JPH0225496B2 - - Google Patents

Info

Publication number
JPH0225496B2
JPH0225496B2 JP56078736A JP7873681A JPH0225496B2 JP H0225496 B2 JPH0225496 B2 JP H0225496B2 JP 56078736 A JP56078736 A JP 56078736A JP 7873681 A JP7873681 A JP 7873681A JP H0225496 B2 JPH0225496 B2 JP H0225496B2
Authority
JP
Japan
Prior art keywords
silicone rubber
pattern
ionizing radiation
silicone
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56078736A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57195251A (en
Inventor
Hitoshi Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP7873681A priority Critical patent/JPS57195251A/ja
Publication of JPS57195251A publication Critical patent/JPS57195251A/ja
Publication of JPH0225496B2 publication Critical patent/JPH0225496B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7873681A 1981-05-26 1981-05-26 Formation of picture Granted JPS57195251A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7873681A JPS57195251A (en) 1981-05-26 1981-05-26 Formation of picture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7873681A JPS57195251A (en) 1981-05-26 1981-05-26 Formation of picture

Publications (2)

Publication Number Publication Date
JPS57195251A JPS57195251A (en) 1982-11-30
JPH0225496B2 true JPH0225496B2 (enExample) 1990-06-04

Family

ID=13670165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7873681A Granted JPS57195251A (en) 1981-05-26 1981-05-26 Formation of picture

Country Status (1)

Country Link
JP (1) JPS57195251A (enExample)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5146443B2 (enExample) * 1973-11-19 1976-12-09

Also Published As

Publication number Publication date
JPS57195251A (en) 1982-11-30

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