JPH06188562A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH06188562A
JPH06188562A JP33728992A JP33728992A JPH06188562A JP H06188562 A JPH06188562 A JP H06188562A JP 33728992 A JP33728992 A JP 33728992A JP 33728992 A JP33728992 A JP 33728992A JP H06188562 A JPH06188562 A JP H06188562A
Authority
JP
Japan
Prior art keywords
copper
plating
hole
layer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33728992A
Other languages
Japanese (ja)
Inventor
Koji Kondo
宏司 近藤
Seiji Amakusa
聖二 天草
Kaoru Nomoto
薫 野本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP33728992A priority Critical patent/JPH06188562A/en
Publication of JPH06188562A publication Critical patent/JPH06188562A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To form a conductor circuit in a stable manner by sufficiently securing the close contact between a board and an electroless copper plated layer in the manufacture of a printed wiring board in which a copper-clad laminated sheet is used. CONSTITUTION:This manufacturing method is composed of a process in which a base copper pattern 12', having the shape corresponding to the prescribed wiring pattern, is formed, a process in which a plated resist layer 15 is formed on the insulative board surface region 13 exposed by etching, a process in which a through hole 14 is formed before conduction of a thick electroless copper plating process, and a process in which a thick electroless copper plated layer 16 in thickness required for the prescribed wiring is formed on the base copper pattern 12' and on the inner wall of the through hole 14.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、銅張積層板を用いたプ
リント配線板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board using a copper clad laminate.

【0002】[0002]

【従来の技術】従来のプリント配線板の製造方法は、導
体回路の形成方法によって、以前から普及しているサブ
トラクティブ法および新しく開発されたアディティブ法
の2つに大別される。サブトラクティブ法は、典型的に
は図6に示す手順で導体回路を形成する。
2. Description of the Related Art Conventional methods for manufacturing printed wiring boards are roughly classified into two methods, that is, a subtractive method which has been widely used and a newly developed additive method, depending on the method of forming a conductor circuit. The subtractive method typically forms a conductor circuit by the procedure shown in FIG.

【0003】絶縁性基板61の両面に銅皮膜62を被着
させた銅張積層板60を用い(同図(a))、これにス
ルーホール63を穴開け(同図(b))した後、スルー
ホール63の内壁面および両側の銅皮膜62上に下地め
っきとしての薄付け無電解銅めっき64(同図(c))
とその上の本めっきとしての厚付け電解銅めっき65
(同図(d))とを施す。その後、銅皮膜62、薄付無
電解銅めっき層64および厚付け電解銅めっき層65を
エッチングにより一括加工して導体配線66とする(同
図(e))。その後、電子素子を半田付けする部位67
以外をオーバーコート68で被覆してプリント配線板6
9を得る(同図(f))。
After using a copper clad laminate 60 in which a copper film 62 is adhered on both sides of an insulating substrate 61 (FIG. 2 (a)), through holes 63 are punched (FIG. 2 (b)). , A thin electroless copper plating 64 as a base plating on the inner wall surface of the through hole 63 and on the copper coatings 62 on both sides ((c) of the same figure).
And thick electrolytic copper plating as main plating on it 65
((D) in the figure). Then, the copper coating 62, the thin electroless copper plating layer 64, and the thick electrolytic copper plating layer 65 are collectively processed by etching to form a conductor wiring 66 (FIG. 8E). After that, the part 67 for soldering the electronic element
The other parts are covered with the overcoat 68 to form the printed wiring board 6
9 is obtained ((f) in the figure).

【0004】しかし、サブトラクティブ法は導体配線の
主要部分を電解銅めっきにより形成するため、微細なス
ルーホール内の導体層形成に限界があり、プリント配線
板の高密度・小型化に限界があった。そこで、サブトラ
クティブ法に代わってプリント配線板の高密度・小型化
に対応できる方法として、無電解銅めっきにより導体回
路を形成するアディティブ法が注目されている。
However, since the subtractive method forms the main part of the conductor wiring by electrolytic copper plating, there is a limit in forming a conductor layer in a fine through hole, and there is a limit in reducing the density and size of a printed wiring board. It was Therefore, an additive method of forming a conductor circuit by electroless copper plating has attracted attention as a method that can cope with high density and downsizing of a printed wiring board instead of the subtractive method.

【0005】アディティブ法は、絶縁性基板上に直接に
無電解銅めっきを形成する方法であり、典型的な手順は
図5のとおりである。絶縁性基板50(同図(a))を
用い、その両面に無電解銅めっき層を密着させるためN
BR系やエポキシ系等の接着剤の層51(同図(b))
を形成する。加えて、密着性を十分に確保するには、接
着剤層の表面を酸化剤で化学粗化し、そのアンカー効果
を利用する。同図(c)に、化学粗化、スルーホール5
2の穴開け、および触媒処理を行った状態を示す。次
に、基板50の配線形成部以外をマスクするめっきレジ
スト53(同図(d))を形成した後、導体配線として
の無電解銅めっき層54を形成する(同図(e))。そ
の後、電子素子を半田付けする部位55以外をオーバー
コート56で被覆してプリント配線板57を得る(同図
(f))。
The additive method is a method of directly forming electroless copper plating on an insulating substrate, and a typical procedure is as shown in FIG. In order to adhere the electroless copper-plated layer to both surfaces of the insulating substrate 50 ((a) in the figure), N
BR-based or epoxy-based adhesive layer 51 (FIG. 2B)
To form. In addition, in order to secure sufficient adhesion, the surface of the adhesive layer is chemically roughened with an oxidizing agent and the anchor effect is used. In the same figure (c), chemical roughening, through hole 5
2 shows a state in which hole 2 and catalyst treatment are performed. Next, after forming a plating resist 53 (FIG. 3D) that masks the area other than the wiring forming portion of the substrate 50, an electroless copper plating layer 54 is formed as a conductor wiring (FIG. 2E). After that, the printed wiring board 57 is obtained by covering the portion other than the portion 55 where the electronic element is soldered with the overcoat 56 (FIG. 7F).

【0006】しかし上記アディティブ法は、粗化および
接着剤塗布が不均一になり易いため基板50と無電解銅
めっき層54との密着力にばらつきが発生する上、粗化
工程にクロム酸等の有毒物質を用いるため環境保全の観
点からも問題があった。上記サブトラクティブ法および
アディティブ法の欠点を解消する方法として、いわゆる
パートリーアディティブ法が提案されている(特開昭6
1−190797号公報等)。この方法は、サブトラク
ティブ法と同様に銅張積層板を用い、基板面の導体配線
をエッチングにより形成した後、スルーホール内の導体
部分を無電解銅めっきにより形成するものである。
However, in the above-mentioned additive method, since the roughening and the application of the adhesive are likely to be non-uniform, the adhesion between the substrate 50 and the electroless copper plating layer 54 varies, and chromic acid or the like is used in the roughening step. There is also a problem from the viewpoint of environmental protection because it uses toxic substances. As a method for solving the drawbacks of the subtractive method and the additive method, a so-called "partial additive method" has been proposed (Japanese Patent Laid-Open Publication No. Sho 6-96).
1-190797, etc.). This method uses a copper clad laminate as in the subtractive method, forms conductor wiring on the substrate surface by etching, and then forms conductor portions in through holes by electroless copper plating.

【0007】しかしパートリーアディティブ法には次の
欠点があった。すなわち、スルーホール内の無電解銅め
っきを行う際には、スルーホール内壁以外の部分はめっ
きレジストで被覆する必要があり、既にエッチングによ
り形成されている基板面上の銅配線部分もこのめっきレ
ジストで被覆される。ここで、めっきレジストは基板の
樹脂との密着力は比較的大きいが配線の銅との密着力は
小さいため、スルーホール内の無電解銅めっき処理中に
めっきレジストが銅配線部分との界面で剥離し易いとい
う問題があった。
However, the partly additive method has the following drawbacks. That is, when performing electroless copper plating in the through holes, it is necessary to cover the parts other than the inner walls of the through holes with a plating resist, and the copper wiring parts already formed by etching on the substrate surface are also covered with this plating resist. Is covered with. Here, the adhesion of the plating resist to the resin of the substrate is relatively large, but the adhesion of the wiring to copper is small, so during the electroless copper plating process in the through hole, the plating resist is not There was a problem of easy peeling.

【0008】[0008]

【発明が解決しようとする課題】そこで本発明は、化学
粗化も接着剤も必要とせず、無電解銅めっき処理中のめ
っきレジスト剥離の問題も回避して、基板と無電解銅め
っき層との密着性を十分に確保し安定して導体回路を形
成できるプリント配線板の製造方法を提供することを目
的とする。
Therefore, the present invention does not require chemical roughening or adhesives, avoids the problem of stripping of the plating resist during the electroless copper plating process, and provides a substrate and an electroless copper plating layer. It is an object of the present invention to provide a method for manufacturing a printed wiring board, which is capable of forming a conductor circuit in a stable manner while ensuring sufficient adhesion.

【0009】[0009]

【課題を解決するための手段】上記の目的は、本発明に
よれば、絶縁性基板とその両面の銅皮膜とを含む銅張積
層板の、該銅皮膜を含む下地銅層をエッチングすること
により、所定配線パターンに対応した形の下地銅パター
ンを形成する工程、上記エッチングにより上記所定配線
パターンを反転した形に露出された絶縁性基板表面領域
にめっきレジスト層を形成する工程、下記厚付け無電解
銅めっき工程より前に、上記銅張積層板にスルーホール
の穴開けを行う工程、および上記下地銅パターン上およ
び上記スルーホールの内壁に所定配線に必要な厚さの厚
付け無電解銅めっき層を形成する工程を含むことを特徴
とするプリント配線板の製造方法によって達成される。
According to the present invention, the above object is to etch a base copper layer containing a copper coating of a copper clad laminate including an insulating substrate and copper coatings on both sides thereof. A step of forming a base copper pattern having a shape corresponding to the predetermined wiring pattern, a step of forming a plating resist layer on the insulating substrate surface region exposed in a shape in which the predetermined wiring pattern is inverted by the etching, the following thickening Prior to the electroless copper plating step, a step of forming a through hole in the copper clad laminate, and a thick electroless copper layer having a thickness necessary for predetermined wiring on the underlying copper pattern and on the inner wall of the through hole. It is achieved by a method for manufacturing a printed wiring board, which includes a step of forming a plating layer.

【0010】[0010]

【作用】本発明は、(1)配線に必要な厚さの厚付け無
電解銅めっきを、絶縁性基板上に直接にではなく、絶縁
性基板上の下地銅パターン上に行うので、従来アディテ
ィブ法では不可欠であった接着剤塗布も化学粗化も必要
とせず、また(2)この厚付け無電解銅めっきを下地銅
パターン上に選択的に行うためのめっきレジスト層を絶
縁性基板(通常は樹脂製)の露出部分に形成するので、
めっきレジスト層が絶縁性基板に強固に密着した状態で
厚付け無電解銅めっきを行うことができ、従来のパート
リーアディティブ法では不可避的に存在しためっきレジ
スト層と無電解銅めっき層との実質的な界面が存在しな
いので、めっきレジスト層の剥離現象が生ずることが無
く、安定して導体回路を形成することができる。
According to the present invention, (1) the thick electroless copper plating necessary for wiring is performed not on the insulating substrate directly but on the underlying copper pattern on the insulating substrate. No adhesive coating or chemical roughening, which was essential in the method, is required, and (2) a plating resist layer for selectively performing this thick electroless copper plating on the underlying copper pattern is formed on an insulating substrate (usually Is formed on the exposed part of resin),
It is possible to perform thick electroless copper plating while the plating resist layer is firmly adhered to the insulating substrate. Since such an interface does not exist, a peeling phenomenon of the plating resist layer does not occur and a conductor circuit can be stably formed.

【0011】なお、めっきレジスト層はその周縁部が下
地銅パターンの周縁上にかかる程度に形成されていて
も、レジスト主部と基板との間で実質的な密着性が確保
されるので、従来のパートリーアディティブ法のような
レジストの剥離が生ずる恐れは無い。本発明の方法にお
いては、銅張積層板として、絶縁性基板とその両面の銅
皮膜とから成る両面配線板を用いた場合にも、絶縁性基
板とその両面の銅皮膜および基板内部の銅配線層(銅
箔)とから成る多層配線板を用いた場合にも、同様の効
果が得られる。
Even if the peripheral edge portion of the plating resist layer is formed so as to cover the peripheral edge portion of the underlying copper pattern, substantial adhesion is ensured between the resist main portion and the substrate. There is no risk of resist peeling as in the case of the Partial Additive method. In the method of the present invention, even when a double-sided wiring board composed of an insulating substrate and copper films on both surfaces thereof is used as the copper-clad laminate, the insulating substrate and the copper films on both surfaces thereof and the copper wiring inside the substrate are also used. The same effect can be obtained when a multilayer wiring board including layers (copper foil) is used.

【0012】下地銅層は、銅張積層板の銅皮膜のみであ
っても良く、またその上に下地めっきとして形成した薄
付け無電解銅めっき層までを含んでも良い。スルーホー
ルの穴開けは、下地銅層のエッチングの後、めっきレジ
スト層形成の前に行っても良く、あるいは上記エッチン
グの前に行っても良い。後者の場合には、エッチング前
の穴開けにより形成されたスルーホールの内壁に薄付け
無電解銅めっきを行うこともできる。
The underlying copper layer may be only the copper film of the copper clad laminate, or may include a thin electroless copper plating layer formed as underlying plating thereon. The through holes may be bored after the base copper layer is etched and before the plating resist layer is formed, or before the above etching. In the latter case, it is also possible to perform thin electroless copper plating on the inner wall of the through hole formed by drilling before etching.

【0013】本発明においては一般に、所定導体回路を
構成する厚付け無電解銅めっきを行った後に、この厚付
け無電解銅めっき層(導体回路)およびめっきレジスト
の所定領域を覆うオーバーコートを形成する。以下に、
実施例により本発明を更に詳細に説明する。
In the present invention, generally, after performing thick electroless copper plating which constitutes a predetermined conductor circuit, an overcoat for covering a predetermined region of the thick electroless copper plating layer (conductor circuit) and plating resist is formed. To do. less than,
The present invention will be described in more detail by way of examples.

【0014】[0014]

【実施例】図1〜図4に、それぞれ本発明に従ってプリ
ント配線板を製造する手順の例を示す。これらの図にお
いては、同一部位は同一の参照符号で示した。 〔実施例1〕本発明により図1に示す手順でプリント配
線板を製造した。 (工程1)樹脂製の絶縁性基板11の両面に銅箔12が
被着された銅張積層板10(同図(a))を用い、従来
のサブトラクティブ法と同様の方法で銅箔12をエッチ
ングして所定配線パターンの下地銅パターン12’を形
成する(同図(b))。下地銅パターン12’以外の部
分13は絶縁性基板11が露出している。 (工程2)NCドリル等により銅張積層板10の所定箇
所にスルーホール14を穴開けする(同図(c))。 (工程3)触媒処理をした後(触媒入り銅張積層板を用
いた場合には不要)、スクリーン印刷または感光性レジ
ストの塗布・露光・現像により、基板11の露出部分に
めっきレジスト層15を形成する(同図(d))。レジ
スト層15はその周縁部が下地銅パターン12’の周縁
上にかかった状態になっている(図中にAで表示した箇
所)。 (工程4)下地銅パターン12’上およびスルーホール
14の内壁に、導体回路として厚付け無電解銅めっき層
16を形成する(同図(e))。 (工程5)電子素子の半田付け箇所17以外をオーバー
コート18で被覆してプリント配線板19を得る(同図
(f))。
1 to 4 show examples of procedures for manufacturing a printed wiring board according to the present invention. In these figures, the same parts are designated by the same reference numerals. Example 1 A printed wiring board was manufactured according to the present invention by the procedure shown in FIG. (Step 1) Using a copper-clad laminate 10 (FIG. 1A) in which copper foils 12 are adhered on both sides of an insulating substrate 11 made of resin, a copper foil 12 is formed by a method similar to the conventional subtractive method. Is etched to form a base copper pattern 12 'having a predetermined wiring pattern (FIG. 7B). The insulating substrate 11 is exposed in a portion 13 other than the underlying copper pattern 12 '. (Step 2) A through hole 14 is bored at a predetermined portion of the copper clad laminate 10 with an NC drill or the like (FIG. 2 (c)). (Step 3) After the catalyst treatment (not necessary when a copper clad laminate containing a catalyst is used), a plating resist layer 15 is formed on the exposed portion of the substrate 11 by screen printing or application / exposure / development of a photosensitive resist. To be formed ((d) in the figure). The peripheral edge of the resist layer 15 is in a state of being laid over the peripheral edge of the underlying copper pattern 12 ′ (the portion indicated by A in the figure). (Step 4) A thick electroless copper plating layer 16 is formed as a conductor circuit on the underlying copper pattern 12 ′ and on the inner wall of the through hole 14 (FIG. 8E). (Step 5) The printed wiring board 19 is obtained by covering the parts other than the soldering points 17 of the electronic element with the overcoat 18 ((f) of the same figure).

【0015】通常はその後、従来のサブトラクティブ法
と同様に、文字印刷、ソルダーコート、外形加工等を行
う。 〔実施例2〕本発明により図2に示す手順でプリント配
線板を製造した。実施例1と同様の条件で行ったが、め
っきレジスト15の断面形状を、下地銅パターン12’
にかからないように変更した。 〔実施例3〕本発明により図3に示す手順でプリント配
線板を製造した。
Usually, thereafter, character printing, solder coating, outer shape processing and the like are performed as in the conventional subtractive method. Example 2 A printed wiring board was manufactured according to the present invention by the procedure shown in FIG. The conditions were the same as in Example 1, but the cross-sectional shape of the plating resist 15 was changed to the underlying copper pattern 12 ′.
I changed it so that it would not be a problem. Example 3 A printed wiring board was manufactured according to the present invention by the procedure shown in FIG.

【0016】実施例2と同様の条件で行ったが、スルー
ホール14の穴開け工程と下地銅パターン12’形成の
ためのエッチング工程の順序を入れ換えた。 〔実施例4〕本発明により図4に示す手順でプリント配
線板を製造した。 (工程1)樹脂製の絶縁性基板11の両面に銅箔12が
被着された銅張積層板10(同図(a))を用い、NC
ドリル等により銅張積層板10の所定箇所にスルーホー
ル14を穴開けする(同図(b))。 (工程2)触媒処理を行った後、無電解銅めっきにより
銅箔12上およびスルーホール14の内壁に厚さ数μm
の薄付け銅めっき層20を形成した(同図(c))。 (工程3)従来のサブトラクティブ法と同様の方法で銅
箔12および薄付け銅めっき層20をエッチングして所
定配線パターンの下地銅パターン12’を形成する(同
図(d))。下地銅パターン12’以外の部分13は絶
縁性基板11が露出している。 (工程4)触媒処理をした後(触媒入り銅張積層板を用
いた場合には不要)、スクリーン印刷または感光性レジ
ストの塗布・露光・現像により、基板11の露出部分に
めっきレジスト層15を形成する(同図(e))。レジ
スト層15は下地銅パターン12’にかからない状態に
なっている。 (工程5)下地銅パターン12’上およびスルーホール
14の内壁に、導体回路として厚付け無電解銅めっき層
16を形成する(同図(f))。
The same procedure as in Example 2 was carried out, but the order of the step of forming the through hole 14 and the etching step for forming the underlying copper pattern 12 'was exchanged. Example 4 A printed wiring board was manufactured according to the present invention by the procedure shown in FIG. (Step 1) Using a copper-clad laminate 10 (FIG. 1A) in which copper foils 12 are adhered on both sides of an insulating substrate 11 made of resin, NC
Through holes 14 are drilled at predetermined locations on the copper-clad laminate 10 with a drill or the like (FIG. 2B). (Step 2) After catalytic treatment, electroless copper plating is applied to form a thickness of several μm on the copper foil 12 and the inner wall of the through hole 14.
The thin copper-plated layer 20 was formed (FIG. 2 (c)). (Step 3) The copper foil 12 and the thin copper plating layer 20 are etched by a method similar to the conventional subtractive method to form a base copper pattern 12 ′ having a predetermined wiring pattern (FIG. 3 (d)). The insulating substrate 11 is exposed in a portion 13 other than the underlying copper pattern 12 '. (Step 4) After the catalyst treatment (not necessary when a copper clad laminate containing a catalyst is used), a plating resist layer 15 is formed on the exposed portion of the substrate 11 by screen printing or application / exposure / development of a photosensitive resist. It is formed ((e) in the figure). The resist layer 15 is in a state of not covering the underlying copper pattern 12 '. (Step 5) A thick electroless copper plating layer 16 is formed as a conductor circuit on the underlying copper pattern 12 ′ and on the inner wall of the through hole 14 (FIG. 5F).

【0017】以降の工程は実施例1と同様に、オーバー
コート形成、文字印刷、ソルダーコート、外形加工等を
行う。以上の実施例1〜4で製造したプリント配線板
は、いずれもφ0.1mmの小径スルーホールでも安定
して銅導体部を形成することができ(銅張積層板の板厚
1.6mmの場合)、まためっきレジストと同じレベル
にまで厚付け無電解銅めっきによる銅配線を形成できる
ので仕上がり表面もフラットな形状であり、半田ブリッ
ジ等が起こりにくくSMD部品の実装性も良好である。
In the subsequent steps, overcoat formation, character printing, solder coating, outer shape processing and the like are performed as in the first embodiment. Each of the printed wiring boards manufactured in Examples 1 to 4 described above can stably form a copper conductor portion even in a small-diameter through hole having a diameter of 0.1 mm (when the thickness of the copper-clad laminate is 1.6 mm). ) Further, since the copper wiring can be formed to the same level as the plating resist by the electroless copper plating, the finished surface has a flat shape, and solder bridges are less likely to occur, and the mountability of SMD components is good.

【0018】しかも、アディティブ法で問題となった基
板と銅箔との密着性も十分確保される上、アディティブ
法特有の接着層を必要としないので材料選択の幅も広が
り、多種多様な用途への適用が可能になった。また、無
電解銅めっき処理の際に、パートリーアディティブ法に
見られた銅とめっきレジストとの実質的な界面が存在し
ないので、めっきレジストの剥離が起こることがない。
そして、オーバーコートを形成することにより、アディ
ティブ法タイプのファインライン・プリント板を製造す
ることができる。
In addition, the adhesion between the substrate and the copper foil, which has been a problem in the additive method, is sufficiently secured, and since the adhesive layer peculiar to the additive method is not required, the range of material selection is widened, and it can be used in various applications. Can be applied. Further, during the electroless copper plating treatment, since the substantial interface between the copper and the plating resist, which is found in the partly additive method, does not exist, the plating resist does not peel off.
Then, by forming the overcoat, a fine line printed board of the additive method type can be manufactured.

【0019】更に、触媒付与による活性化処理後に直ち
に無電解銅めっきを行うことができるので、スルーホー
ル内での銅導体の密着性が良好であり、活性化面がレジ
ストに触れることがないのでレジストによる汚染も生じ
ない。その上、配線間にめっき触媒等の活性化剤が残留
することがないので、配線間での絶縁性も良好に確保さ
れる。
Further, since the electroless copper plating can be performed immediately after the activation treatment by applying the catalyst, the adhesion of the copper conductor in the through hole is good and the activated surface does not touch the resist. There is no contamination by the resist. In addition, since the activator such as the plating catalyst does not remain between the wirings, good insulation between the wirings can be ensured.

【0020】また、均一な銅皮膜または下地銅層をエッ
チングするので、微細回路の形成が可能であり、めっき
レジストが存在することにより無電解銅めっきを選択的
に行うことができる。更に、本出願人が特開平1−16
8871号公報で提案した、トリエタノールアミン(T
EA)等のトリアルカノールモノアミンまたはその塩を
錯化剤かつ加速剤として用いる高速無電解銅めっきを用
いることにより、処理を高速化できる。
Further, since the uniform copper film or the underlying copper layer is etched, a fine circuit can be formed, and the presence of the plating resist enables selective electroless copper plating. Furthermore, the applicant of the present invention has disclosed that
Triethanolamine (T
The treatment can be sped up by using high-speed electroless copper plating using a trialkanol monoamine such as EA) or a salt thereof as a complexing agent and an accelerator.

【0021】[0021]

【発明の効果】以上説明したように、本発明によれば、
一方では銅張積層板を出発基材として用いることにより
安定した密着力を確保すると同時に、他方ではアディテ
ィブ法本来の利点であるファインライン性を生かすこと
ができ、且つ接着剤塗布工程および化学粗化工程を必要
としないので工程省略による利点も併せて得られる。
As described above, according to the present invention,
On the one hand, the copper-clad laminate is used as the starting substrate to secure stable adhesion, while on the other hand, the fine line property, which is the original advantage of the additive method, can be utilized, and the adhesive coating process and chemical roughening can be performed. Since no process is required, the advantage of omitting the process is also obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明によるプリント配線板の製造工程の例を
示す断面図である。
FIG. 1 is a cross-sectional view showing an example of a manufacturing process of a printed wiring board according to the present invention.

【図2】本発明によるプリント配線板の製造工程の例を
示す断面図である。
FIG. 2 is a cross-sectional view showing an example of a manufacturing process of a printed wiring board according to the present invention.

【図3】本発明によるプリント配線板の製造工程の例を
示す断面図である。
FIG. 3 is a cross-sectional view showing an example of a manufacturing process of a printed wiring board according to the present invention.

【図4】本発明によるプリント配線板の製造工程の例を
示す断面図である。
FIG. 4 is a cross-sectional view showing an example of a manufacturing process of a printed wiring board according to the present invention.

【図5】従来のアディティブ法による典型的なプリント
配線板製造工程を示す断面図である。
FIG. 5 is a cross-sectional view showing a typical printed wiring board manufacturing process by a conventional additive method.

【図6】従来のサブトラクティブ法による典型的なプリ
ント配線板製造工程を示す断面図である。
FIG. 6 is a cross-sectional view showing a typical printed wiring board manufacturing process by a conventional subtractive method.

【符号の説明】[Explanation of symbols]

10…銅張積層板 11…絶縁性基板(樹脂製) 12…銅皮膜 12’…下地銅パターン 13…エッチングにより露出された絶縁性基板11の表
面部分 14…スルーホール 15…めっきレジスト 16…厚付け無電解銅めっき層
10 ... Copper-clad laminate 11 ... Insulating substrate (made of resin) 12 ... Copper film 12 '... Underlying copper pattern 13 ... Surface portion of insulating substrate 11 exposed by etching 14 ... Through hole 15 ... Plating resist 16 ... Thickness Attached electroless copper plating layer

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性基板とその両面の銅皮膜とを含む
銅張積層板の、該銅皮膜を含む下地銅層をエッチングす
ることにより、所定配線パターンに対応した形の下地銅
パターンを形成する工程、 上記エッチングにより上記所定配線パターンを反転した
形に露出された絶縁性基板表面領域にめっきレジスト層
を形成する工程、 下記厚付け無電解銅めっき工程より前に、上記銅張積層
板にスルーホールの穴開けを行う工程、および上記下地
銅パターン上および上記スルーホールの内壁に所定配線
に必要な厚さの厚付け無電解銅めっき層を形成する工程
を含むことを特徴とするプリント配線板の製造方法。
1. A base copper pattern having a shape corresponding to a predetermined wiring pattern is formed by etching a base copper layer containing a copper coating of a copper clad laminate including an insulating substrate and copper coatings on both sides thereof. The step of forming a plating resist layer on the insulating substrate surface region exposed in a shape in which the predetermined wiring pattern is inverted by the etching, and before the thick electroless copper plating step described below, the copper clad laminate is formed. A printed wiring characterized by including a step of boring a through hole, and a step of forming a thick electroless copper plating layer having a thickness necessary for a predetermined wiring on the underlying copper pattern and on the inner wall of the through hole. Method of manufacturing a plate.
【請求項2】 前記銅張積層板は、前記絶縁性基板とそ
の両面の銅皮膜とから成る両面配線板であるか、または
前記絶縁性基板とその両面の銅皮膜および該基板内部の
銅配線層とから成る多層配線板であることを特徴とする
請求項1記載の方法。
2. The copper clad laminate is a double-sided wiring board comprising the insulating substrate and copper coatings on both sides thereof, or the insulating substrate and the copper coatings on both sides thereof and copper wiring inside the substrate. The method of claim 1 which is a multilayer wiring board comprising layers.
【請求項3】 前記下地銅層は前記銅皮膜から成るか、
または前記銅皮膜とその上の薄付け無電解銅めっき層と
から成ることを特徴とする請求項1または2に記載の方
法。
3. The base copper layer comprises the copper coating,
Alternatively, the method according to claim 1 or 2, comprising the copper coating and a thin electroless copper plating layer formed on the copper coating.
【請求項4】 前記スルーホールの穴開けを、前記エッ
チング工程より後に行うことを特徴とする請求項1から
3までのいずれか1項に記載の方法。
4. The method according to claim 1, wherein the through hole is drilled after the etching step.
【請求項5】 前記スルーホールの穴開けを、前記エッ
チング工程より前に行うことを特徴とする請求項1から
3までのいずれか1項に記載の方法。
5. The method according to claim 1, wherein the through hole is drilled before the etching step.
【請求項6】 前記スルーホール穴開け工程より後且つ
前記エッチング工程より前に、前記下地銅層上および前
記スルーホール内壁に薄付け無電解銅めっきを行うこと
を特徴とする請求項5記載の方法。
6. The thin electroless copper plating is performed on the underlying copper layer and on the inner wall of the through hole after the through hole drilling step and before the etching step. Method.
【請求項7】 前記厚付け無電解銅めっきの後に、該厚
付け無電解銅めっき層および前記めっきレジストの所定
領域を覆うオーバーコートを形成することを特徴とする
請求項1から6までのいずれか1項に記載の方法。
7. The overcoat which covers the predetermined area of the thick electroless copper plating layer and the plating resist is formed after the thick electroless copper plating. The method according to item 1.
JP33728992A 1992-12-17 1992-12-17 Manufacture of printed wiring board Pending JPH06188562A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33728992A JPH06188562A (en) 1992-12-17 1992-12-17 Manufacture of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33728992A JPH06188562A (en) 1992-12-17 1992-12-17 Manufacture of printed wiring board

Publications (1)

Publication Number Publication Date
JPH06188562A true JPH06188562A (en) 1994-07-08

Family

ID=18307221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33728992A Pending JPH06188562A (en) 1992-12-17 1992-12-17 Manufacture of printed wiring board

Country Status (1)

Country Link
JP (1) JPH06188562A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100905567B1 (en) * 2007-06-07 2009-07-02 삼성전기주식회사 Fabricating Method of Printed Circuit Board
JP2019114722A (en) * 2017-12-25 2019-07-11 住友電工プリントサーキット株式会社 Printed wiring board and method of manufacturing printed wiring board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100905567B1 (en) * 2007-06-07 2009-07-02 삼성전기주식회사 Fabricating Method of Printed Circuit Board
JP2019114722A (en) * 2017-12-25 2019-07-11 住友電工プリントサーキット株式会社 Printed wiring board and method of manufacturing printed wiring board

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