JPH0222531B2 - - Google Patents

Info

Publication number
JPH0222531B2
JPH0222531B2 JP61034225A JP3422586A JPH0222531B2 JP H0222531 B2 JPH0222531 B2 JP H0222531B2 JP 61034225 A JP61034225 A JP 61034225A JP 3422586 A JP3422586 A JP 3422586A JP H0222531 B2 JPH0222531 B2 JP H0222531B2
Authority
JP
Japan
Prior art keywords
manual alignment
pattern
alignment marks
pair
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61034225A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62193122A (ja
Inventor
Mamoru Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP61034225A priority Critical patent/JPS62193122A/ja
Publication of JPS62193122A publication Critical patent/JPS62193122A/ja
Publication of JPH0222531B2 publication Critical patent/JPH0222531B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61034225A 1986-02-19 1986-02-19 パタ−ン位置合わせ方法 Granted JPS62193122A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61034225A JPS62193122A (ja) 1986-02-19 1986-02-19 パタ−ン位置合わせ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61034225A JPS62193122A (ja) 1986-02-19 1986-02-19 パタ−ン位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS62193122A JPS62193122A (ja) 1987-08-25
JPH0222531B2 true JPH0222531B2 (OSRAM) 1990-05-18

Family

ID=12408202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61034225A Granted JPS62193122A (ja) 1986-02-19 1986-02-19 パタ−ン位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS62193122A (OSRAM)

Also Published As

Publication number Publication date
JPS62193122A (ja) 1987-08-25

Similar Documents

Publication Publication Date Title
JP2593440B2 (ja) 投影型露光装置
US4758863A (en) Multi-image reticle
JP7249994B2 (ja) フォトリソグラフィマスクを整列させる方法及び半導体材料のウェファの集積回路を製造する対応する工程
US4657379A (en) Photomask and exposure apparatus using the same
TW201719300A (zh) 投影曝光裝置
JP3461708B2 (ja) アライメントマーク装置
US6306558B1 (en) Method of forming small contact holes using alternative phase shift masks and negative photoresist
US5237393A (en) Reticle for a reduced projection exposure apparatus
JP2006310446A (ja) 半導体装置の製造方法、および露光装置
JPH0222531B2 (OSRAM)
US20030039928A1 (en) Multiple purpose reticle layout for selective printing of test circuits
JPH0222530B2 (OSRAM)
JPH0222533B2 (OSRAM)
JPH0222532B2 (OSRAM)
JP2647835B2 (ja) ウェハーの露光方法
JP2741114B2 (ja) カラー用液晶基板の位置合わせ方法
JPH1197327A (ja) 露光装置のマスク取付機構
JPH0864520A (ja) レチクルの回転誤差測定用のレチクルおよび方法
JPH0387013A (ja) 半導体装置の製造方法
JP3624920B2 (ja) 露光方法
JPH01117322A (ja) 縮小投影露光装置
JPS62254423A (ja) 半導体焼付装置
JPS5821740A (ja) 投影露光用フオトマスク
JPH05216209A (ja) フォトマスク
JPH0144009B2 (OSRAM)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term