JPH0220971B2 - - Google Patents

Info

Publication number
JPH0220971B2
JPH0220971B2 JP55130951A JP13095180A JPH0220971B2 JP H0220971 B2 JPH0220971 B2 JP H0220971B2 JP 55130951 A JP55130951 A JP 55130951A JP 13095180 A JP13095180 A JP 13095180A JP H0220971 B2 JPH0220971 B2 JP H0220971B2
Authority
JP
Japan
Prior art keywords
refractive index
glass substrate
light
high refractive
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55130951A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5754939A (en
Inventor
Seiji Oonaka
Kosei Kajiwara
Hiroshi Komeno
Kazutoshi Nagano
Kosuke Yasuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13095180A priority Critical patent/JPS5754939A/ja
Publication of JPS5754939A publication Critical patent/JPS5754939A/ja
Publication of JPH0220971B2 publication Critical patent/JPH0220971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP13095180A 1980-09-19 1980-09-19 Optical mask and its manufacture Granted JPS5754939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13095180A JPS5754939A (en) 1980-09-19 1980-09-19 Optical mask and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13095180A JPS5754939A (en) 1980-09-19 1980-09-19 Optical mask and its manufacture

Publications (2)

Publication Number Publication Date
JPS5754939A JPS5754939A (en) 1982-04-01
JPH0220971B2 true JPH0220971B2 (enExample) 1990-05-11

Family

ID=15046455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13095180A Granted JPS5754939A (en) 1980-09-19 1980-09-19 Optical mask and its manufacture

Country Status (1)

Country Link
JP (1) JPS5754939A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT382040B (de) * 1983-03-01 1986-12-29 Guenther Stangl Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter
JP2710967B2 (ja) * 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法
JP2786693B2 (ja) * 1989-10-02 1998-08-13 株式会社日立製作所 マスクの製造方法
JP2783582B2 (ja) * 1989-03-22 1998-08-06 株式会社東芝 フォトマスク
US9046783B2 (en) 2012-03-27 2015-06-02 Panasonic Intellectual Property Management Co., Ltd. Photomask, and pattern formation method and exposure apparatus using the photomask

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5038342B2 (enExample) * 1971-12-01 1975-12-09
JPS5419789B2 (enExample) * 1972-01-18 1979-07-18
JPS5097276A (enExample) * 1973-12-25 1975-08-02

Also Published As

Publication number Publication date
JPS5754939A (en) 1982-04-01

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