JPS6244847B2 - - Google Patents
Info
- Publication number
- JPS6244847B2 JPS6244847B2 JP56194575A JP19457581A JPS6244847B2 JP S6244847 B2 JPS6244847 B2 JP S6244847B2 JP 56194575 A JP56194575 A JP 56194575A JP 19457581 A JP19457581 A JP 19457581A JP S6244847 B2 JPS6244847 B2 JP S6244847B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- outer periphery
- light irradiation
- semiconductor wafer
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P34/422—
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Resistance Heating (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56194575A JPS58194332A (ja) | 1981-12-04 | 1981-12-04 | 半導体を光照射で加熱する方法 |
| US06/445,493 US4469529A (en) | 1981-12-04 | 1982-11-30 | Method for heating semiconductor wafer by means of application of radiated light with supplemental circumferential heating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56194575A JPS58194332A (ja) | 1981-12-04 | 1981-12-04 | 半導体を光照射で加熱する方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58194332A JPS58194332A (ja) | 1983-11-12 |
| JPS6244847B2 true JPS6244847B2 (OSRAM) | 1987-09-22 |
Family
ID=16326811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56194575A Granted JPS58194332A (ja) | 1981-12-04 | 1981-12-04 | 半導体を光照射で加熱する方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58194332A (OSRAM) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS593934A (ja) * | 1982-06-30 | 1984-01-10 | Ushio Inc | 半導体ウエハ−を光照射で加熱する方法 |
| JPS593933A (ja) * | 1982-06-30 | 1984-01-10 | Ushio Inc | 半導体ウエハ−を光照射で加熱する方法 |
| JPS5998518A (ja) * | 1982-11-26 | 1984-06-06 | Seiko Epson Corp | ランプ・アニ−ル装置 |
-
1981
- 1981-12-04 JP JP56194575A patent/JPS58194332A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58194332A (ja) | 1983-11-12 |
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