JPH02272788A - Manufacture of radio wave shielding printed circuit board - Google Patents
Manufacture of radio wave shielding printed circuit boardInfo
- Publication number
- JPH02272788A JPH02272788A JP9494189A JP9494189A JPH02272788A JP H02272788 A JPH02272788 A JP H02272788A JP 9494189 A JP9494189 A JP 9494189A JP 9494189 A JP9494189 A JP 9494189A JP H02272788 A JPH02272788 A JP H02272788A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- wiring board
- etching
- resist layer
- solder resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000005530 etching Methods 0.000 claims abstract description 25
- 229910000679 solder Inorganic materials 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims description 41
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 7
- 239000011342 resin composition Substances 0.000 abstract description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 6
- 239000010949 copper Substances 0.000 abstract description 6
- 229910052802 copper Inorganic materials 0.000 abstract description 5
- 239000000758 substrate Substances 0.000 abstract description 5
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052759 nickel Inorganic materials 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 100
- 238000007747 plating Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000007772 electroless plating Methods 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
- H05K1/0218—Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、電波遮蔽プリント配線板の製造方法に関する
。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a radio wave shielding printed wiring board.
従来の技術及びその問題点
電磁波によるコンピューター、電子機器等の誤動作等の
発生が問題となっており、このような障害を防止するた
めに、外部からの電磁波による干渉の防止の目的のシー
ルドや自己の発生する電磁波による他の部品への干渉を
防止する目的の発生源のシールド等が行なわれている。Conventional technology and its problems Malfunctions of computers, electronic devices, etc. caused by electromagnetic waves have become a problem. In order to prevent the electromagnetic waves generated by the electromagnetic waves from interfering with other parts, shielding of the source of the electromagnetic waves is performed.
従来の電磁波シールドの方法としては、電子機器のケー
スの外面又は内面を導体化する方法や導体膜とプラスチ
ックフィルムの積層フィルムによってプリント配線板等
の部品を包み込む方法などが実用化されている。しかし
ながら、これらの方法では、ケースを導体化することが
困難な場合やシールド効果の信頼性、安定性等が不足す
る場合がある。Conventional electromagnetic shielding methods include making the outer or inner surface of the case of an electronic device a conductor, and wrapping a component such as a printed wiring board with a laminated film of a conductive film and a plastic film. However, with these methods, it may be difficult to make the case conductive, or the reliability and stability of the shielding effect may be insufficient.
問題点を解決するための手段
本発明者は、上記した如き問題点に鑑みて、鋭意研究を
重ねた結果、プリント配線板上に特定の工程によって樹
脂層と電磁シールド層とを積層する方法を用いることに
よれば、樹脂層間に固定された安定なシールド層を有す
るプリント配線板を得ることができ、得られるプリント
配線板は、それ自体が電波遮断機能を有するものとして
、極めて信頼性の高いプリント配線板となることを見出
した。Means for Solving the Problems In view of the above-mentioned problems, the present inventor has conducted extensive research and has devised a method for laminating a resin layer and an electromagnetic shielding layer on a printed wiring board using a specific process. By using this method, it is possible to obtain a printed wiring board having a stable shield layer fixed between the resin layers, and the obtained printed wiring board itself has an extremely reliable radio wave blocking function. It was discovered that it could be used as a printed wiring board.
即ち、本発明は、プリント配線板上に絶縁層を形成し、
次いで、電磁シールド層を形成した後、該シールド層上
に、回路パターン部の80%以上の面積を被覆する範囲
でエツチングレジスト層を形成し、続いて、電磁シール
ド層の露出部をエツチング除去して、絶縁層を部分的に
露出させた後、ソルダーレジスト層を形成することを特
徴とする電波遮蔽プリント配線板の製造法に係る。That is, the present invention forms an insulating layer on a printed wiring board,
Next, after forming an electromagnetic shielding layer, an etching resist layer is formed on the shielding layer in a range covering 80% or more of the area of the circuit pattern, and then the exposed portion of the electromagnetic shielding layer is etched away. The present invention relates to a method for manufacturing a radio wave shielding printed wiring board, characterized in that a solder resist layer is formed after partially exposing an insulating layer.
以下、本発明のプリント配線板の製造法について、第1
図に示す工程図を参照しつつ説明する。Hereinafter, the method for manufacturing a printed wiring board of the present invention will be explained in the first part.
This will be explained with reference to the process diagram shown in the figure.
第1図(イ)は、銅箔による配線回路(1)を形成した
プリント配線板(両面板)の断面図である。本発明では
、プリント配線板としては、従来用いられているものを
いずれも使用することができ、例えば基板材料として、
紙基材フェノール樹脂銅張積層板、紙基材エポキシ樹脂
銅張積層板、ガラス布基材エポキシ樹脂銅張積層板等を
用い、スクリーン印刷法、写真焼付法、サブトラクティ
ブ法、アディティブ法等の公知の方法で配線回路形成を
行なったものを用いることができる。FIG. 1(a) is a sectional view of a printed wiring board (double-sided board) on which a wiring circuit (1) made of copper foil is formed. In the present invention, any conventionally used printed wiring board can be used. For example, as a board material,
Using paper-based phenolic resin copper-clad laminates, paper-based epoxy resin copper-clad laminates, glass cloth-based epoxy resin copper-clad laminates, etc., it is possible to use screen printing methods, photoprinting methods, subtractive methods, additive methods, etc. A wiring circuit formed by a known method can be used.
本発明方法では、まず、プリント配線板上に、樹脂組成
物による絶縁層(2)を形成する(第1図(ロ))。絶
縁層(2)形成用樹脂組成物としては、塗布性、密着性
、耐熱性等の観点から、通常、ソルダーレジストとして
知られている樹脂組成物を用いることが好ましい。ソル
ダーレジストによる絶縁層の形成法としては、特に限定
はなく、従来公知の方法をいずれも適用でき、例えば、
UVソルダーレジストと呼ばれる無溶剤タイプの感光性
液状レジストを用いたスクリーン印刷法によるパターン
形成法、無溶剤タイプ液状ソルダーレジストの写真法に
よるパターン形成法、溶剤タイプ液状ソルダーレジスト
の写真法によるパターン形成法、ドライフィルムソルダ
ーレジストによる絶縁層形成法などが採用できる。絶縁
層(2)を形成する範囲は、プリント配線板の回路面の
うち、部品、リード端子等を装着するためのスルーホー
ル部(3)を除いた回路パターン部、スルーホール部、
ランド部等を充分に被覆できる範囲とすればよい。絶縁
層(2)の厚さは、使用する樹脂の種類に応じて、十分
な絶縁性を確保できる厚さとすればよく、通常20〜1
00μm程度とすればよい。In the method of the present invention, first, an insulating layer (2) made of a resin composition is formed on a printed wiring board (FIG. 1(b)). As the resin composition for forming the insulating layer (2), it is preferable to use a resin composition commonly known as a solder resist from the viewpoints of applicability, adhesion, heat resistance, etc. There are no particular limitations on the method of forming an insulating layer using a solder resist, and any conventionally known method can be applied, for example,
A pattern forming method using a screen printing method using a solvent-free photosensitive liquid resist called UV solder resist, a pattern forming method using a photographic method using a solvent-free liquid solder resist, a pattern forming method using a photographic method using a solvent-type liquid solder resist , an insulating layer formation method using dry film solder resist, etc. can be adopted. The area where the insulating layer (2) is formed is the circuit pattern area, the through-hole area, excluding the through-hole area (3) for mounting components, lead terminals, etc. on the circuit surface of the printed wiring board.
The range may be set so that the land portion etc. can be sufficiently covered. The thickness of the insulating layer (2) may be set to a thickness that can ensure sufficient insulation depending on the type of resin used, and is usually 20 to 1.
The thickness may be approximately 00 μm.
次いで、プリント配線板の全面に、電磁シールド層(4
)を形成する(第1図(ハ))。電磁シールド層(4)
としては、シールド効果を有する導体層として公知のも
のを用いればよく、例えば、蒸着、スパッタリング等の
乾式めっき法、無電解めっき、電気めっき等の湿式めっ
き法等によって形成される導体層を適用できる。特に、
湿式めっき法は、処理が容易であり量産性に優れている
点で有利である。湿式めっき法としては、無電解銅めっ
き、無電解ニッケルめっき等を単独で適用する方法、種
類の異なる無電解めっき被膜を積層する方法、無電解め
っきを行なった後、電気めっきを行なう方法等を適宜採
用できる。このような電磁シールド層(4)の種類とし
ては、銅層、ニッケル層、銅−ニッケル層、ニッケルー
銅層等の各種のものを例示できる。シールド層(4)の
形成方法は、公知の方法に従えばよく、例えば無電解め
っき法としては、常法に従って、被処理物に触媒性を付
与した後、通常の条件に従って、めっき液中に浸漬する
方法でよい。電磁シールド層(4)の厚さは、要求され
るシールド効果を得るために充分な厚さとなるように適
宜設定すればよく、通常は、0.1〜1.0μm程度と
すればよい。シールド効果は、単層シールド層よりも多
層シールド層のほうが向上する場合があり、例えばCu
単層1μmでは、100MHz 、20dB程度ノシ−
ルド効果が得られるのに対して、Cub、5μm−Ni
0.5μmの多層シールド層では100MHz60dB
程度のシールド効果が得られる。Next, an electromagnetic shielding layer (4
) (Figure 1 (c)). Electromagnetic shield layer (4)
For example, a conductor layer formed by a dry plating method such as vapor deposition or sputtering, or a wet plating method such as electroless plating or electroplating can be used as a conductor layer having a shielding effect. . especially,
The wet plating method is advantageous in that it is easy to process and has excellent mass productivity. Wet plating methods include methods of applying electroless copper plating, electroless nickel plating, etc. alone, methods of laminating different types of electroless plating films, and methods of performing electroplating after electroless plating. Can be adopted as appropriate. Examples of the electromagnetic shield layer (4) include a copper layer, a nickel layer, a copper-nickel layer, a nickel-copper layer, and the like. The method for forming the shield layer (4) may be according to a known method. For example, in the electroless plating method, after imparting catalytic properties to the object to be treated according to a conventional method, it is added to a plating solution according to ordinary conditions. A method of immersion is sufficient. The thickness of the electromagnetic shielding layer (4) may be appropriately set so as to be thick enough to obtain the required shielding effect, and is usually about 0.1 to 1.0 μm. The shielding effect may be better with a multi-layer shield layer than with a single-layer shield layer, for example, Cu
For a single layer of 1 μm, the frequency is 100 MHz and about 20 dB.
Cub, 5μm-Ni
100MHz 60dB with 0.5μm multilayer shield layer
A certain degree of shielding effect can be obtained.
電磁シールド層(4)を形成した後、該シールド層上に
、エツチングレジスト層(5)を形成しく第1図(ニ)
)、露出したシールド層をエツチングによって除去して
、部分的に絶縁層の露出部(6)を設ける(第1図(ホ
))。次いで、この上にソルダーレジスト層(7)を形
成することによって、絶縁層(2)とソルダーレジスト
層(7)とが絶縁層の露出部分(6)により、強く結合
され、電磁シールド層(4)は、絶縁層(2)とソルダ
ーレジスト層(7)との間に包まれて固定されて安定化
し、シールド層(4)やレジスト層(5)のズレが防止
される(第1図(へ))。After forming the electromagnetic shield layer (4), an etching resist layer (5) is formed on the shield layer.
), the exposed shield layer is removed by etching to provide a partially exposed portion (6) of the insulating layer (FIG. 1(e)). Next, by forming a solder resist layer (7) on this, the insulating layer (2) and the solder resist layer (7) are strongly coupled by the exposed portion (6) of the insulating layer, and the electromagnetic shielding layer (4) ) is wrapped and fixed between the insulating layer (2) and the solder resist layer (7) and stabilized, preventing the shield layer (4) and the resist layer (5) from shifting (see Figure 1 ( fart)).
露出部分(6)の面積は、特に限定はないが、この部分
の面積を広くすれば、絶縁層(2)とソルダーレジスト
層(7)との間の結合が強固となり、シールド層(4)
やレジスト層(5)を安定に固定化できる。一方、有効
なシールド効果を得るためには、プリント配線板の回路
パターン(1)上の80%以上の面積の部分に電磁シー
ルド層(4)を存在させることが好ましい。従って、エ
ツチングレジスト層(5)は、プリント配線板の回路パ
ターン部上の80%以上の面積を被覆でき、かつ、でき
るだけ多くの絶縁層(2)の露出部が生じるように形成
することが好ましく、このような観点から回路パターン
の形状に応じて、適宜、エツチングレジスト層(5)の
形成範囲を決定すればよい。通常、絶縁層(2)の露出
部(6)の面積が基板全体の5%程度以上となるように
することが適当である。エツチングレジスト層(5)は
、最終的に、プリント配線板に残存するので耐熱性、耐
湿性等が要求され、更に、良好な塗布性、密着性等も必
要である。このため、エツチングレジスト層(5)の形
成用の樹脂組成物としては、前記したような一般に、ソ
ルダーレジストとして知られている樹脂組成物を用いる
ことが好ましい。The area of the exposed portion (6) is not particularly limited, but if the area of this portion is increased, the bond between the insulating layer (2) and the solder resist layer (7) becomes stronger, and the shield layer (4)
and the resist layer (5) can be stably fixed. On the other hand, in order to obtain an effective shielding effect, it is preferable that the electromagnetic shielding layer (4) be present on a portion having an area of 80% or more on the circuit pattern (1) of the printed wiring board. Therefore, it is preferable that the etching resist layer (5) be formed so as to cover 80% or more of the area on the circuit pattern portion of the printed wiring board, and to expose as much of the insulating layer (2) as possible. From this point of view, the formation range of the etching resist layer (5) may be determined as appropriate depending on the shape of the circuit pattern. Normally, it is appropriate that the area of the exposed portion (6) of the insulating layer (2) is approximately 5% or more of the entire substrate. Since the etching resist layer (5) ultimately remains on the printed wiring board, it is required to have heat resistance, moisture resistance, etc., as well as good applicability, adhesion, etc. Therefore, as the resin composition for forming the etching resist layer (5), it is preferable to use the resin composition generally known as a solder resist as described above.
エツチングレジスト層(5)は、エツチング時に電磁シ
ールド層(14)を保護するための充分な厚さがあれば
よく、通常5μm程度以上とすればよい。The etching resist layer (5) only needs to have a sufficient thickness to protect the electromagnetic shielding layer (14) during etching, and usually has a thickness of about 5 μm or more.
電磁シールド層のエツチングは、シールド層の金属の種
類に応じて、常法に従って行なえばよい。Etching of the electromagnetic shielding layer may be carried out according to a conventional method depending on the type of metal of the shielding layer.
一般にシールド層(4)の膜厚は、0.1〜1.0μm
程度であり、配線回路部の導体膜厚(通常20〜30μ
m程度)に比して非常に薄いので、いわゆるソフトエツ
チングの手法を用いることによって、スルーホール部等
の導体を殆んど侵すことな(、シールド層(4)のエツ
チングが可能である。具体的には、例えば過酸化水素−
硫酸系のエツチング液(例えば、ノック■製、0A91
等)を用いて、10〜20秒間程度ソフトエツチングを
行なえばよい。Generally, the thickness of the shield layer (4) is 0.1 to 1.0 μm.
The conductor film thickness of the wiring circuit part (usually 20 to 30μ
The shield layer (4) can be etched by using a so-called soft etching method without almost corroding conductors such as through holes. For example, hydrogen peroxide
Sulfuric acid-based etching solution (for example, Nokku, 0A91)
etc.) for about 10 to 20 seconds.
シールド層(4)のエツチングによって、絶縁層(2)
が部分的に露出し、この上に形成したソルダーレジスト
層(7)は、露出部(6)を通じて、絶縁層(2)と結
合し、シールド層(4)のズレが防止される。ソルダー
レジスト層(7)は、公知のソルダーレジスト用の樹脂
組成物を使用し、常法に従って、部品、リード端子等の
装着用のスルーホール部を除いた部分に形成すればよい
。ソルダーレジスト層(7)の厚さは、特に限定的では
ないが、シールド層(4)形成部分では、5〜20μm
程度、シールド層をエツチング除去した部分(6)では
10μm程度以上とすることが一般的である。By etching the shield layer (4), the insulation layer (2)
is partially exposed, and the solder resist layer (7) formed thereon is bonded to the insulating layer (2) through the exposed portion (6), thereby preventing the shield layer (4) from shifting. The solder resist layer (7) may be formed using a known resin composition for solder resists in accordance with a conventional method except for through holes for mounting components, lead terminals, etc. The thickness of the solder resist layer (7) is not particularly limited, but in the portion where the shield layer (4) is formed, it is 5 to 20 μm.
Generally, the thickness is approximately 10 μm or more in the portion (6) where the shield layer is etched away.
発明の効果
本発明によって得られる電波遮蔽プリント配線板は、配
線板自体に電磁シールド層を有し、しかもシールド層が
樹脂層間に安定に固定されたものであり、外部からの電
磁波の影響や自らの電磁波の発生を抑制し得る極めて信
頼性の高いプリント配線板である。Effects of the Invention The radio wave shielding printed wiring board obtained by the present invention has an electromagnetic shielding layer on the wiring board itself, and the shielding layer is stably fixed between the resin layers, so that it is resistant to the influence of external electromagnetic waves and self-sustaining. This is an extremely reliable printed wiring board that can suppress the generation of electromagnetic waves.
実施例 以下、実施例を示して本発明を更に詳細に説明する。Example Hereinafter, the present invention will be explained in more detail by showing examples.
実施例1
第2図(イ)に示すスクリーン印刷法で作製したプリン
ト配線板を用いて以下の工程により、電波遮蔽プリント
配線板を作製した。図において黒色部分が導体部である
。Example 1 A radio wave shielding printed wiring board was manufactured by the following steps using a printed wiring board manufactured by the screen printing method shown in FIG. 2(A). In the figure, the black part is the conductor part.
(A)絶縁層形成:
溶剤現像型液状フォトソルダーレジスト(商標二PSR
−1000、太陽インキ製造■製)を配線板に塗布し、
80℃×25分の仮乾燥を行なった後、露光、現像を行
ない、次いで150℃で50分本乾燥を行なって、第2
図(ロ)に示すパターンの絶縁層を形成した。白色部が
絶縁層部分であり、膜厚は40μmであった。(A) Insulating layer formation: Solvent developable liquid photo solder resist (trademark 2PSR)
-1000, manufactured by Taiyo Ink Manufacturing ■) on the wiring board,
After preliminary drying at 80°C for 25 minutes, exposure and development were carried out, followed by main drying at 150°C for 50 minutes.
An insulating layer having the pattern shown in Figure (b) was formed. The white part was the insulating layer part, and the film thickness was 40 μm.
(B)電磁シールド層形成:
絶縁層を形成したプリント配線板の全面に、無電解銅め
っき被膜を0.5〜1μm形成した。めっき液としては
、厚付無電解銅めっき液(硫酸銅8〜12g/12.E
、D、T、A、25〜35g/Q、ホルマリン(37%
)5〜10m(2/Q、水酸化ナトリウム5−8
性剤若干量)を用い、pH12〜13、液温40〜60
℃で、15〜30分めっきを行なった。(B) Formation of electromagnetic shield layer: An electroless copper plating film having a thickness of 0.5 to 1 μm was formed on the entire surface of the printed wiring board on which the insulating layer was formed. As a plating solution, thick electroless copper plating solution (copper sulfate 8-12g/12.E
, D, T, A, 25-35g/Q, formalin (37%
)5-10m (2/Q, sodium hydroxide 5-8, some amount of sex agent), pH 12-13, liquid temperature 40-60
Plating was carried out at 15 to 30 minutes.
(C)エツチングレジスト層形成:
絶縁層の形成に用いた液状フォトレジストを用いて、(
A)工程と同様にしてエツチングレジスト層を形成した
。レジスト層のパターンは第2図(ハ)に示す通りであ
り(白色部分がレジスト層)、厚さは16μmであった
。(C) Etching resist layer formation: Using the liquid photoresist used to form the insulating layer, (
An etching resist layer was formed in the same manner as in step A). The pattern of the resist layer was as shown in FIG. 2 (c) (the white part is the resist layer), and the thickness was 16 μm.
(D)エツチング、:
基板をローラー上で一定速度で移動させながら、上、下
面からエツチング液をスプレーできる装置を用い、過酸
化水素−硫酸系のソフトエツチング液を1 kgf/c
m2の圧力で基板の両面に15秒間スプレーすることに
よってエツチングを行なった。(D) Etching: While the substrate is moved at a constant speed on a roller, a hydrogen peroxide-sulfuric acid based soft etching solution is applied at 1 kgf/c using a device that can spray etching solution from the top and bottom surfaces.
Etching was carried out by spraying both sides of the substrate for 15 seconds at a pressure of m2.
(E)ソルダーレジスト形成:
(A)工程で用いた液状フォトレジストにより、(A)
工程と同様の方法でソルダーレジスト層を形成した。ソ
ルダーレジスト層のパターンは、第2図(二)に示す通
りであり(白色部分がレジスト層)、厚さは25μmで
あった。(E) Solder resist formation: (A)
A solder resist layer was formed in the same manner as in the step. The pattern of the solder resist layer was as shown in FIG. 2 (2) (the white part is the resist layer), and the thickness was 25 μm.
以上の工程で得たプリント配線板について、以下の方法
で電波遮蔽効果のテストを行なった。The radio wave shielding effect of the printed wiring board obtained through the above process was tested in the following manner.
即ち、配線板に所定の部品を装着した後、シールドルー
ム内で5 M H zの高周波を入力し、発生する電波
をスペクトル分析器で分析した。比較として用いた電磁
シールド層を設けていない配線板についての発生電波の
スペクトル図を第3図に、0、5μmのシールド層を設
けた配線板についての発生電波のスペクトル図を第4図
に、1μmのシールド層を設けた配線板についての発生
電波のスペクトル図を第5図に示す。第3〜5図を比較
することによって、本発明方法によってシールド層を設
けた配線板では、大きな電波遮蔽効果が得られることが
わかる。That is, after predetermined components were mounted on the wiring board, a high frequency of 5 MHz was input in a shielded room, and the generated radio waves were analyzed with a spectrum analyzer. Figure 3 shows the spectrum diagram of the radio waves generated for the wiring board used for comparison without the electromagnetic shielding layer, and Figure 4 shows the spectrum diagram of the radio waves generated for the wiring board with the shielding layer of 0.5 μm. FIG. 5 shows a spectrum diagram of radio waves generated for a wiring board provided with a 1 μm shield layer. By comparing FIGS. 3 to 5, it can be seen that a large radio wave shielding effect can be obtained in the wiring board provided with the shield layer by the method of the present invention.
第1図は、本発明の工程を示す断面図、第2図は実施例
1において製造したプリント配線板のパターンを表わす
図面、第3図はシールド層を設けていない配線板につい
ての発生電波のスペクトル図、第4図は0. 5μm
のシールド層を設けた配線板についての発生電波のスペ
クトル図、第5図は1μmのシールド層を設けた配線板
についての発生電波のスペクトル図である。
1・・・配線回路、
2・・・絶縁層、
3・・・スルーホール、
4・・・電磁シールド層、
5・・・エツチングレジスト層、
6・・・絶縁層露出部、
7・・・ソルダーレジスト層。
(以
一ト)FIG. 1 is a cross-sectional view showing the process of the present invention, FIG. 2 is a drawing showing the pattern of the printed wiring board manufactured in Example 1, and FIG. 3 is a diagram showing the generated radio waves for a wiring board without a shield layer. The spectrum diagram, Figure 4 is 0. 5 μm
FIG. 5 is a spectrum diagram of generated radio waves for a wiring board provided with a shield layer of 1 μm. FIG. 5 is a spectrum diagram of radio waves generated for a wiring board provided with a 1 μm shield layer. DESCRIPTION OF SYMBOLS 1... Wiring circuit, 2... Insulating layer, 3... Through hole, 4... Electromagnetic shielding layer, 5... Etching resist layer, 6... Insulating layer exposed part, 7... solder resist layer. (more details)
Claims (1)
シールド層を形成した後、該シールド層上に、回路パタ
ーン部の80%以上の面積を被覆する範囲でエッチング
レジスト層を形成し、続いて、電磁シールド層の露出部
をエッチング除去して、絶縁層を部分的に露出させた後
、ソルダーレジスト層を形成することを特徴とする電波
遮蔽プリント配線板の製造法。1. After forming an insulating layer on a printed wiring board and then forming an electromagnetic shielding layer, an etching resist layer is formed on the shielding layer in a range covering 80% or more of the area of the circuit pattern, and then A method for manufacturing a radio wave shielding printed wiring board, comprising: etching away the exposed portion of the electromagnetic shield layer to partially expose the insulating layer, and then forming a solder resist layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1094941A JP2724351B2 (en) | 1989-04-13 | 1989-04-13 | Manufacturing method of radio wave shielding printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1094941A JP2724351B2 (en) | 1989-04-13 | 1989-04-13 | Manufacturing method of radio wave shielding printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02272788A true JPH02272788A (en) | 1990-11-07 |
JP2724351B2 JP2724351B2 (en) | 1998-03-09 |
Family
ID=14123975
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1094941A Expired - Fee Related JP2724351B2 (en) | 1989-04-13 | 1989-04-13 | Manufacturing method of radio wave shielding printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2724351B2 (en) |
-
1989
- 1989-04-13 JP JP1094941A patent/JP2724351B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2724351B2 (en) | 1998-03-09 |
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