JPH0238922Y2 - - Google Patents
Info
- Publication number
- JPH0238922Y2 JPH0238922Y2 JP12275783U JP12275783U JPH0238922Y2 JP H0238922 Y2 JPH0238922 Y2 JP H0238922Y2 JP 12275783 U JP12275783 U JP 12275783U JP 12275783 U JP12275783 U JP 12275783U JP H0238922 Y2 JPH0238922 Y2 JP H0238922Y2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- heating device
- storage device
- vacuum chamber
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 13
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12275783U JPS6032360U (ja) | 1983-08-06 | 1983-08-06 | 真空蒸着装置に於けるるつぼ交換装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12275783U JPS6032360U (ja) | 1983-08-06 | 1983-08-06 | 真空蒸着装置に於けるるつぼ交換装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6032360U JPS6032360U (ja) | 1985-03-05 |
| JPH0238922Y2 true JPH0238922Y2 (enrdf_load_html_response) | 1990-10-19 |
Family
ID=30280469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12275783U Granted JPS6032360U (ja) | 1983-08-06 | 1983-08-06 | 真空蒸着装置に於けるるつぼ交換装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6032360U (enrdf_load_html_response) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2580094Y2 (ja) * | 1992-04-27 | 1998-09-03 | 石川島播磨重工業株式会社 | 電子ビーム銃 |
| JP2012246534A (ja) * | 2011-05-27 | 2012-12-13 | Nec Corp | 蒸着装置 |
-
1983
- 1983-08-06 JP JP12275783U patent/JPS6032360U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6032360U (ja) | 1985-03-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI314503B (en) | Loading and unloading apparatus for a coating device | |
| JP2000223269A5 (enrdf_load_html_response) | ||
| JP5372144B2 (ja) | 真空蒸着システム及び真空蒸着方法 | |
| JPH0238922Y2 (enrdf_load_html_response) | ||
| JP2004200678A5 (enrdf_load_html_response) | ||
| JPH05212275A (ja) | 加熱処理装置 | |
| JP2000248358A (ja) | 蒸着装置および蒸着方法 | |
| CN103602950A (zh) | 蒸发源装置及蒸发源设备 | |
| JPH0238923Y2 (enrdf_load_html_response) | ||
| CN205821452U (zh) | 一种分区段晶圆片载体 | |
| US6467427B1 (en) | Evaporation source material supplier | |
| JP4804654B2 (ja) | 容器内面成膜用cvd装置及び容器内面成膜方法 | |
| JPH10242237A (ja) | ウエハ移載装置および移載方法 | |
| JPS6115968A (ja) | 真空蒸着装置 | |
| JP2583648Y2 (ja) | 気相成長装置のトレイ | |
| JPH0644912Y2 (ja) | 板状材料搬送装置 | |
| JPS6256652B2 (enrdf_load_html_response) | ||
| CN214881923U (zh) | 一种制备籽晶的装置 | |
| JPH0241135Y2 (enrdf_load_html_response) | ||
| JPS6247551A (ja) | 半導体基板の薄膜分解方法及び装置 | |
| JPH0527489Y2 (enrdf_load_html_response) | ||
| TWI254079B (en) | Multi-chamber evaporator system | |
| JPH08316287A (ja) | 基板取扱方法及びそれに用いる基板フレーム | |
| JP2589525B2 (ja) | 半導体素子の裏メタル形成装置 | |
| JPH0445237Y2 (enrdf_load_html_response) |