JPH02307A - パターン形成装置及びその方法 - Google Patents

パターン形成装置及びその方法

Info

Publication number
JPH02307A
JPH02307A JP1086803A JP8680389A JPH02307A JP H02307 A JPH02307 A JP H02307A JP 1086803 A JP1086803 A JP 1086803A JP 8680389 A JP8680389 A JP 8680389A JP H02307 A JPH02307 A JP H02307A
Authority
JP
Japan
Prior art keywords
liquid crystal
display device
crystal display
original image
transmissive liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1086803A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0416779B2 (enrdf_load_stackoverflow
Inventor
Takeoki Miyauchi
宮内　建興
Katsuro Mizukoshi
克郎 水越
Mikio Hongo
幹雄 本郷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1086803A priority Critical patent/JPH02307A/ja
Publication of JPH02307A publication Critical patent/JPH02307A/ja
Publication of JPH0416779B2 publication Critical patent/JPH0416779B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1086803A 1989-04-07 1989-04-07 パターン形成装置及びその方法 Granted JPH02307A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1086803A JPH02307A (ja) 1989-04-07 1989-04-07 パターン形成装置及びその方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1086803A JPH02307A (ja) 1989-04-07 1989-04-07 パターン形成装置及びその方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP11416179A Division JPS5638888A (en) 1979-09-07 1979-09-07 Pattern forming method

Related Child Applications (4)

Application Number Title Priority Date Filing Date
JP6158793A Division JP2531921B2 (ja) 1993-03-22 1993-03-22 レ―ザ光によるパタ―ン刻印方法
JP5061586A Division JP2531920B2 (ja) 1993-03-22 1993-03-22 透過形液晶表示装置を用いたレ―ザ刻印装置
JP6084344A Division JP2530423B2 (ja) 1994-04-22 1994-04-22 パタ−ン刻印装置
JP6084343A Division JPH07105337B2 (ja) 1994-04-22 1994-04-22 パターン刻印装置

Publications (2)

Publication Number Publication Date
JPH02307A true JPH02307A (ja) 1990-01-05
JPH0416779B2 JPH0416779B2 (enrdf_load_stackoverflow) 1992-03-25

Family

ID=13896959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1086803A Granted JPH02307A (ja) 1989-04-07 1989-04-07 パターン形成装置及びその方法

Country Status (1)

Country Link
JP (1) JPH02307A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0643627A (ja) * 1993-03-22 1994-02-18 Hitachi Ltd 透過形液晶表示装置を用いたレーザ刻印装置
KR100783324B1 (ko) * 2005-04-20 2007-12-10 증권예탁결제원 유가증권 대차거래의 상임대리인 연계시스템 및 그 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0643627A (ja) * 1993-03-22 1994-02-18 Hitachi Ltd 透過形液晶表示装置を用いたレーザ刻印装置
KR100783324B1 (ko) * 2005-04-20 2007-12-10 증권예탁결제원 유가증권 대차거래의 상임대리인 연계시스템 및 그 방법

Also Published As

Publication number Publication date
JPH0416779B2 (enrdf_load_stackoverflow) 1992-03-25

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