JPH02294081A - Light emitting element - Google Patents

Light emitting element

Info

Publication number
JPH02294081A
JPH02294081A JP1114256A JP11425689A JPH02294081A JP H02294081 A JPH02294081 A JP H02294081A JP 1114256 A JP1114256 A JP 1114256A JP 11425689 A JP11425689 A JP 11425689A JP H02294081 A JPH02294081 A JP H02294081A
Authority
JP
Japan
Prior art keywords
active layer
light
light emitting
type
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1114256A
Other languages
Japanese (ja)
Inventor
Tsunehiro Unno
恒弘 海野
Shoji Sumi
隅 彰二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP1114256A priority Critical patent/JPH02294081A/en
Publication of JPH02294081A publication Critical patent/JPH02294081A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To radiate a light containing two or more kinds of wavelengths vertically to a laminated surface by providing two or more active layers having different band gaps between clad layers. CONSTITUTION:Between clad layers 2, 5, two or more active layers having different band gaps are arranged. That is, on an N-type GaAs substrate 1, the following are epitaxially grown; an N-type GaAlAs clad layer 2, a first p-type GaAlAs active layer 3, a second P-type GaAlAs active layer 4, a P-type GaAlAs clad layer 5, and a P-type GaAs contact layer 6. When a current is made to flow between electrodes 7, 9, the respective lights of surface light emitting parts 3a, 4a of the first active layer 3 and the second active layer 4 enter an optical fiber 11; the light from the surface light emitting part 4a of the second active layer 4 passes the first active layer 3 whose band gap energy is large, and can be led out by the optical fiber 11. Thereby a light emitting element which can radiate vertially from the laminated surface, a light containing a plurality of wavelengths can be obtained.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、発光ダイオードや半導体レーザなどの発光素
子に係り、特に2種以上の発光波長を有する発光素子に
関するものである.[従来の技術] 従来、発光ダイオードや半導体レーザは、表示.通信,
計測など広い分野で使用されている発光素子であるが、
単波長である.これに対して複数の波長の光を発光させ
ることができれば、発光ダイオードや半導体レーザの用
途を広げることができる.例えば、光を透過させること
ができる物質のほとんどは、その光吸収係数や伝播速度
が光の波長により異なっている.従ってこの物質中を光
を通過させることにより、物質の濃度や長さなどを測定
することができる.その際、波長の異なる光源を用い、
2波長の変化を調べれば、測定精度を大幅に向上させる
ことができる.これらの計測に用いる光源としては、発
光出力が高く、小型軽量であるということから、発光ダ
イオードや半導体レーザが用いられている.しかしこれ
らは単波長光源である.複数の波長を得るためには、発
光波長の異なる2種以上の発光素子を集めて光源を製作
することが可能である.しかしこの方法では光源が大き
くなってしまう。また光を集束させて使用する場合3こ
は不都合となる.例えば発光ダイオードや半導体レーザ
の光を、光ファイバに入れて通信や計測に使用する場合
、結合効率が重要となる.光を細いコアへ入れるのに、
チツフ゜が1個であれば従来技術を用いて達成すること
ができる.従って、1個のチップで複数波長の光を発生
できれば種々の用途が考えられる。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to light emitting elements such as light emitting diodes and semiconductor lasers, and particularly to light emitting elements having two or more types of emission wavelengths. [Prior Art] Conventionally, light emitting diodes and semiconductor lasers have been used for display purposes. communication,
Light-emitting elements are used in a wide range of fields such as measurement.
It has a single wavelength. On the other hand, if light with multiple wavelengths can be emitted, the applications of light-emitting diodes and semiconductor lasers can be expanded. For example, most materials that can transmit light have different light absorption coefficients and propagation speeds depending on the wavelength of the light. Therefore, by passing light through this substance, it is possible to measure the concentration and length of the substance. At that time, using light sources with different wavelengths,
By examining changes in two wavelengths, measurement accuracy can be greatly improved. Light-emitting diodes and semiconductor lasers are used as light sources for these measurements because they have high light output and are small and lightweight. However, these are single wavelength light sources. In order to obtain multiple wavelengths, it is possible to fabricate a light source by collecting two or more types of light emitting elements with different emission wavelengths. However, this method requires a large light source. Also, when using the light in a focused manner, this is inconvenient. For example, when light from a light emitting diode or semiconductor laser is inserted into an optical fiber and used for communication or measurement, coupling efficiency is important. To let light into the thin core,
If there is only one chip, this can be achieved using conventional technology. Therefore, if a single chip can generate light of multiple wavelengths, various uses can be considered.

発光波長の異なる2種以上の発光素子としては、特開昭
56−15094号公報及び特開昭5618483号公
報に示されるように、基板上に活性層を2種以上形成し
各活性層をそれぞれクラッド層で挟むようにして、すな
わち基板上にクラッド層/第1の活性層/クラヅド層/
第2の活性層/クラッド層の積層楕逍にして2種以上の
波長の光を発光させることが示されている. [発明が解決しようとする課題] しかしながらこの発光素子は、電極を積層方向に設ける
必要があり、かつ光が積層面の方向に放出されるいわゆ
る横タイプであり、高出力が得られないと共に製作性お
よび量産性が落ちる問題がある。
As shown in JP-A-56-15094 and JP-A-5,618,483, two or more types of light-emitting elements having different emission wavelengths are formed by forming two or more types of active layers on a substrate and forming each active layer respectively. The cladding layer/first active layer/cladding layer/
It has been shown that the laminated ellipse of the second active layer/cladding layer can emit light of two or more wavelengths. [Problems to be Solved by the Invention] However, this light emitting device requires electrodes to be provided in the direction of lamination, and is of a so-called horizontal type in which light is emitted in the direction of the laminated surface, making it difficult to obtain high output and making it difficult to manufacture. There is a problem that performance and mass productivity are reduced.

本発明の目的は、前記した従来技術の欠点を解消し、複
数の波長の光を積層面より垂直に放出できる発光素子を
提供することにある. [課題を解決するための千段] 本発明は、上記の目的を達成するために、活性層を、そ
の活性層よりバンドギャップエネルギーの大きなりラッ
ト層で挟んだ発光素子において、クラッド層間に、バン
ドギャップの異なる2層以上の活性層を設けたものであ
る. [作用] 上記の構成によれば、クラッド層間にバンドギャップの
異なる2層以上の活性層が設けられるため、2種以上の
波長の光を積層面に対して垂直に光を放出でき、従来の
縦タイプの単波長発光素子と同様に製作性および量産性
がよく、しかも高出力のものを得ることができる。
An object of the present invention is to eliminate the drawbacks of the prior art described above and to provide a light emitting element that can emit light of a plurality of wavelengths perpendicularly from a laminated surface. [A Thousand Steps to Solve the Problems] In order to achieve the above object, the present invention provides a light emitting device in which an active layer is sandwiched between rat layers having a band gap energy larger than that of the active layer. It has two or more active layers with different band gaps. [Function] According to the above configuration, since two or more active layers with different band gaps are provided between the cladding layers, light with two or more wavelengths can be emitted perpendicularly to the laminated surface, which is different from the conventional Similar to the vertical type single wavelength light emitting device, it has good manufacturability and mass productivity, and can provide high output.

[実施例] 以下、本発明の好適実施例を添付図面に基づいて説明す
る. 第1図は発光素子として発光ダイオードの例を示す.こ
の発光ダイオードは、面発光型のBurrus型#A造
である.図において、1はn型のGaAs基板で、その
GaAs基板1上にn型GaAJl’Asクラッド層2
,p型GaAJAs第1活性層3,p型GaAJ2As
第2活性層4,P型GaAJ)Asクラッド層5,P型
GaAsコンタクト層6を順次エビタキシャル成長させ
る, G a A s基板1側にはn ll1ll電極
7が収り付けられ、またρ型GaAsコンタクト層6に
は、Sif2絶縁膜8が設けられると共にその中央に3
0μmφの穴をあけ、pfflt極りを形成する.基板
1の中央には、p III電極9に対向して、選択エッ
チングによりn型GaAJAsクラッド層2に達する穴
10があけられ、その穴10に光ファイバ11を挿入す
ると共に例えばエボキシ樹脂などで固定する.さてここ
で、第1活性層3のAJAs混晶比は0.14で、膜厚
1.0μm、第2活性層4のAJAs混晶比は0.00
5で、膜厚0.2,tzmである。クラッド層2は、A
JAs混晶比0.30で、膜厚50μm、クラッド層5
は、AJAs混晶比0.3で、膜厚5μmである.コン
タクト層6は、GaAsで膜厚5μmである. このエビタキシャルウエハを製作するためには、液相エ
ピタキシャル法を用いており、n型ドーパントとしては
Te,p型ドーバントとしてはZnを使用する。
[Examples] Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. Figure 1 shows an example of a light-emitting diode as a light-emitting element. This light emitting diode is a surface emitting Burrus type #A structure. In the figure, 1 is an n-type GaAs substrate, and an n-type GaAJl'As cladding layer 2 is formed on the GaAs substrate 1.
, p-type GaAJAs first active layer 3, p-type GaAJ2As
A second active layer 4, a P-type GaAJ)As cladding layer 5, and a P-type GaAs contact layer 6 are sequentially grown epitaxially. An nll1ll electrode 7 is placed on the GaAs substrate 1 side, and a p-type A Sif2 insulating film 8 is provided on the GaAs contact layer 6, and a
Drill a hole of 0 μmφ and form a pfflt pole. In the center of the substrate 1, facing the p III electrode 9, a hole 10 is made by selective etching to reach the n-type GaAJAs cladding layer 2, and an optical fiber 11 is inserted into the hole 10 and fixed with, for example, epoxy resin. do. Now, here, the AJAs mixed crystal ratio of the first active layer 3 is 0.14, the film thickness is 1.0 μm, and the AJAs mixed crystal ratio of the second active layer 4 is 0.00.
5, and the film thickness was 0.2.tzm. The cladding layer 2 is A
JAs mixed crystal ratio 0.30, film thickness 50 μm, cladding layer 5
has an AJAs mixed crystal ratio of 0.3 and a film thickness of 5 μm. The contact layer 6 is made of GaAs and has a thickness of 5 μm. In order to manufacture this epitaxial wafer, a liquid phase epitaxial method is used, and Te is used as an n-type dopant and Zn is used as a p-type dopant.

次に上記実施例の作用を説明する. 電極7.9間に電流を流すと、p型G a A AAs
第1活性層3およびp型GaAf!As第2活性層4の
p側電極9に対向した位置が面発光部3a,4aとなり
、各光が光ファイバ11に入る.この場合、第2活性層
4の面発光部4a″C′発光した光は、バンドギャップ
エネルギーの大きな第1活性層3を通過して光ファイバ
11に取り出すことができる.また第1活性層3および
第2活性層4の発光出力を同程度にするためには、活性
層キャリア濃度を等しくし、かつ第1活性層3の膜厚を
第2活性層の膜厚より薄くして0.5μm以下とする. この発光ダイオードの発光波長は、第1活性層3で88
0 nm,第2活性層4で780nmである.両波光波
長の相対強度は、順方向電流に依存するが、電流が一定
であれば、相対強度を一定に保つことができる。
Next, the operation of the above embodiment will be explained. When a current is passed between the electrodes 7.9, p-type Ga A AAs
First active layer 3 and p-type GaAf! The positions of the As second active layer 4 facing the p-side electrode 9 become surface emitting parts 3a, 4a, and each light enters the optical fiber 11. In this case, the light emitted from the surface emitting portion 4a''C' of the second active layer 4 can pass through the first active layer 3 having a large bandgap energy and be extracted to the optical fiber 11. In order to make the light emitting output of the second active layer 4 the same, the active layer carrier concentration should be made equal and the film thickness of the first active layer 3 should be made thinner than that of the second active layer by 0.5 μm. The emission wavelength of this light emitting diode is 88
0 nm, and 780 nm for the second active layer 4. The relative intensity of both light wavelengths depends on the forward current, but if the current is constant, the relative intensity can be kept constant.

上述の実施例においては、2種発光波長であつたが、活
性層の層数を増すことにより発光波長を増すことができ
る.またBuruss型で示したが、他の型の発光ダイ
オード、例えば端面発光型などでも活性層の層数を増せ
ば同じである.また半導体レーザについても活性層の層
数を増すことにより実施できる.この場合、2波長のレ
ーザ光,レーザ光と発光ダイオード光など閾値電流の違
いにより使い分けられる. [発明の効果] 以上説明したことから明らかなように本発明によれば次
のごとき優れた効果を発揮する。
In the above embodiment, two types of emission wavelengths were used, but the emission wavelength can be increased by increasing the number of active layers. Although the Buruss type is shown, the same effect can be applied to other types of light emitting diodes, such as edge-emitting types, if the number of active layers is increased. This method can also be applied to semiconductor lasers by increasing the number of active layers. In this case, laser light with two wavelengths, or laser light and light emitting diode light, can be used depending on the difference in threshold current. [Effects of the Invention] As is clear from the above explanation, the present invention exhibits the following excellent effects.

(1)ファイバ内や微笑測定サンプルなどに光を集光さ
せて送る場合に、1チップであるため光学系が簡単であ
り従来の縦タイプの技術をそのまま使用できる. (2)2種の発光波艮は、1チップから出るため温度が
同じであり、相対強度の変化が少ない.(3)パルス応
答実験などについても、同一チップ内であるため特性が
そろっており時間遅れがない.
(1) When condensing and transmitting light into a fiber or a smile measurement sample, the optical system is simple because it is a single chip, and conventional vertical type technology can be used as is. (2) Since the two types of light emitting waves are emitted from one chip, the temperature is the same, and there is little change in relative intensity. (3) For pulse response experiments, the characteristics are consistent and there is no time delay since they are all on the same chip.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す断面図である. 図中、1はn型GaAs基板、2はn型GaAIAsク
ラッド層、3はp型GaAj!As第1活性層、4はρ
型GaAjlAs第2活性層、5はp型GaAj!As
クラッド層である。 特許出願人  日立電線株式会社 代理人 弁理士  絹 谷 信 雄
FIG. 1 is a sectional view showing one embodiment of the present invention. In the figure, 1 is an n-type GaAs substrate, 2 is an n-type GaAIAs cladding layer, and 3 is a p-type GaAj! As first active layer, 4 is ρ
type GaAjlAs second active layer, 5 is p-type GaAj! As
This is the cladding layer. Patent applicant Hitachi Cable Co., Ltd. Agent Patent attorney Nobuo Kinutani

Claims (1)

【特許請求の範囲】[Claims] 1、活性層を、その活性層よりバンドギャップエネルギ
ーの大きなりラット層で挟んだ発光素子において、クラ
ッド層間に、バンドギャップの異なる2層以上の活性層
を設けたことを特徴とする発光素子。
1. A light-emitting element in which an active layer is sandwiched between rat layers having a band gap energy larger than that of the active layer, characterized in that two or more active layers having different band gaps are provided between the cladding layers.
JP1114256A 1989-05-09 1989-05-09 Light emitting element Pending JPH02294081A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1114256A JPH02294081A (en) 1989-05-09 1989-05-09 Light emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1114256A JPH02294081A (en) 1989-05-09 1989-05-09 Light emitting element

Publications (1)

Publication Number Publication Date
JPH02294081A true JPH02294081A (en) 1990-12-05

Family

ID=14633228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1114256A Pending JPH02294081A (en) 1989-05-09 1989-05-09 Light emitting element

Country Status (1)

Country Link
JP (1) JPH02294081A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0335567A (en) * 1989-07-03 1991-02-15 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light emitting diode
KR100705225B1 (en) * 2005-12-15 2007-04-06 엘지전자 주식회사 Method of fabricating vertical type light emitting device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599784A (en) * 1979-01-24 1980-07-30 Nec Corp Photodiode

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599784A (en) * 1979-01-24 1980-07-30 Nec Corp Photodiode

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0335567A (en) * 1989-07-03 1991-02-15 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light emitting diode
KR100705225B1 (en) * 2005-12-15 2007-04-06 엘지전자 주식회사 Method of fabricating vertical type light emitting device

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