JPH0225496B2 - - Google Patents
Info
- Publication number
- JPH0225496B2 JPH0225496B2 JP56078736A JP7873681A JPH0225496B2 JP H0225496 B2 JPH0225496 B2 JP H0225496B2 JP 56078736 A JP56078736 A JP 56078736A JP 7873681 A JP7873681 A JP 7873681A JP H0225496 B2 JPH0225496 B2 JP H0225496B2
- Authority
- JP
- Japan
- Prior art keywords
- silicone rubber
- pattern
- ionizing radiation
- silicone
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920002379 silicone rubber Polymers 0.000 claims description 40
- 239000004945 silicone rubber Substances 0.000 claims description 40
- 239000000203 mixture Substances 0.000 claims description 29
- 230000005865 ionizing radiation Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 6
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 5
- 125000005395 methacrylic acid group Chemical group 0.000 claims description 4
- 150000001282 organosilanes Chemical class 0.000 claims description 2
- 125000005375 organosiloxane group Chemical group 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- 229920001296 polysiloxane Polymers 0.000 description 22
- -1 polypropylene Polymers 0.000 description 19
- 229920006267 polyester film Polymers 0.000 description 13
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 11
- 238000010894 electron beam technology Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 239000004698 Polyethylene Substances 0.000 description 7
- 239000000123 paper Substances 0.000 description 7
- 229920000573 polyethylene Polymers 0.000 description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000000962 organic group Chemical group 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 229920005645 diorganopolysiloxane polymer Polymers 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- UUGXDEDGRPYWHG-UHFFFAOYSA-N (dimethylamino)methyl 2-methylprop-2-enoate Chemical compound CN(C)COC(=O)C(C)=C UUGXDEDGRPYWHG-UHFFFAOYSA-N 0.000 description 1
- KAJBSGLXSREIHP-UHFFFAOYSA-N 2,2-bis[(2-sulfanylacetyl)oxymethyl]butyl 2-sulfanylacetate Chemical group SCC(=O)OCC(CC)(COC(=O)CS)COC(=O)CS KAJBSGLXSREIHP-UHFFFAOYSA-N 0.000 description 1
- JJBFVQSGPLGDNX-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)COC(=O)C(C)=C JJBFVQSGPLGDNX-UHFFFAOYSA-N 0.000 description 1
- KGPXEVIKDFHEEZ-UHFFFAOYSA-N 2-(dibenzylamino)ethyl prop-2-enoate Chemical compound C=1C=CC=CC=1CN(CCOC(=O)C=C)CC1=CC=CC=C1 KGPXEVIKDFHEEZ-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 1
- WGRZHLPEQDVPET-UHFFFAOYSA-N 2-methoxyethoxysilane Chemical compound COCCO[SiH3] WGRZHLPEQDVPET-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- NIAGUSHJWAMKBZ-UHFFFAOYSA-N 2-methylprop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound CC(=C)C(O)=O.NC1=NC(N)=NC(N)=N1 NIAGUSHJWAMKBZ-UHFFFAOYSA-N 0.000 description 1
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- VFZKVQVQOMDJEG-UHFFFAOYSA-N 2-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(=O)C=C VFZKVQVQOMDJEG-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NOEMSRWQFGPZQS-UHFFFAOYSA-N CCC(O)=S.CCC(O)=S.CCC(O)=S.CCC(CO)(CO)CO Chemical compound CCC(O)=S.CCC(O)=S.CCC(O)=S.CCC(CO)(CO)CO NOEMSRWQFGPZQS-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- RUDUCNPHDIMQCY-UHFFFAOYSA-N [3-(2-sulfanylacetyl)oxy-2,2-bis[(2-sulfanylacetyl)oxymethyl]propyl] 2-sulfanylacetate Chemical compound SCC(=O)OCC(COC(=O)CS)(COC(=O)CS)COC(=O)CS RUDUCNPHDIMQCY-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229920003244 diene elastomer Polymers 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- DMEKUKDWAIXWSL-UHFFFAOYSA-N n,n-dimethyl-7-nitro-9h-fluoren-2-amine Chemical compound [O-][N+](=O)C1=CC=C2C3=CC=C(N(C)C)C=C3CC2=C1 DMEKUKDWAIXWSL-UHFFFAOYSA-N 0.000 description 1
- 229920002601 oligoester Polymers 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000011101 paper laminate Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
【発明の詳細な説明】
本発明は低界面張力を有するシリコーンゴム面
上にパターンを形成する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of forming patterns on silicone rubber surfaces having low interfacial tension.
従来、低界面張力を有するシリコーンゴム面上
にパターンを形成させる方法としては、シリコー
ンゴム面上に印刷又は電子写真等の手法でパター
ンを形成し、熱又は光等の手段でシリコーンゴム
面上に固着せしめる方法、或いは未硬化シリコー
ンゴム面上にパターンを形成し加圧によりパター
ンをシリコーン中に埋め込み、次いで加熱硬化す
ることによりシリコーンゴムに固着せしめる方法
等が知られている。しかしながらシリコーンゴム
面は剥離性がすぐれている為にパターン形成物質
との付着力がとぼしく強固な接着が得られない
他、シリコーンゴム面とパターン形成物質の界面
張力に大きな差がある為にパターン形成物質の濡
れが悪く、直接シリコーンゴム面上へのパターン
の形成は困難であり、鮮明な像が得られないとい
う欠点を有するものであり、又、単に上記の熱又
は光の作用による固着方法では十分な接着力が得
られないのみならず、加圧による埋め込みによつ
ても大きな効果は得られていない。 Conventionally, as a method for forming a pattern on a silicone rubber surface having low interfacial tension, a pattern is formed on the silicone rubber surface by a method such as printing or electrophotography, and then a pattern is formed on the silicone rubber surface by means such as heat or light. A method of fixing the material, or a method of forming a pattern on an uncured silicone rubber surface, embedding the pattern in the silicone by applying pressure, and then fixing it to the silicone rubber by heating and curing are known. However, since the silicone rubber surface has excellent releasability, the adhesion force with the pattern-forming substance is weak and strong adhesion cannot be obtained.In addition, there is a large difference in interfacial tension between the silicone rubber surface and the pattern-forming substance, so the pattern cannot be formed. It is difficult to form a pattern directly on the silicone rubber surface due to poor wettability of the substance, and has the disadvantage that a clear image cannot be obtained. Not only is it not possible to obtain sufficient adhesive force, but even embedding by pressure has not produced a significant effect.
本発明はこれらの従来法の欠点を解決し、シリ
コーンゴム面上に強固に固着し且つ鮮明なパター
ンを得ようとするものであつて、即ち基板上に界
面張力が20〜27dyne/cmであり、かつ1分子中
にビニル基、メルカプト基、メタアクリル基から
選ばれた基を少なくとも1つ有するオルガノシラ
ン又はオルガノシロキサンを含むシリコーンゴム
液を塗布し、別の支持体上に電離放射線硬化性組
成物からなる模様を設け、しかる後、両者を前記
シリコーンゴム面と前記模様面を接するように積
層し、次いで支持体側より電離性放射線を照射す
ることにより前記模様を形成した放射線硬化性組
成物を、硬化せしめると同時に前記シリコーンゴ
ム面上に転写固着せしめ、次いで支持体を剥離す
ることにより基板上のシリコーンゴム面上に画像
を形成することを特徴とするものである。 The present invention solves the drawbacks of these conventional methods and aims to obtain a clear pattern that is firmly adhered to the silicone rubber surface. , and a silicone rubber liquid containing an organosilane or organosiloxane having at least one group selected from a vinyl group, a mercapto group, and a methacrylic group in one molecule, and then applying an ionizing radiation-curable composition onto another support. A radiation-curable composition is prepared in which a pattern is formed by forming a pattern, and then the silicone rubber surface and the pattern surface are laminated so that the silicone rubber surface and the pattern surface are in contact with each other, and the pattern is formed by irradiating ionizing radiation from the support side. , the image is formed on the silicone rubber surface of the substrate by transferring and fixing it onto the silicone rubber surface at the same time as it is cured, and then peeling off the support.
以下に本発明を図面を用いて説明するとシリコ
ーンゴム液を塗布する基板1としては、特に限定
されないが、例えば、ポリプロピレン、ポリエス
テル、塩化ビニル、ポリエチレン等のプラスチツ
クフイルム及びアルミ、銅等の金属箔又は金属
板、上質紙、アート紙、コート紙等の紙類、更に
上記基材の複数の組み合せを積層したものが使用
できる。 The present invention will be explained below with reference to the drawings. The substrate 1 to which the silicone rubber liquid is applied is not particularly limited, but includes, for example, plastic films such as polypropylene, polyester, vinyl chloride, and polyethylene, and metal foils such as aluminum and copper. Papers such as metal plates, high-quality paper, art paper, and coated paper, as well as laminated combinations of the above-mentioned substrates, can be used.
次にシリコーンゴム面2を形成するシリコーン
ゴム液としては、塗布後常温もしくは加熱により
架橋硬化してシリコーンゴム弾性体となるもの
で、けい素原子に結合する全有機基の90モル%以
上がメチル基である高重合度オルガノポリシロキ
サン(これはインキ反発性にすぐれている)を主
体としてなるものがよく、これには(1)分子鎖末端
が水酸基で封鎖された有機基の90モル%以上がメ
チル基である高重合度ジオルガノポリシロキサ
ン、架橋剤としてメチルハイドロジエンポリシロ
キサンまたはエチルポリシリケート、および縮合
触媒として有機酸金属塩からなるもの、(2)ビニル
基含有高重合度ジオルガノポリシロキサン(ビニ
ル基以外の有機基の90モル%以上がメチル基)、
架橋剤としてのメチルハイドロジエンポリシロキ
サン、および付加反応触媒としての白金系触媒か
らなるもの、(3)分子鎖両末端が水酸基で封鎖され
た有機基の90モル%以上がメチル基である高重合
度ジオルガノポリシロキサン、および架橋剤とし
て1分子中に3個以上のアセトキシ基、アミノ
基、オキシム基またはプロペノキシ基等の加水分
解性基を有するシランまたは低重合度シロキサン
化合物からなるものが例示される。本発明におい
ては上記(1)または(2)に例示した種類のものが特に
好適とされる。 Next, the silicone rubber liquid that forms the silicone rubber surface 2 is one that cross-links and cures at room temperature or by heating after coating to become a silicone rubber elastic body, in which 90 mol% or more of all organic groups bonded to silicon atoms are methyl. It is best to use a highly polymerized organopolysiloxane (which has excellent ink repulsion properties) as a main component, which includes (1) 90 mol% or more of organic groups whose molecular chain ends are blocked with hydroxyl groups; is a highly polymerized diorganopolysiloxane in which is a methyl group, methylhydrodiene polysiloxane or ethyl polysilicate as a crosslinking agent, and an organic acid metal salt as a condensation catalyst; (2) a highly polymerized diorganopolysiloxane containing a vinyl group; Siloxane (more than 90 mol% of organic groups other than vinyl groups are methyl groups),
(3) High polymerization consisting of methylhydrodiene polysiloxane as a crosslinking agent and a platinum-based catalyst as an addition reaction catalyst, (3) 90 mol% or more of the organic groups whose molecular chain ends are blocked with hydroxyl groups are methyl groups. Examples include silane or low-polymerization siloxane compounds having three or more hydrolyzable groups such as acetoxy groups, amino groups, oxime groups, or propenoxy groups in one molecule as a crosslinking agent. Ru. In the present invention, the types exemplified in (1) or (2) above are particularly preferred.
なお、上記においてメチル基以外の有機基とし
ては、一般にフエニル基等のアリール基、ビニル
基等のアルケニル基、エチル基、プロピル基等の
アルキル基、トリフロオロプロピル基等のパター
ン置換アルキリ基などが例示され、塗布乾燥後の
表面の界面張力が20〜27dyne/cmであるものを
用いる。又、上記のシリコーンゴム液を塗布する
方法としては、公知の塗布方法である、グラビア
コート法、ロールコート法、エアナイフコート
法、かけ流し法、浸漬法等の方法に用いて行な
う。更に、本発明において電離放射線硬化性組成
物とシリコーンゴム面の接着を更に向上させる為
のシラン又はシロキサンとしては1分子中にビニ
ル基、メルカプト基、メタアクリル基を少くとも
1コ有するものを用いるとよく、かかる化合物と
して具体的にはビニルトリクロルシラン、ビニル
トリエトキシシラン、Nアリルγアミノプロピル
トリメトキシシラン、ビニルトリス(2−メトキ
シエトキシシラン)、3−メタクリルオキシプロ
ピルトリメトキシシラン、3−メルカプトプロピ
ルトリメトキシシラン、等のシラン類、上記シラ
ン類を縮合触媒として有機酸金属塩を用い2〜10
分子重合させたシロキサン、更には分子鎖の両末
端が水酸基で封鎖された有機基の90モル%以上が
メチル基である低重合度ジオルガノポリシロキサ
ンと上記シランとの縮合反応物であるシロキサン
を例示することができる。シリコーンゴムに対し
て上記シラン又はシロキサンの添加量は、0.5〜
20重量%が適当であり、好ましくは、1〜10重量
%が良好である。0.5%以下では接着に効果がな
く20%以上ではシリコーンゴムの剥離性、撥油性
等の特性が損なわれるためである。 In addition, organic groups other than methyl groups in the above generally include aryl groups such as phenyl groups, alkenyl groups such as vinyl groups, alkyl groups such as ethyl groups and propyl groups, pattern-substituted alkyl groups such as trifluoropropyl groups, etc. is exemplified, and the interfacial tension of the surface after coating and drying is 20 to 27 dyne/cm. The silicone rubber liquid may be applied using known coating methods such as gravure coating, roll coating, air knife coating, pouring, and dipping. Further, in the present invention, as the silane or siloxane to further improve the adhesion between the ionizing radiation curable composition and the silicone rubber surface, a silane or siloxane having at least one vinyl group, mercapto group, or methacrylic group in one molecule is used. Examples of such compounds include vinyltrichlorosilane, vinyltriethoxysilane, Nallyl gamma aminopropyltrimethoxysilane, vinyltris(2-methoxyethoxysilane), 3-methacryloxypropyltrimethoxysilane, and 3-mercaptopropyl. Silanes such as trimethoxysilane and the above silanes are condensed using an organic acid metal salt as a condensation catalyst.
Molecularly polymerized siloxane, and furthermore, siloxane that is a condensation reaction product of the above-mentioned silane and a low polymerization degree diorganopolysiloxane in which 90 mol% or more of the organic groups whose molecular chains are capped with hydroxyl groups at both ends are methyl groups. I can give an example. The amount of the above silane or siloxane added to silicone rubber is 0.5~
20% by weight is suitable, preferably 1-10% by weight. This is because if it is less than 0.5%, there is no effect on adhesion, and if it is more than 20%, the properties such as releasability and oil repellency of silicone rubber will be impaired.
本発明に用いられる支持体3としては、電離放
射線硬化性組成物の硬化後剥離がしやすいものが
用いられる。具体的には、ポリエチレン、ポリプ
ロピレン、ポリエステル等のプラスチツクフイル
ムが用いられる。 As the support 3 used in the present invention, one that is easy to peel off after the ionizing radiation-curable composition is cured is used. Specifically, plastic films such as polyethylene, polypropylene, and polyester are used.
次に本発明において用いる電離放射線硬化性組
成物は、基本的には放射線により硬化性を有する
オリゴマー、モノマー、粘度調整の為のポリマ
ー、及び顔料染料等の色材からなる。硬化性を有
するオリゴマー、モノマーとしては具体的には分
子中にエチレン性不飽和結合を有するプレポリマ
ーもしくはオリゴマー例えば不飽和ポリエステル
類、ポリエステルアクリレート、エポキシアクリ
レート、ウレタンアクリレート、ポリエーテルア
クリレート、ポリオールアクリレート、メラミン
アクリレートなどの各種アクリレート類、ポリエ
ステルメタクリレート、エポキシメタクリレー
ト、ウレタンメタクリレート、ポリエーテルメタ
クリレート、ポリオールメタクリレート、メラミ
ンメタクリレートなどの各種メタクリレート類な
どの一種または二種以上と、分子中にエチレン性
不飽和結合を有するモノマー、例えば、スチレ
ン、α−メチルスチレン等のスチレン系モノマー
類;アクリル酸メチル、アクリル酸2−エチルヘ
キシル、アクリル酸メトキシエチル、アクリル酸
ブトキシエチル、アクリル酸ブチル、アクリル酸
メトキブチル、アクリル酸フエニル等のアクリル
酸エステル類;メタクリル酸メチル、メタクリル
酸エチル、メタクリル酸プロピル、メタクリル酸
メトキシエチル、メタクリル酸エトキシチチル、
メタクリル酸フエニル、メタクリル酸ラウリル等
のメタクリル酸エステル類;アクリルアミド、メ
タクリルアミド等の不飽和カルボン酸アミド;ア
クリル酸2−(N,N−ジメチルアミノ)エチル、
メタクリル酸2−(N,N−ジメチルアミノ)エ
チル、アクリル酸2−(N,N−ジベンジルアミ
ノ)エチル、メタクリル酸(N,N−ジメチルア
ミノ)メチル、アクリル酸2−(N,N−ジエチ
ルアミノ)プロピル等の不飽和酸の置換アミノア
ルコールエステル類;エチレングリコールジアク
リレート、プロピレングリコールジアクリレー
ト、ネオペンチルグリコールジアクリレート、
1,6−ヘキサンジオールジアクリレート、ジエ
チレングリコールジアクリレート、トリエチレン
グリコールジアクリレート、ジプロピレングリコ
ールジアクリレート、エチレングリコールジメタ
クリレート、プロピレングリコールジメタクリレ
ート、ジエチレングリコールジメタクリレート等
の多官能性化合物、及び/又は分子中に2個以上
のチオール基を有するポリチオール化合物例えば
トリメチロールプロパントリチオグリコレート、
トリメチロールプロパントリチオプロピオネー
ト、ペンタエリスリトールテトラチオグリコレー
トなどを混合して作ることができる。 Next, the ionizing radiation-curable composition used in the present invention basically consists of an oligomer that is curable by radiation, a monomer, a polymer for adjusting viscosity, and a coloring material such as a pigment dye. Examples of curable oligomers and monomers include prepolymers or oligomers having ethylenically unsaturated bonds in the molecule, such as unsaturated polyesters, polyester acrylates, epoxy acrylates, urethane acrylates, polyether acrylates, polyol acrylates, and melamine. One or more of various acrylates such as acrylate, various methacrylates such as polyester methacrylate, epoxy methacrylate, urethane methacrylate, polyether methacrylate, polyol methacrylate, and melamine methacrylate, and a monomer having an ethylenically unsaturated bond in the molecule. For example, styrenic monomers such as styrene and α-methylstyrene; acrylics such as methyl acrylate, 2-ethylhexyl acrylate, methoxyethyl acrylate, butoxyethyl acrylate, butyl acrylate, methquibutyl acrylate, and phenyl acrylate. Acid esters; methyl methacrylate, ethyl methacrylate, propyl methacrylate, methoxyethyl methacrylate, ethoxytityl methacrylate,
Methacrylic acid esters such as phenyl methacrylate and lauryl methacrylate; unsaturated carboxylic acid amides such as acrylamide and methacrylamide; 2-(N,N-dimethylamino)ethyl acrylate;
2-(N,N-dimethylamino)ethyl methacrylate, 2-(N,N-dibenzylamino)ethyl acrylate, (N,N-dimethylamino)methyl methacrylate, 2-(N,N- Substituted amino alcohol esters of unsaturated acids such as diethylamino)propyl; ethylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate,
Polyfunctional compounds such as 1,6-hexanediol diacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, dipropylene glycol diacrylate, ethylene glycol dimethacrylate, propylene glycol dimethacrylate, diethylene glycol dimethacrylate, and/or in molecules Polythiol compounds having two or more thiol groups such as trimethylolpropane trithioglycolate,
It can be made by mixing trimethylolpropane trithiopropionate, pentaerythritol tetrathioglycolate, etc.
粘度調整の為のポリマーとしては、上記反応性
オリゴマー、モノマーと相溶性の良いものが使用
され、具体的にはポリエステル樹脂、ポリウレタ
ン樹脂、ポリ酢酸ビニル樹脂、ジエン系エラスト
マー、アルキツド樹脂、石油系樹脂等が使用でき
る。顔料、染料は通常印刷インキ等に使用されて
いるものを使用すればよい。支持体3上に電離放
射線硬化性組成物の模様4を設ける方法として
は、硬化組成物を手描き又は、オフセツト印刷、
スクリーン印刷等の公知の印刷手段により、又、
電子写真を利用してもよい。 Polymers used for viscosity adjustment are those that are compatible with the above-mentioned reactive oligomers and monomers, specifically polyester resins, polyurethane resins, polyvinyl acetate resins, diene elastomers, alkyd resins, and petroleum resins. etc. can be used. Pigments and dyes that are commonly used in printing inks may be used. The method of providing the pattern 4 of the ionizing radiation-curable composition on the support 3 includes hand-painting the cured composition, offset printing,
By known printing means such as screen printing, or
Electronic photographs may also be used.
以上のようにして基板1上にシリコーンゴム液
を塗布し硬化させ、別の支持体上に電離放射線硬
化性組成物からなる模様4を設け、しかるのち両
者を前記シリコーンゴム面2と前記模様面を接す
るように積層し、第1図に示すごとく支持体側よ
り電離放射線5を照射する。 As described above, the silicone rubber liquid is applied and cured on the substrate 1, and a pattern 4 made of the ionizing radiation-curable composition is provided on another support, and then both are separated from the silicone rubber surface 2 and the pattern surface. The substrates are stacked so that they are in contact with each other, and ionizing radiation 5 is irradiated from the support side as shown in FIG.
かかる電離放射線としては、コツクロフトワル
トン型、バンデグラフ型、共振変圧器型、絶縁コ
ア変圧器型、直線型、ダイナミトロン型、高周波
型等の各種電子線加速機から放出され、50〜
1000KeV、好ましくは100〜300KeVの範囲のエ
ネルギーを持つ電子線や、X線、γ線などを用
い、照射により電離放射線硬化性組成物からなる
模様は硬化すると同時に、シリコーンゴム面に固
着する。次いで第2図に示すように支持体3を剥
離し、基板上のシリコーンゴム面上に電離放射線
硬化性組成物が硬化し、パターン化された硬化物
4′が形成される。 Such ionizing radiation is emitted from various electron beam accelerators such as Kotscroft-Walton type, Van de Graaff type, resonant transformer type, insulated core transformer type, linear type, dynamitron type, and high frequency type,
Using electron beams, X-rays, gamma rays, or the like having an energy in the range of 1000 KeV, preferably 100 to 300 KeV, the pattern made of the ionizing radiation-curable composition is cured and fixed to the silicone rubber surface at the same time by irradiation. Next, as shown in FIG. 2, the support 3 is peeled off, and the ionizing radiation curable composition is cured on the silicone rubber surface of the substrate, forming a patterned cured product 4'.
本発明において、基板上のシリコーンゴム面上
に電離放射線硬化性組成物が強固に接着し、固着
する理由は高エネルギーの電離放射線、例えば前
記の電子線、X線、γ線を照射することにより、
シリコーンゴムのシロキサン主鎖中にラジカルが
発生し、シロキサンが架橋すると同時に一部は対
接する電離放射線硬化性組成物と反応して結合
し、又、電離放射線硬化性組成物中にもラジカル
が発生して電離放射線硬化性組成物を架橋させる
と同時に、一部は対接するシロキサンと反応して
結合するためと考えられる。 In the present invention, the reason why the ionizing radiation-curable composition firmly adheres and adheres to the silicone rubber surface of the substrate is that it is irradiated with high-energy ionizing radiation, such as the above-mentioned electron beams, X-rays, and γ-rays. ,
Radicals are generated in the siloxane main chain of silicone rubber, and at the same time as the siloxane crosslinks, a portion of it reacts and bonds with the opposing ionizing radiation-curable composition, and radicals are also generated in the ionizing radiation-curable composition. It is thought that this is because, at the same time as the ionizing radiation-curable composition is crosslinked, a portion of the siloxane reacts with the siloxane in contact with the ionizing radiation-curable composition and bonds with the ionizing radiation-curable composition.
以上のような本発明によれば、模様は基板上の
シリコーンゴム塗布面に直接設けるのではなく、
一旦、支持体上に形成した後、転写するものであ
るから、濡れが悪いため鮮明な像が得られない従
来の方式の欠点を解消することができ、又、電離
放射線硬化性組成物を用いて模様を形成し、電離
放射線照射により硬化すると同時に基板上のシリ
コーンゴム塗布面に固着するため、強固に固着す
るものであつて、シリコーンゴムの撥水性や撥油
性、耐熱性を生かした化粧材、表示材、広告、宣
伝、等の分野に応用でき、又水なし平版印刷版の
分野にも応用できるものである。 According to the present invention as described above, the pattern is not provided directly on the silicone rubber coated surface of the substrate;
Since the image is once formed on a support and then transferred, it is possible to overcome the disadvantage of the conventional method in which clear images cannot be obtained due to poor wetting, and it also uses an ionizing radiation-curable composition. It is a decorative material that takes advantage of the water repellency, oil repellency, and heat resistance of silicone rubber. It can be applied to the fields of display materials, advertisements, promotions, etc., and can also be applied to the field of waterless planographic printing plates.
以下実施例により本発明を更に詳しく説明す
る。 The present invention will be explained in more detail with reference to Examples below.
実施例 1
下記成分をプレミキサーにて混合しペースト状
にした後、三本ロールミルにて練肉して以下の組
成物を得た。Example 1 The following components were mixed in a premixer to form a paste, and then kneaded in a three-roll mill to obtain the following composition.
デイスモコール130(住友バイエルウレタン社製線
状ポリウレタン) 10重量部
アロニツクスM5700(東亜合成社オリゴエステル
アクリレート) 55重量部
ジエチレングリコールジアクリレート 10重量部
カーボンブラツク 20重量部
得られた組成物を厚み25μのポリエステルフイ
ルム上にオフセツト印刷により印刷したものを作
成した。一方、ポリエチレンと上質紙をラミネー
トした複合紙のポリエチレン側表面に、信越シリ
コーン社製シリコーン(KS774)を塗布、乾燥、
硬化させて、あらかじめ作製したパターン化画像
を設けられたポリエステルフイルムとラミネート
し、次いでポリエステルフイルム側から低エネル
ギー電子線加速器(Energy Seince社製エレクト
ロカーテンCB20d50/30)により加速電圧180kV
照射線量10Mradで電子線を照射し、前記組成物
をシリコーン塗布面に固着せしめ、次いでポリエ
ステルフイルムを剥離すると前記組成物はシリコ
ーン塗布面上に残り、ポリエステルフイルムのみ
容易に剥離できた。このようにして、シリコーン
面上に強固に固着した鮮明な画像を得ることがで
きた。Deismocol 130 (linear polyurethane manufactured by Sumitomo Bayer Urethane) 10 parts by weight Aronix M5700 (oligoester acrylate manufactured by Toagosei) 55 parts by weight diethylene glycol diacrylate 10 parts by weight Carbon black 20 parts by weight The obtained composition was formed into a polyester film with a thickness of 25μ. A print was made by offset printing on top. On the other hand, silicone (KS774) manufactured by Shin-Etsu Silicone Co., Ltd. was applied to the polyethylene surface of the composite paper made by laminating polyethylene and high-quality paper, dried,
After curing, it is laminated with a polyester film provided with a patterned image prepared in advance, and then the polyester film is heated at an accelerating voltage of 180 kV using a low-energy electron beam accelerator (Electro Curtain CB20d50/30 manufactured by Energy Seince).
The composition was irradiated with an electron beam at a dose of 10 Mrad to adhere to the silicone-coated surface, and when the polyester film was then peeled off, the composition remained on the silicone-coated surface and only the polyester film could be easily peeled off. In this way, a clear image firmly adhered to the silicone surface could be obtained.
実施例 2
下記成分を三本ロールミルにより練肉し組成物
を得た。Example 2 The following ingredients were milled using a three-roll mill to obtain a composition.
カリフレツクス1107(シエル化学製SISゴム)
10重量部
RA1050(三井東圧製多官能ポリエステルアクリ
レート) 55重量部
カーボンブラツク 20重量部
該組成物を厚み25μのポリエステルフイルム上
にスクリーン印刷により印刷し、以下実施例1と
同様にしてシリコーン(信越シリコーン製
KS702)を塗布した基材(ポリエチレン、上質紙
ラミネート)と積層し、電子線を照射線量
10Mrad加速電圧180kVで照射した。ポリエステ
ルフイルムを剥離して、シリコーン塗布面上に鮮
明な画像を得た。Califrex 1107 (SIS rubber made by Ciel Chemical)
10 parts by weight RA1050 (Mitsui Toatsu polyfunctional polyester acrylate) 55 parts by weight Carbon black 20 parts by weight The composition was screen printed on a 25 μm thick polyester film, and the same procedure as in Example 1 was carried out using silicone (Shin-Etsu Co., Ltd.). silicone
KS702) coated with a base material (polyethylene, high-quality paper laminate) and irradiated with electron beam.
Irradiation was performed at 10 Mrad accelerating voltage 180 kV. The polyester film was peeled off to obtain a clear image on the silicone coated surface.
実施例 3
基材としてポリエチレンラミネート紙を用い、
下記シリコーンを塗布乾燥し硬化し、シリコーン
塗布基材を作製した。Example 3 Using polyethylene laminate paper as the base material,
The following silicone was applied, dried, and cured to produce a silicone-coated base material.
シリコーンゴムKS774 50重量部
メタアクリル系シランKBM503 3 〃
(以上信越シリコーン製)
トルエン 950 〃
実施例1と同様にして作製したパターン化画像
を設けられたポリエステルフイルムとシリコーン
塗布基材をラミネートし次いで、ポリエステルフ
イルム側から低エネルギー電子線加速機(エネル
ギーサイエンス社エレクトロカーテンCB20d50/
30)により照射線量10Mradで電子線を照射、前
記組成物を固化及び接着せしめた。Silicone rubber KS774 50 parts by weight Methacrylic silane KBM503 3 (all manufactured by Shin-Etsu Silicone) Toluene 950 A polyester film provided with a patterned image produced in the same manner as in Example 1 was laminated with a silicone-coated base material, and then, Low energy electron beam accelerator (Energy Science Electro Curtain CB20d50/
30), the composition was irradiated with an electron beam at a dose of 10 Mrad to solidify and adhere.
次いでポリエステルフイルムを剥離することに
より、シリコーン面上に実施例1の場合よりも更
に強固に固着した鮮明な画像を得ることができ
た。 Then, by peeling off the polyester film, it was possible to obtain a clear image that was more firmly adhered to the silicone surface than in Example 1.
実施例 4
実施例1と同様にポリエステルフイルム上に画
像を形成した。次に、下記シリコーンを基材(ア
ルミ箔ポリエチレンラミネートフイルム)に塗布
乾燥した。Example 4 An image was formed on a polyester film in the same manner as in Example 1. Next, the following silicone was applied to a base material (aluminum foil polyethylene laminate film) and dried.
シリコーンゴムKS705F 50重量部
メルカプト系シロキサンSH−10 3 〃
(以上信越シリコーン)
トルエン 950 〃
実施例1と同様にラミミネートを行なつた後、
電子線照射(照射線量10Mrad)し、ポリエステ
ルフイルムの剥離を行い、シリコーン面上に実施
例2の場合よりも更に強固に固着した鮮明な画像
を得ることができた。Silicone rubber KS705F 50 parts by weight Mercapto-based siloxane SH-10 3 (Shin-Etsu Silicone) Toluene 950 After lamination in the same manner as in Example 1,
The polyester film was peeled off by electron beam irradiation (irradiation dose: 10 Mrad), and a clear image that was more firmly adhered to the silicone surface than in Example 2 could be obtained.
実施例 5
下記組成物を三本ロールにより練肉し硬化組成
物を得た。Example 5 The following composition was kneaded using three rolls to obtain a cured composition.
カリフレツクス1107(シエル化学製SIS)
10重量部
RA1050(三井東圧製多官能ポリエステルアクリ
レート) 55 〃
カーボンブラツク 20 〃
該組成物を用いてスクリーン印刷により厚み
25μのポリエステルフイルム上にパターンを印刷
した。Califrex 1107 (SIS made by Ciel Chemical)
10 parts by weight RA1050 (Mitsui Toatsu polyfunctional polyester acrylate) 55 〃 Carbon black 20 〃 Thickness was determined by screen printing using the composition
The pattern was printed on a 25μ polyester film.
別の基材としてポリエステルフイルム(厚み
100μ)に下記シリコーンを塗布乾燥し硬化した。 Polyester film (thickness
100μ) was coated with the following silicone, dried and cured.
シリコーンゴムKS772 50重量部
ビニル系シランX−12−563 5 〃
(以上信越シリコーン)
トルエン 950 〃
実施例1と同様にラミネート電子線照射(照射
線量10Mrad)を行なつた後ポリエステルの剥離
を行い、シリコーン面上に実施例2の場合よりも
更に強固に固着した鮮明な画像が得られた。Silicone rubber KS772 50 parts by weight Vinyl silane A clear image that was more firmly adhered to the silicone surface than in Example 2 was obtained.
第1図および第2図は本発明の画像形成方法を
示す模式的断面図である。
1……基板、2……シリコーンゴム面、3……
支持体、4……模様、4′……硬化物、5……電
離放射線。
FIGS. 1 and 2 are schematic cross-sectional views showing the image forming method of the present invention. 1...Substrate, 2...Silicone rubber surface, 3...
Support, 4... Pattern, 4'... Cured product, 5... Ionizing radiation.
Claims (1)
様を形成し前記の模様を形成した面に、基板に1
分子中にビニル基、メルカプト基、メタアクリル
基から選ばれた基を少なくとも1つ有するオルガ
ノシラン又はオルガノシロキサンを含むシリコー
ンゴム液を塗布し硬化させてなる界面張力20〜
27dyne/cmのシリコーンゴム面を、前記模様と
前記シリコーンゴム面とが接するようにして重ね
合わせ、しかる後前記支持体側より電離放射線を
照射して前記模様を形成した電離放射線硬化性組
成物を硬化せしめると同時に、前記シリコーンゴ
ム面上に転写し固着せしめた後、支持体を剥離す
ることにより、前記シリコーンゴム面上に画像を
形成することを特徴とする画像形成方法。1 A pattern made of an ionizing radiation curable composition is formed on a support, and 1
An interfacial tension of 20~20% obtained by applying and curing a silicone rubber liquid containing organosilane or organosiloxane having at least one group selected from vinyl, mercapto, and methacrylic groups in the molecule.
The silicone rubber surfaces of 27 dyne/cm are overlapped so that the pattern and the silicone rubber surface are in contact with each other, and then ionizing radiation is irradiated from the support side to cure the ionizing radiation-curable composition in which the pattern has been formed. An image forming method comprising the step of forming an image on the silicone rubber surface by simultaneously transferring and fixing the image onto the silicone rubber surface and then peeling off the support.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7873681A JPS57195251A (en) | 1981-05-26 | 1981-05-26 | Formation of picture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7873681A JPS57195251A (en) | 1981-05-26 | 1981-05-26 | Formation of picture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57195251A JPS57195251A (en) | 1982-11-30 |
JPH0225496B2 true JPH0225496B2 (en) | 1990-06-04 |
Family
ID=13670165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7873681A Granted JPS57195251A (en) | 1981-05-26 | 1981-05-26 | Formation of picture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57195251A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5078403A (en) * | 1973-11-19 | 1975-06-26 |
-
1981
- 1981-05-26 JP JP7873681A patent/JPS57195251A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5078403A (en) * | 1973-11-19 | 1975-06-26 |
Also Published As
Publication number | Publication date |
---|---|
JPS57195251A (en) | 1982-11-30 |
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