JPH0229150U - - Google Patents
Info
- Publication number
- JPH0229150U JPH0229150U JP10658488U JP10658488U JPH0229150U JP H0229150 U JPH0229150 U JP H0229150U JP 10658488 U JP10658488 U JP 10658488U JP 10658488 U JP10658488 U JP 10658488U JP H0229150 U JPH0229150 U JP H0229150U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- exhaust pipe
- evacuated
- evacuation device
- vacuum evacuation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010586 diagram Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
Description
第１図は、この考案の一実施例に係る真空排気
装置を用いたイオン注入装置の一例を部分的に示
す概略図である。第２図ないし第４図は、それぞ
れ、絶縁排気管内の電極の部分の他の例を示す断
面図である。第５図は、第２図あるいは第４図の
電極の片側平面図である。第６図は、従来の真空
排気装置を用いたイオン注入装置の一例を部分的
に示す概略図である。
２……高電位部、８……被排気部、１２……絶
縁排気管、１４……真空ポンプ、１８……直流電
源、２０〜２５……電極。
FIG. 1 is a schematic diagram partially showing an example of an ion implantation apparatus using a vacuum evacuation device according to an embodiment of the present invention. FIGS. 2 to 4 are cross-sectional views showing other examples of electrode portions within the insulated exhaust pipe. FIG. 5 is a one-sided plan view of the electrode of FIG. 2 or 4. FIG. FIG. 6 is a schematic diagram partially showing an example of an ion implantation device using a conventional vacuum evacuation device. 2... High potential part, 8... Exhausted part, 12... Insulated exhaust pipe, 14... Vacuum pump, 18... DC power supply, 20-25... Electrode.
Claims (1)
を経由して、大地電位部に設けられた真空ポンプ
によつて真空排気する構成の真空排気装置におい
て、前記絶縁排気管の被排気部側の入口部付近内
に電極を設け、この電極に直流電源から直流電圧
を印加するようにしたことを特徴とする真空排気
装置。 In a vacuum evacuation device configured to evacuate a part to be evacuated provided in a high potential part via an insulated exhaust pipe by a vacuum pump provided in an earth potential part, the part to be evacuated of the insulated exhaust pipe A vacuum evacuation device characterized in that an electrode is provided in the vicinity of a side inlet, and a DC voltage is applied to the electrode from a DC power source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10658488U JPH076608Y2 (en) | 1988-08-12 | 1988-08-12 | Vacuum exhaust device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10658488U JPH076608Y2 (en) | 1988-08-12 | 1988-08-12 | Vacuum exhaust device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0229150U true JPH0229150U (en) | 1990-02-26 |
| JPH076608Y2 JPH076608Y2 (en) | 1995-02-15 |
Family
ID=31340227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10658488U Expired - Lifetime JPH076608Y2 (en) | 1988-08-12 | 1988-08-12 | Vacuum exhaust device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH076608Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0650229U (en) * | 1992-01-09 | 1994-07-08 | 日本電子株式会社 | Exhaust device in a high frequency inductively coupled plasma mass spectrometer |
| JP2020038776A (en) * | 2018-09-03 | 2020-03-12 | 株式会社ニューフレアテクノロジー | Charged particle device |
-
1988
- 1988-08-12 JP JP10658488U patent/JPH076608Y2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0650229U (en) * | 1992-01-09 | 1994-07-08 | 日本電子株式会社 | Exhaust device in a high frequency inductively coupled plasma mass spectrometer |
| JP2020038776A (en) * | 2018-09-03 | 2020-03-12 | 株式会社ニューフレアテクノロジー | Charged particle device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH076608Y2 (en) | 1995-02-15 |