JPH0222533B2 - - Google Patents

Info

Publication number
JPH0222533B2
JPH0222533B2 JP61034229A JP3422986A JPH0222533B2 JP H0222533 B2 JPH0222533 B2 JP H0222533B2 JP 61034229 A JP61034229 A JP 61034229A JP 3422986 A JP3422986 A JP 3422986A JP H0222533 B2 JPH0222533 B2 JP H0222533B2
Authority
JP
Japan
Prior art keywords
pattern
manual alignment
center
mark
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61034229A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62193124A (ja
Inventor
Mamoru Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP61034229A priority Critical patent/JPS62193124A/ja
Publication of JPS62193124A publication Critical patent/JPS62193124A/ja
Publication of JPH0222533B2 publication Critical patent/JPH0222533B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H01L2223/54466—Located in a dummy or reference die

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61034229A 1986-02-19 1986-02-19 パタ−ン位置合わせ方法 Granted JPS62193124A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61034229A JPS62193124A (ja) 1986-02-19 1986-02-19 パタ−ン位置合わせ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61034229A JPS62193124A (ja) 1986-02-19 1986-02-19 パタ−ン位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS62193124A JPS62193124A (ja) 1987-08-25
JPH0222533B2 true JPH0222533B2 (enrdf_load_stackoverflow) 1990-05-18

Family

ID=12408315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61034229A Granted JPS62193124A (ja) 1986-02-19 1986-02-19 パタ−ン位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS62193124A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940000910B1 (ko) * 1991-04-12 1994-02-04 금성일렉트론 주식회사 반도체 칩의 얼라인먼트 방법 및 레이저 리페이어용 타겟이 형성된 반도체 칩

Also Published As

Publication number Publication date
JPS62193124A (ja) 1987-08-25

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term