JPH02431B2 - - Google Patents

Info

Publication number
JPH02431B2
JPH02431B2 JP17520283A JP17520283A JPH02431B2 JP H02431 B2 JPH02431 B2 JP H02431B2 JP 17520283 A JP17520283 A JP 17520283A JP 17520283 A JP17520283 A JP 17520283A JP H02431 B2 JPH02431 B2 JP H02431B2
Authority
JP
Japan
Prior art keywords
thin film
film forming
chamber
flexible substrate
forming chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17520283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6067671A (ja
Inventor
Hideo Mito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP17520283A priority Critical patent/JPS6067671A/ja
Publication of JPS6067671A publication Critical patent/JPS6067671A/ja
Publication of JPH02431B2 publication Critical patent/JPH02431B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP17520283A 1983-09-24 1983-09-24 薄膜作成装置 Granted JPS6067671A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17520283A JPS6067671A (ja) 1983-09-24 1983-09-24 薄膜作成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17520283A JPS6067671A (ja) 1983-09-24 1983-09-24 薄膜作成装置

Publications (2)

Publication Number Publication Date
JPS6067671A JPS6067671A (ja) 1985-04-18
JPH02431B2 true JPH02431B2 (zh) 1990-01-08

Family

ID=15992075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17520283A Granted JPS6067671A (ja) 1983-09-24 1983-09-24 薄膜作成装置

Country Status (1)

Country Link
JP (1) JPS6067671A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3675270D1 (de) * 1985-05-21 1990-12-06 Toyoda Gosei Kk Zerstaeubungsgeraet.
JPS61266572A (ja) * 1985-05-21 1986-11-26 Toyoda Gosei Co Ltd スパツタリング装置
JPH0220211Y2 (zh) * 1985-09-19 1990-06-01
JPH0230444Y2 (zh) * 1985-09-28 1990-08-16
JPH07100857B2 (ja) * 1985-10-09 1995-11-01 株式会社日立製作所 炭素皮膜形成方法及び装置
JPH0782959B2 (ja) * 1993-06-14 1995-09-06 株式会社半導体エネルギー研究所 炭素膜がコートされた磁気部材の作製方法
JP2008150677A (ja) * 2006-12-19 2008-07-03 Miyako Roller Industry Co フィルムへの連続コーティング方法及び連続コーティング装置
JP5736857B2 (ja) * 2011-03-09 2015-06-17 凸版印刷株式会社 成膜装置

Also Published As

Publication number Publication date
JPS6067671A (ja) 1985-04-18

Similar Documents

Publication Publication Date Title
US4692233A (en) Vacuum coating apparatus
JP4139441B2 (ja) 移動基材上にカーボンリッチ被膜を付着させるための方法および装置
US6176932B1 (en) Thin film deposition apparatus
EP2290127B1 (en) Film deposition device
JP5270505B2 (ja) プラズマcvd装置
JP5486249B2 (ja) 成膜方法
JP4669017B2 (ja) 成膜装置、ガスバリアフィルムおよびガスバリアフィルムの製造方法
JPH02431B2 (zh)
JP2002020863A (ja) 堆積膜の形成方法及び形成装置、及び基板処理方法
JP2003049273A (ja) プラズマcvd装置及びプラズマcvdによる成膜方法
JP2001073133A (ja) 真空薄膜形成装置および真空薄膜形成方法
TW201934780A (zh) 沉積設備、塗佈軟質基材的方法、及具有塗層的軟質基材
JPS63246814A (ja) 薄膜形成装置
JP2000001771A (ja) 誘電体保護層の製造方法とその製造装置、並びにそれを用いたプラズマディスプレイパネルと画像表示装置
JP2010095735A (ja) 成膜装置、成膜方法およびガスバリアフィルム
JPH07254566A (ja) 薄膜生成装置
US20110214609A1 (en) Atmospheric plasma apparatus
JP3213029B2 (ja) ディスク基板用プラズマ処理装置およびその処理方法
JP2012184492A (ja) 機能性フィルムの製造方法
WO2017047044A1 (ja) 薄膜形成法及び薄膜形成装置
CN217351526U (zh) 一种等离子体辅助原子层沉积高阻隔膜装置
US20120107487A1 (en) Roll to roll patterned deposition process and system
KR100920901B1 (ko) 다층박막 제조장치 및 이를 이용한 다층박막 제조방법
JP2009052098A (ja) 成膜装置
JPH05255853A (ja) 薄膜製造装置