985-02-04 | 1986-01-29 | Procédé de fabrication d'hydrogeno-silanes |
Country Status (6)
Country | Link |
---|---|
US (1) | US4629801A (en, 2012) |
EP (1) | EP0192528B1 (en, 2012) |
JP (1) | JPS61233692A (en, 2012) |
CA (1) | CA1258359A (en, 2012) |
DE (1) | DE3663521D1 (en, 2012) |
FR (1) | FR2576902B1 (en, 2012) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4824657A (en) * | 1985-11-27 | 1989-04-25 | E. I. Du Pont De Nemours And Company | Process for reducing silicon, germanium and tin halides |
US4774347A (en) * | 1988-02-29 | 1988-09-27 | Dow Corning Corporation | Removal of chlorinated hydrocarbons from alkylsilanes |
US4927616A (en) * | 1989-10-02 | 1990-05-22 | Ethyl Corporation | Preparation of silane and amine alanes |
JP2551901B2 (ja) * | 1991-07-26 | 1996-11-06 | エフ エム シー コーポレーション | 接触アルキル化方法 |
EP3684778B1 (en) * | 2017-09-20 | 2023-08-02 | Momentive Performance Materials Inc. | Integrated process for the manufacture of methylchlorohydridomonosilanes |
EP3853235A1 (en) * | 2017-09-20 | 2021-07-28 | Momentive Performance Materials Inc. | Process for the production of organohydridochlorosilanes |
CN120058769A (zh) * | 2023-11-28 | 2025-05-30 | 江苏南大光电材料股份有限公司 | 提高芳香基氯硅烷还原制备芳香基硅烷转化率的制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1473374A (fr) * | 1965-03-03 | 1967-03-17 | Ceskoslovenska Akademie Ved | Procédé pour la réduction de combinaisons d'halogéno-silicium |
US4295986A (en) * | 1979-05-14 | 1981-10-20 | Gordon Roy G | Low temperature catalytic reduction |
US4291167A (en) * | 1980-07-28 | 1981-09-22 | Nalco Chemical Company | Preparation of tetramethyldisilane from 1,2-tetramethyldichlorodisilane |
JPS57196716A (en) * | 1981-05-29 | 1982-12-02 | Mitsubishi Metal Corp | Manufacture of monosilane |
FR2552434B1 (fr) * | 1983-09-28 | 1985-10-25 | Rhone Poulenc Spec Chim | Procede de fabrication de silane a partir de methyldichlorosilane et de chlorosilanes |
-
1985
- 1985-02-04 FR FR8501486A patent/FR2576902B1/fr not_active Expired
-
1986
- 1986-01-29 DE DE8686400175T patent/DE3663521D1/de not_active Expired
- 1986-01-29 EP EP86400175A patent/EP0192528B1/fr not_active Expired
- 1986-02-03 JP JP61020315A patent/JPS61233692A/ja active Granted
- 1986-02-03 CA CA000500917A patent/CA1258359A/fr not_active Expired
- 1986-02-04 US US06/825,818 patent/US4629801A/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009056731A1 (de) | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
Also Published As
Publication number | Publication date |
---|---|
EP0192528A1 (fr) | 1986-08-27 |
FR2576902A1 (fr) | 1986-08-08 |
JPS61233692A (ja) | 1986-10-17 |
US4629801A (en) | 1986-12-16 |
CA1258359A (fr) | 1989-08-15 |
FR2576902B1 (fr) | 1987-02-13 |
JPH0246597B2 (en, 2012) | 1990-10-16 |
DE3663521D1 (en) | 1989-06-29 |
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