JPH02431B2 - - Google Patents
Info
- Publication number
- JPH02431B2 JPH02431B2 JP17520283A JP17520283A JPH02431B2 JP H02431 B2 JPH02431 B2 JP H02431B2 JP 17520283 A JP17520283 A JP 17520283A JP 17520283 A JP17520283 A JP 17520283A JP H02431 B2 JPH02431 B2 JP H02431B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film forming
- chamber
- flexible substrate
- forming chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 109
- 239000000758 substrate Substances 0.000 claims description 28
- 239000007789 gas Substances 0.000 claims description 11
- 238000000427 thin-film deposition Methods 0.000 claims 2
- 239000010408 film Substances 0.000 description 85
- 238000003860 storage Methods 0.000 description 15
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000012495 reaction gas Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000009751 slip forming Methods 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17520283A JPS6067671A (ja) | 1983-09-24 | 1983-09-24 | 薄膜作成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17520283A JPS6067671A (ja) | 1983-09-24 | 1983-09-24 | 薄膜作成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6067671A JPS6067671A (ja) | 1985-04-18 |
| JPH02431B2 true JPH02431B2 (zh) | 1990-01-08 |
Family
ID=15992075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17520283A Granted JPS6067671A (ja) | 1983-09-24 | 1983-09-24 | 薄膜作成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6067671A (zh) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3675270D1 (de) * | 1985-05-21 | 1990-12-06 | Toyoda Gosei Kk | Zerstaeubungsgeraet. |
| JPS61266572A (ja) * | 1985-05-21 | 1986-11-26 | Toyoda Gosei Co Ltd | スパツタリング装置 |
| JPH0220211Y2 (zh) * | 1985-09-19 | 1990-06-01 | ||
| JPH0230444Y2 (zh) * | 1985-09-28 | 1990-08-16 | ||
| JPH07100857B2 (ja) * | 1985-10-09 | 1995-11-01 | 株式会社日立製作所 | 炭素皮膜形成方法及び装置 |
| JPH0782959B2 (ja) * | 1993-06-14 | 1995-09-06 | 株式会社半導体エネルギー研究所 | 炭素膜がコートされた磁気部材の作製方法 |
| JP2008150677A (ja) * | 2006-12-19 | 2008-07-03 | Miyako Roller Industry Co | フィルムへの連続コーティング方法及び連続コーティング装置 |
| JP5736857B2 (ja) * | 2011-03-09 | 2015-06-17 | 凸版印刷株式会社 | 成膜装置 |
-
1983
- 1983-09-24 JP JP17520283A patent/JPS6067671A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6067671A (ja) | 1985-04-18 |
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