JPH02225638A - Copper alloy rolled foil for flexible print - Google Patents
Copper alloy rolled foil for flexible printInfo
- Publication number
- JPH02225638A JPH02225638A JP4561089A JP4561089A JPH02225638A JP H02225638 A JPH02225638 A JP H02225638A JP 4561089 A JP4561089 A JP 4561089A JP 4561089 A JP4561089 A JP 4561089A JP H02225638 A JPH02225638 A JP H02225638A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- foil
- rolled
- plating
- copper alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011888 foil Substances 0.000 title claims abstract description 32
- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 21
- 239000012535 impurity Substances 0.000 claims abstract description 10
- 239000010949 copper Substances 0.000 claims abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000001301 oxygen Substances 0.000 claims abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 6
- 229910052725 zinc Inorganic materials 0.000 claims abstract 4
- 238000007747 plating Methods 0.000 abstract description 24
- 229910045601 alloy Inorganic materials 0.000 abstract description 6
- 239000000956 alloy Substances 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 4
- 238000005096 rolling process Methods 0.000 abstract description 4
- 238000005097 cold rolling Methods 0.000 abstract description 3
- 229910052742 iron Inorganic materials 0.000 abstract description 3
- 238000000137 annealing Methods 0.000 abstract description 2
- 238000005554 pickling Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 238000005530 etching Methods 0.000 description 11
- 229910000679 solder Inorganic materials 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000011889 copper foil Substances 0.000 description 5
- VAKIVKMUBMZANL-UHFFFAOYSA-N iron phosphide Chemical compound P.[Fe].[Fe].[Fe] VAKIVKMUBMZANL-UHFFFAOYSA-N 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003610 charcoal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 241001474374 Blennius Species 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910018082 Cu3Sn Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、フレキシブルプリント用鋼合金圧延箔に係り
、詳細には、たとえば、プリント回路、テープキャリヤ
などの配線回路に使用されるフレキシブルプリント用銅
合金圧延箔に関するものである。さらに詳しくは、極微
細加工性、Snめっき被覆時の耐ウィスカ性、耐熱性お
よび導電性に優れるフレキシブルプリント用銅合金圧延
箔に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a rolled steel alloy foil for flexible printing, and in particular, for flexible printing used for wiring circuits such as printed circuits and tape carriers. This invention relates to copper alloy rolled foil. More specifically, the present invention relates to a rolled copper alloy foil for flexible printing that has excellent ultrafine workability, whisker resistance when coated with Sn plating, heat resistance, and electrical conductivity.
[従来の技術]
プリント回路などの電気回路には5〜40μlの厚さの
銅箔が多用されている。このような銅箔には電解鋼箔と
圧延銅箔がある。[Prior Art] Copper foil with a thickness of 5 to 40 μl is often used in electrical circuits such as printed circuits. Such copper foils include electrolytic steel foil and rolled copper foil.
プリント回路基板には、ガラスエポキシ、紙フエノール
などの基板上に銅箔をクラッドした後、レジストエツチ
ング法により所望の回路パターンに形成した基板のほか
に、ポリイミドなどのフィルムに銅箔を張り合せできる
フレキシブル回路基板もある。これらの一部はテープキ
ャリヤ、TAB (Tape Automated B
onding )リードとして半導体チップの実装に使
用されている。フレキシブル回路基板にはフレキシビリ
ティの点で優る圧延箔が使用される。Printed circuit boards can be made by cladding copper foil on a substrate made of glass epoxy or paper phenol, and then forming the desired circuit pattern using a resist etching method, or by laminating copper foil onto a film such as polyimide. There are also flexible circuit boards. Some of these are tape carriers, TAB (Tape Automated B
(onding) Used as a lead in mounting semiconductor chips. Rolled foil, which is superior in flexibility, is used for flexible circuit boards.
近年、電気機器の小型化と高密度化と多機能化にともな
って、プリント回路基板の高密度が強く求められており
、このため小型チップ部品を高密度実装ができる表面実
装方式が次第に採用され始めた。In recent years, with the miniaturization, higher density, and multifunctionality of electrical equipment, there has been a strong demand for higher density printed circuit boards, and for this reason, surface mounting methods that can mount small chip components at high density are gradually being adopted. I started.
テープキャリヤやTABのリードは、最近では、ピッチ
間距離が80g厘以下にも近接するようになってきてい
る。Recently, the pitch distance of tape carriers and TAB leads has become closer to each other, with a pitch distance of 80 g or less.
[発明が解決しようとする課題]
圧延箔としては通常タフピッチ鋼および無酸素鋼が使用
されているが、いずれもリードとして使用する場合、電
子デバイスと接合する部分は厚さ5μ膳のNi下地めっ
きを形成し、さらに、その上に厚さ1μ露の^Uめつぎ
を形成している。[Problems to be Solved by the Invention] Tough pitch steel and oxygen-free steel are usually used as rolled foils, but when both are used as leads, the part to be bonded to an electronic device is coated with a 5μ thick Ni underplating. , and furthermore, a ^U eyepiece with a thickness of 1 μm is formed on it.
配線のリード間ピッチが80μ−と狭い接続部分には上
記の旧下地めっきとAuめっき被覆が常識とされていた
。It was common knowledge that the above-mentioned base plating and Au plating were used for connection parts where the lead-to-lead pitch of wiring was as narrow as 80 μm.
旧下地めっき上にAuめっきを行ったものは信頼性の高
いものではあるが、高価なものであるため、それに代る
安価なSnめっきが試みられている。しかし、Snめフ
きの場合は短時間でのウィスカ発生による配線間の短絡
が生ずるという課題がある。一方、ウィスカ対策のため
Snめっきに代えはんだめっきが検討されている。しか
し、はんだめっきでははんだ密着性不良という不具合い
が生じるため、この考え方は実用化には至フていない。Although Au plating on the old base plating is highly reliable, it is expensive, so attempts are being made to replace it with inexpensive Sn plating. However, in the case of Sn mesh, there is a problem in that short circuits between wirings occur due to the generation of whiskers in a short period of time. On the other hand, solder plating is being considered in place of Sn plating to prevent whiskers. However, this concept has not been put into practical use because solder plating causes problems such as poor solder adhesion.
本発明は銅合金系圧延箔に係るもので、従来のCu圧延
箔の代りに、接合部およびその近傍のめっきを、Mlめ
っきと^Uめっきの2層めフきからSnめっきないしは
んだめっきに置ぎ代えることが可能となり、しかも、そ
のSnめっき層がウィスカを全く生じず、はんだ接合時
の280℃での加熱によっても母材が軟化せず、錫およ
びはんだの!jl殖も150℃×10σOHr保持後に
も起こらず、また、強度導電率も高い箔でありて、しか
も、 5μmの厚さで80μ■程度のピッチでレジスト
エツチングしても目標通りに非常にきれいにエツチング
できるフレキシブルプリント用銅合金圧延箔を提供する
ことを目的とする。The present invention relates to a copper alloy rolled foil, and instead of the conventional Cu rolled foil, the plating at the joint and its vicinity can be changed from two-layer plating of Ml plating and ^U plating to Sn plating or solder plating. Moreover, the Sn plating layer does not generate whiskers at all, and the base material does not soften even when heated at 280°C during solder bonding, making it possible to replace tin and solder! Jl growth does not occur even after holding at 150℃ x 10σOHr, and the foil has high strength and conductivity.Moreover, even when resist etching is performed at a pitch of about 80μ■ with a thickness of 5μm, it etches very cleanly as per the target. The purpose of the present invention is to provide a rolled copper alloy foil for flexible printing.
[課題を解決するための手段]
本発明のN1の要旨は%Fe:0.05〜0.201
(重it以下同じ) 、P:0.02〜0.201
、Zn:1.O〜5.0k(ただし、!、鴎は除く )
、10ppm以下のSを含有し、残部Cuと不純物と
からなることを特徴とするフレキシブルプリント用銅合
金箔に存在する。[Means for solving the problem] The gist of N1 of the present invention is %Fe: 0.05 to 0.201
(Same for weight and below), P: 0.02-0.201
, Zn:1. O ~ 5.0k (However!, excluding seagulls)
, 10 ppm or less of S, with the remainder consisting of Cu and impurities.
本発明の第2の要旨は、Fa:0.05〜0.201
、 P:0.02〜0.201 、 Zn:1.0〜5
.0X (ただし、1.0′4は除く ) 、 10p
pm以下のSを含有し、不純物と酸素との合計が50p
pm以下、残部Cuかうなることを特徴とするフレキシ
ブルプリント用銅合金箔に存在する。The second gist of the present invention is that Fa: 0.05 to 0.201
, P: 0.02-0.201, Zn: 1.0-5
.. 0X (excluding 1.0'4), 10p
Contains S of pm or less, and the total of impurities and oxygen is 50p
It exists in a copper alloy foil for flexible printing characterized in that the balance is Cu or less.
本発明の第3の要旨は、箔の厚さを40μm以下とした
ことを特徴とする請求項!または請求項2に記載のフレ
キシブルプリント用銅合金圧延箔に存在する。The third gist of the present invention is a claim characterized in that the thickness of the foil is 40 μm or less! Or it exists in the copper alloy rolled foil for flexible printing according to claim 2.
[作 用]
本発明の含有元素の作用効果および限定理由を説明する
。[Function] The effects and reasons for limitations of the contained elements of the present invention will be explained.
Znはt SRAM材のウィスカ発生を抑制し、Snめ
っ籾ないしはんだめっきの密着性を向上させ、導電率を
高める。そのためには、19gを超えてZnを含有させ
る必要がある。。Zn suppresses the generation of whiskers in the SRAM material, improves the adhesion of Sn plating or solder plating, and increases electrical conductivity. For that purpose, it is necessary to contain more than 19 g of Zn. .
znを1零を超えて含有させると、密着性を悪くする金
属間化合物(Cu3Sn)相の生成を抑制でき、Cu、
Sn相の母材側に生ずるカーケンダールホイドの生成を
抑制でき、密着性が向上するものと考えられる。When zn is contained in an amount exceeding 1 zero, the formation of an intermetallic compound (Cu3Sn) phase that deteriorates adhesion can be suppressed, and Cu,
It is thought that the formation of Kirkendahloid on the base metal side of the Sn phase can be suppressed, and the adhesion can be improved.
また、Snめフぎ中へ微量のZnが拡散し、Snの内部
応力を緩和するため、ウィスカ成長を抑制していると思
われる。In addition, a small amount of Zn diffuses into the Sn mesh and relieves the internal stress of Sn, which seems to suppress whisker growth.
しかし、Znが5零を超えると耐ウィスカ性には問題は
ないが、導電率がl1OkIAC5未満となったり、黄
銅独特の応力腐食割れを生じやすい性質を保有してくる
という短所が表れてくるので、znは5零以下とする。However, if the Zn content exceeds 5 zero, although there is no problem with whisker resistance, disadvantages such as electrical conductivity becoming less than l1OkIAC5 and the tendency to cause stress corrosion cracking peculiar to brass will appear. , zn shall be 5 zero or less.
次にSの含有量の上限を定めた理由について記述する。Next, the reason for setting the upper limit of the S content will be described.
従来の銅合金においては、銅合金中ではSは多くはCu
Sとして存在し、 MnあるいはMgが不鈍物として含
有されていると、MnSとして存在する。いずれも、粒
赤中に届在し、そのためにエツチング時の不具合が生じ
ることを知見した。従来の銅合金においては、特に、5
〜40μl厚さの箔となるとレジストエツチングする場
合にエツチング液をはじいたりして、エツチングむらな
どの不具合いを生じていた0本発明者は、その原因の探
究を行った。その結果、その原因はSに存在することを
知見した。したがって、不具合の発生を防ぐためには、
Sを完全に除去することが望ましいが、原料・炉材、被
覆木炭、燃料などからの混入は避は難く、IDppm以
下と定めた。In conventional copper alloys, S is mostly Cu in copper alloys.
It exists as S, and if Mn or Mg is contained as an inert substance, it exists as MnS. It has been found that all of them arrive in the middle of the grain, which causes problems during etching. In conventional copper alloys, in particular, 5
When the foil is ~40 μl thick, it repels the etching solution during resist etching, causing problems such as uneven etching.The present inventor investigated the cause of this problem. As a result, it was found that the cause of the problem was found in S. Therefore, to prevent problems from occurring,
Although it is desirable to completely remove S, it is difficult to avoid contamination from raw materials, furnace materials, coated charcoal, fuel, etc., and it is set at ID ppm or less.
また、酸素と不純物とについても、不純物が酸化物の状
態で存在すると、5〜40μ腫の厚さの箔では、上記の
Sと同様、エツチング時の微細加工を阻害することが分
かり、50ppm以下と定めた。Regarding oxygen and impurities, it has been found that if impurities exist in the form of oxides, microfabrication during etching will be inhibited in foils with a thickness of 5 to 40 μm, similar to the above S, It was determined that
S、酸素および不純物は、厚さが0.1 am以上の板
・条では、表面に現れても、それらの化合物の大きさ・
数・量は僅かであり、通常混入する量を制限する必要は
ないが、厚さ5〜40μ■の箔になると、圧延時のピン
ホールの発生、圧延切れ、さらには、前述のレジストの
接着不良、エツチング不良などが生じること紮木発明者
は知見し、前述の上限に定める。S, oxygen, and impurities may appear on the surface of plates or strips with a thickness of 0.1 am or more, but due to the size and size of these compounds.
The number and amount is small, and there is usually no need to limit the amount mixed in, but when the foil is 5 to 40μ thick, pinholes occur during rolling, rolling breaks, and the aforementioned resist adhesion occurs. The inventor Hiroki is aware that defects, etching defects, etc. occur, and has set the above-mentioned upper limit.
FeはPと燐化鉄を形成し、強度の向上とはんだ付は温
度条件での軟化を防止するための必須の元素である。し
かし、0.05零未満ではP(含有量0.02〜0.G
5零)の一部と化合して、燐化鉄を形成しても、強度向
上の効果は期待で鮒ない、また、Fa含有量が0.15
1を超えると、燐化鉄を形成し得ない固溶Faが増加し
、導電率を低下させるように作用する。よって、Faの
含有量は[1,05〜Q、15零とする。Fe forms iron phosphide with P, and is an essential element for improving strength and preventing softening under temperature conditions for soldering. However, if it is less than 0.05 zero, P (content 0.02 to 0.G
Even if it is combined with a part of 50) to form iron phosphide, the effect of improving strength is not expected, and the Fa content is 0.15
When it exceeds 1, solid solution Fa that cannot form iron phosphide increases, which acts to lower the electrical conductivity. Therefore, the content of Fa is [1,05 to Q,15 zero.
PはFeと燐化鉄を形成して強度の向上、軟化温度の向
上に寄与する元素であるが、含有量が0.02を末溝で
は強度向上等に寄与できる程ではなく、含有量がo、o
sxを超えると燐化鉄を形成し得ない固溶Pが増加し、
導電率を低下させるようになる。よって、P含有量は0
.02〜0.05にとする。P is an element that forms iron phosphide with Fe and contributes to improving strength and softening temperature, but when the content is 0.02, it is not enough to contribute to improving strength, etc. o, o
When sx is exceeded, solid solution P that cannot form iron phosphide increases,
It begins to reduce the conductivity. Therefore, the P content is 0
.. 02 to 0.05.
以下、本発明を実施例によって説明する。 Hereinafter, the present invention will be explained by examples.
第1表に示す各種合金を黒鉛ツボで溶解して、金型鋳造
した。鋳塊を機誠加工により表裏面を各2.5mm面削
して50s+a+t X 70mmw X 20(1+
u+Ilとし、900℃の温度で厚さ10mmまで熱間
圧延し、aOO℃以上の温度から水冷し、スケール除去
後厚さ0.2mmまで冷間圧延し、ついで500℃×I
H「の中間焼鈍を行った1次に、入念に酸洗し、ざらに
冷間圧延を繰り返し、厚さ35μ層の箔を製作し、ピン
ホール、圧延切れを観察した。Various alloys shown in Table 1 were melted in graphite pots and cast in molds. The front and back sides of the ingot were milled by 2.5mm each using machine machining to obtain 50s+a+t x 70mmw x 20(1+
u+Il, hot rolled to a thickness of 10 mm at a temperature of 900°C, water-cooled from a temperature of aOO°C or higher, and after removing scale, cold rolled to a thickness of 0.2 mm, then 500°C x I
First, intermediate annealing was performed on the foil, followed by careful pickling and repeated rough cold rolling to produce a foil with a thickness of 35 μm, and pinholes and rolling breaks were observed.
また、同様の手順によって、厚さ5μmと65μ鴎の箔
とを作製した。In addition, 5 μm and 65 μm thick seaweed foils were produced using the same procedure.
(エツチング性)
これらの箔について、幅100μm、間隔80μ曽、長
さ20μ−で50本のレジストを焼きつけ、塩化第2鉄
溶液40零でケミカルミーリングして、50木のリード
を製作その健全性を調査した。(Etching properties) On these foils, 50 resists were baked with a width of 100 μm, an interval of 80 μm, and a length of 20 μm, and chemical milling was performed with 40% ferric chloride solution to produce 50 wood leads. investigated.
(ウィスカの発生程度)
アルカリ中で電界脱脂後硫酸洛中で電流密度3A/da
’によフて厚さ 1.5μ墓のSnめっきを行い、エポ
キシ樹脂系の接着材でSnめっきと反対側面を0.2m
鳳銅合金板で貼りつけ、曲げによって約4kg/l1m
2の圧縮応力を加え、室温で1年間放置後、ウィスカの
発生の有無を調査した。(Extent of whisker generation) After electric field degreasing in alkaline, current density 3A/da in sulfuric acid.
', then apply Sn plating to a thickness of 1.5μ, and use epoxy resin adhesive to cover the side opposite to the Sn plating for 0.2m.
Approximately 4kg/l1m by pasting with a copper alloy plate and bending
After applying a compressive stress of 2 and leaving it at room temperature for 1 year, the presence or absence of whiskers was investigated.
(軟化特性、導電率)
軟化特性については、木炭で被覆下で電気炉中でIHr
保持し、引張強度の6割の値を維持する温度を求めた。(Softening properties, electrical conductivity) Regarding the softening properties, IHr in an electric furnace while covered with charcoal was used.
The temperature at which 60% of the tensile strength was maintained was determined.
導電率は、JISHO5Q5に基づいた。The conductivity was based on JISHO5Q5.
以上の試験結果をまとめて第1表に示した。The above test results are summarized in Table 1.
Znを1〜5零含む合金は、表面にSnめっきが行われ
ても、ウィスカが生ずることもなく、また、Sおよび酸
素とその他の不純物とを規制することによって厚さ 5
〜40μlの箔においてもレジストエツチング後の不良
率が2零以下と良好となった。Alloys containing 1 to 5 Zn do not generate whiskers even when Sn plating is applied to the surface, and by controlling S, oxygen, and other impurities, the thickness can be reduced to 5.
Even in the case of ~40 .mu.l of foil, the defect rate after resist etching was good at 2 or less.
特に、他の合金箔では、 5〜40μ塵と厚みが薄くな
ると、エツチング性の低下が著しいが、本発明の合金で
はほとんど低下しない。In particular, with other alloy foils, when the thickness becomes as thin as 5 to 40 microns, the etching performance decreases significantly, but with the alloy of the present invention, there is almost no decrease.
また、はんだ付けなどの加熱によっても、1)1rの加
熱によっても、軟化温度2H℃以上を示している。なお
、表中には従来合金としてタフピッチ鋼(No、8)を
併記した。Further, the softening temperature is 2H° C. or higher even when heated by soldering or the like, and even when heated for 1 hr. In addition, tough pitch steel (No. 8) is also listed in the table as a conventional alloy.
[発明の効果]
本発明によれば、従来のNiと^Uとのめっきの代わり
に、Snめっきを行っても、ウィスカ性を全く生ずるこ
ともない。[Effects of the Invention] According to the present invention, even if Sn plating is performed in place of the conventional Ni and U plating, no whiskers occur at all.
また、極微細加工後の歩留も向上する。Furthermore, the yield after ultra-fine processing is also improved.
さらに、従来材より格段に優れる引張強度を有している
。Furthermore, it has a tensile strength that is significantly superior to conventional materials.
このように、本発明は、フレキシブルプリント用銅合金
箔として優れた特性を有しており、電子機器の小型化高
密度実装化、多機能化のための材料として優れた特性を
有している。As described above, the present invention has excellent properties as a copper alloy foil for flexible printing, and has excellent properties as a material for miniaturization, high-density packaging, and multifunctionalization of electronic devices. .
Claims (3)
、P:0.02〜0.05%、Zn:1.0〜5.0%
(ただし、1.0%は除く)、10ppm以下のSを含
有し、残部Cuと不純物とからなることを特徴とするフ
レキシブルプリント用銅合金箔。(1) Fe: 0.05-0.20% (same below weight%)
, P: 0.02-0.05%, Zn: 1.0-5.0%
A copper alloy foil for flexible printing, characterized in that it contains 10 ppm or less of S (excluding 1.0%), and the remainder consists of Cu and impurities.
.05%、Zn:1.0〜5.0%(ただし、1.0%
は除く),10ppm以下のSを含有し、不純物と酸素
との合計が50ppm以下、残部Cuからなることを特
徴とするフレキシブルプリント用銅合金箔。(2) Fe: 0.05-0.20%, P: 0.02-0
.. 05%, Zn: 1.0 to 5.0% (however, 1.0%
A copper alloy foil for flexible printing, characterized in that it contains S of 10 ppm or less, the total amount of impurities and oxygen is 50 ppm or less, and the balance is Cu.
請求項1または請求項2に記載のフレキシブルプリント
用銅合金圧延箔。(3) The rolled copper alloy foil for flexible printing according to claim 1 or 2, wherein the thickness of the foil is 40 μm or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1045610A JP2531777B2 (en) | 1989-02-27 | 1989-02-27 | Copper alloy rolled foil for flexible printing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1045610A JP2531777B2 (en) | 1989-02-27 | 1989-02-27 | Copper alloy rolled foil for flexible printing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02225638A true JPH02225638A (en) | 1990-09-07 |
JP2531777B2 JP2531777B2 (en) | 1996-09-04 |
Family
ID=12724139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1045610A Expired - Fee Related JP2531777B2 (en) | 1989-02-27 | 1989-02-27 | Copper alloy rolled foil for flexible printing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2531777B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1630239A1 (en) | 2004-08-30 | 2006-03-01 | Dowa Mining Co., Ltd. | Copper alloy and method of manufacturing the same |
JPWO2013153771A1 (en) * | 2012-04-13 | 2015-12-17 | 日本発條株式会社 | Copper base circuit board |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63133402A (en) * | 1986-11-21 | 1988-06-06 | 古河電気工業株式会社 | Foil for electric circuit |
JPS63310935A (en) * | 1987-06-11 | 1988-12-19 | Kobe Steel Ltd | High electroconductive copper alloy having excellent migration resistance |
JPS6412539A (en) * | 1987-07-07 | 1989-01-17 | Nippon Mining Co | Manufacture of film carrier |
JPS6411931A (en) * | 1987-07-03 | 1989-01-17 | Furukawa Electric Co Ltd | Copper alloy for flexible print |
JPS6456842A (en) * | 1987-08-27 | 1989-03-03 | Nippon Mining Co | Copper alloy foil for flexible circuit board |
-
1989
- 1989-02-27 JP JP1045610A patent/JP2531777B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63133402A (en) * | 1986-11-21 | 1988-06-06 | 古河電気工業株式会社 | Foil for electric circuit |
JPS63310935A (en) * | 1987-06-11 | 1988-12-19 | Kobe Steel Ltd | High electroconductive copper alloy having excellent migration resistance |
JPS6411931A (en) * | 1987-07-03 | 1989-01-17 | Furukawa Electric Co Ltd | Copper alloy for flexible print |
JPS6412539A (en) * | 1987-07-07 | 1989-01-17 | Nippon Mining Co | Manufacture of film carrier |
JPS6456842A (en) * | 1987-08-27 | 1989-03-03 | Nippon Mining Co | Copper alloy foil for flexible circuit board |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1630239A1 (en) | 2004-08-30 | 2006-03-01 | Dowa Mining Co., Ltd. | Copper alloy and method of manufacturing the same |
US7563408B2 (en) | 2004-08-30 | 2009-07-21 | Dowa Metaltech Co., Ltd. | Copper alloy and method of manufacturing the same |
JPWO2013153771A1 (en) * | 2012-04-13 | 2015-12-17 | 日本発條株式会社 | Copper base circuit board |
Also Published As
Publication number | Publication date |
---|---|
JP2531777B2 (en) | 1996-09-04 |
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