JPH0240480Y2 - - Google Patents
Info
- Publication number
- JPH0240480Y2 JPH0240480Y2 JP1982194017U JP19401782U JPH0240480Y2 JP H0240480 Y2 JPH0240480 Y2 JP H0240480Y2 JP 1982194017 U JP1982194017 U JP 1982194017U JP 19401782 U JP19401782 U JP 19401782U JP H0240480 Y2 JPH0240480 Y2 JP H0240480Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- heater
- light irradiation
- heat
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Furnace Details (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19401782U JPS5998300U (ja) | 1982-12-23 | 1982-12-23 | 光照射炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19401782U JPS5998300U (ja) | 1982-12-23 | 1982-12-23 | 光照射炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5998300U JPS5998300U (ja) | 1984-07-03 |
| JPH0240480Y2 true JPH0240480Y2 (OSRAM) | 1990-10-29 |
Family
ID=30417147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19401782U Granted JPS5998300U (ja) | 1982-12-23 | 1982-12-23 | 光照射炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5998300U (OSRAM) |
-
1982
- 1982-12-23 JP JP19401782U patent/JPS5998300U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5998300U (ja) | 1984-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6411712B2 (OSRAM) | ||
| US4468260A (en) | Method for diffusing dopant atoms | |
| US4535228A (en) | Heater assembly and a heat-treatment method of semiconductor wafer using the same | |
| JPS5861635A (ja) | 半導体の処理方法 | |
| US4535227A (en) | Method for heating semiconductor wafer by means of application of radiated light | |
| US4468259A (en) | Uniform wafer heating by controlling light source and circumferential heating of wafer | |
| JPS6244848B2 (OSRAM) | ||
| JPS5917253A (ja) | 半導体ウエハの熱処理方法 | |
| JPH0240480Y2 (OSRAM) | ||
| US4486652A (en) | Blackbody radiation source with constant planar energy flux | |
| JPS61129834A (ja) | 光照射型熱処理装置 | |
| JPS60137027A (ja) | 光照射加熱方法 | |
| JPS6115511Y2 (OSRAM) | ||
| JPS6130153Y2 (OSRAM) | ||
| JPH025295B2 (OSRAM) | ||
| JPS6244847B2 (OSRAM) | ||
| JPS60732A (ja) | アニ−ル方法 | |
| JPS60145629A (ja) | 熱処理法 | |
| JPS63271922A (ja) | 熱処理装置 | |
| JPS6331096B2 (OSRAM) | ||
| JP2001156011A (ja) | 半導体ウェーハ熱処理装置 | |
| JPS6331094B2 (OSRAM) | ||
| JPH0234824Y2 (OSRAM) | ||
| JPS593934A (ja) | 半導体ウエハ−を光照射で加熱する方法 | |
| JPS6088431A (ja) | 光照射加熱方法 |