JPH0234151B2 - - Google Patents

Info

Publication number
JPH0234151B2
JPH0234151B2 JP56015018A JP1501881A JPH0234151B2 JP H0234151 B2 JPH0234151 B2 JP H0234151B2 JP 56015018 A JP56015018 A JP 56015018A JP 1501881 A JP1501881 A JP 1501881A JP H0234151 B2 JPH0234151 B2 JP H0234151B2
Authority
JP
Japan
Prior art keywords
ion
section
computer
ion source
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56015018A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57130358A (en
Inventor
Michuki Harada
Masayasu Myake
Yoichi Egami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56015018A priority Critical patent/JPS57130358A/ja
Publication of JPS57130358A publication Critical patent/JPS57130358A/ja
Publication of JPH0234151B2 publication Critical patent/JPH0234151B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electron Sources, Ion Sources (AREA)
JP56015018A 1981-02-05 1981-02-05 Full automatic ion implantation device Granted JPS57130358A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56015018A JPS57130358A (en) 1981-02-05 1981-02-05 Full automatic ion implantation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56015018A JPS57130358A (en) 1981-02-05 1981-02-05 Full automatic ion implantation device

Publications (2)

Publication Number Publication Date
JPS57130358A JPS57130358A (en) 1982-08-12
JPH0234151B2 true JPH0234151B2 (enrdf_load_stackoverflow) 1990-08-01

Family

ID=11877118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56015018A Granted JPS57130358A (en) 1981-02-05 1981-02-05 Full automatic ion implantation device

Country Status (1)

Country Link
JP (1) JPS57130358A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0135366B1 (en) * 1983-08-15 1990-11-07 Applied Materials, Inc. System and method for ion implantation
JPS60232656A (ja) * 1984-04-28 1985-11-19 Nissin Electric Co Ltd イオン注入装置
JPH0652651B2 (ja) * 1985-11-06 1994-07-06 株式会社日立製作所 微細加工装置
JPH0740479B2 (ja) * 1985-11-18 1995-05-01 東京エレクトロン株式会社 イオン注入方法
JPH0731497Y2 (ja) * 1986-03-03 1995-07-19 日新電機株式会社 イオン質量分析装置
JPS63146337A (ja) * 1986-12-08 1988-06-18 Fuji Electric Co Ltd イオンビ−ム装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS507797U (enrdf_load_stackoverflow) * 1973-05-21 1975-01-27
DE2326279A1 (de) * 1973-05-23 1974-12-19 Siemens Ag Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation
JPS5569370U (enrdf_load_stackoverflow) * 1978-11-08 1980-05-13
JPS5945174B2 (ja) * 1978-11-20 1984-11-05 三菱電機株式会社 分析マグネットの制御装置

Also Published As

Publication number Publication date
JPS57130358A (en) 1982-08-12

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