JPH0220971B2 - - Google Patents
Info
- Publication number
- JPH0220971B2 JPH0220971B2 JP55130951A JP13095180A JPH0220971B2 JP H0220971 B2 JPH0220971 B2 JP H0220971B2 JP 55130951 A JP55130951 A JP 55130951A JP 13095180 A JP13095180 A JP 13095180A JP H0220971 B2 JPH0220971 B2 JP H0220971B2
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- glass substrate
- light
- high refractive
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13095180A JPS5754939A (en) | 1980-09-19 | 1980-09-19 | Optical mask and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13095180A JPS5754939A (en) | 1980-09-19 | 1980-09-19 | Optical mask and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5754939A JPS5754939A (en) | 1982-04-01 |
| JPH0220971B2 true JPH0220971B2 (enExample) | 1990-05-11 |
Family
ID=15046455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13095180A Granted JPS5754939A (en) | 1980-09-19 | 1980-09-19 | Optical mask and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5754939A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT382040B (de) * | 1983-03-01 | 1986-12-29 | Guenther Stangl | Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter |
| JP2710967B2 (ja) * | 1988-11-22 | 1998-02-10 | 株式会社日立製作所 | 集積回路装置の製造方法 |
| JP2786693B2 (ja) * | 1989-10-02 | 1998-08-13 | 株式会社日立製作所 | マスクの製造方法 |
| JP2783582B2 (ja) * | 1989-03-22 | 1998-08-06 | 株式会社東芝 | フォトマスク |
| US9046783B2 (en) | 2012-03-27 | 2015-06-02 | Panasonic Intellectual Property Management Co., Ltd. | Photomask, and pattern formation method and exposure apparatus using the photomask |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5038342B2 (enExample) * | 1971-12-01 | 1975-12-09 | ||
| JPS5419789B2 (enExample) * | 1972-01-18 | 1979-07-18 | ||
| JPS5097276A (enExample) * | 1973-12-25 | 1975-08-02 |
-
1980
- 1980-09-19 JP JP13095180A patent/JPS5754939A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5754939A (en) | 1982-04-01 |
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