JPH0227496Y2 - - Google Patents

Info

Publication number
JPH0227496Y2
JPH0227496Y2 JP1982117786U JP11778682U JPH0227496Y2 JP H0227496 Y2 JPH0227496 Y2 JP H0227496Y2 JP 1982117786 U JP1982117786 U JP 1982117786U JP 11778682 U JP11778682 U JP 11778682U JP H0227496 Y2 JPH0227496 Y2 JP H0227496Y2
Authority
JP
Japan
Prior art keywords
wafer
disk
ion implantation
holder
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982117786U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5923732U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11778682U priority Critical patent/JPS5923732U/ja
Publication of JPS5923732U publication Critical patent/JPS5923732U/ja
Application granted granted Critical
Publication of JPH0227496Y2 publication Critical patent/JPH0227496Y2/ja
Granted legal-status Critical Current

Links

JP11778682U 1982-08-04 1982-08-04 回転式イオン注入装置に於けるウエハ取付装置 Granted JPS5923732U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11778682U JPS5923732U (ja) 1982-08-04 1982-08-04 回転式イオン注入装置に於けるウエハ取付装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11778682U JPS5923732U (ja) 1982-08-04 1982-08-04 回転式イオン注入装置に於けるウエハ取付装置

Publications (2)

Publication Number Publication Date
JPS5923732U JPS5923732U (ja) 1984-02-14
JPH0227496Y2 true JPH0227496Y2 (enrdf_load_html_response) 1990-07-25

Family

ID=30271003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11778682U Granted JPS5923732U (ja) 1982-08-04 1982-08-04 回転式イオン注入装置に於けるウエハ取付装置

Country Status (1)

Country Link
JP (1) JPS5923732U (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6174513U (enrdf_load_html_response) * 1984-10-18 1986-05-20
JPH0748510Y2 (ja) * 1993-04-21 1995-11-08 日本紙業株式会社 瓶類の搬送用紙器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5582771A (en) * 1978-12-20 1980-06-21 Toshiba Corp Ion implanting device
US4282924A (en) * 1979-03-16 1981-08-11 Varian Associates, Inc. Apparatus for mechanically clamping semiconductor wafer against pliable thermally conductive surface

Also Published As

Publication number Publication date
JPS5923732U (ja) 1984-02-14

Similar Documents

Publication Publication Date Title
JP2927452B2 (ja) ディスク保持装置及びその使用方法
US4403567A (en) Workpiece holder
TW202027162A (zh) 電漿處理裝置
JPS6235517A (ja) 基体処理装置
TW201015659A (en) Work-piece transfer systems and methods
JPH0227496Y2 (enrdf_load_html_response)
TW367530B (en) Multiple substrate processing apparatus for enhanced throughput
TW202333895A (zh) 用於水平預清潔模組的墊載體組件
KR20180083259A (ko) 기판 홀더, 종형 기판 반송 장치 및 기판 처리 장치
JPS5893247A (ja) 流体圧で駆動される半導体ウエ−ハ締付け装置
JPH10209252A (ja) ウエハ用トレイ
JPH05318310A (ja) ウエハー載置方法および載置装置
JP3642848B2 (ja) 基板回転保持装置および回転式基板処理装置
JPS5916906B2 (ja) レンズ研摩装置
TWI745266B (zh) 反應爐冷卻系統及其方法
KR102863562B1 (ko) 기판 처리 장치 및 기판 처리 방법
JPH11163104A (ja) 薄板状基板の表面処理装置における薄板状基板の保持装置
JPH04181717A (ja) 熱処理装置及び熱処理方法
JPS6311731Y2 (enrdf_load_html_response)
JPH0510356Y2 (enrdf_load_html_response)
JPS596617Y2 (ja) バツクプレ−ト装置
KR19990024867A (ko) 반도체 제조용 스피너의 웨이퍼 반송장치
JP2002158174A (ja) 真空処理装置
CN120709217A (zh) 一种间接式可静电吸附的机械卡盘
JPS626138Y2 (enrdf_load_html_response)