JPS5754939A - Optical mask and its manufacture - Google Patents

Optical mask and its manufacture

Info

Publication number
JPS5754939A
JPS5754939A JP13095180A JP13095180A JPS5754939A JP S5754939 A JPS5754939 A JP S5754939A JP 13095180 A JP13095180 A JP 13095180A JP 13095180 A JP13095180 A JP 13095180A JP S5754939 A JPS5754939 A JP S5754939A
Authority
JP
Japan
Prior art keywords
area
refractive index
light beam
mask
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13095180A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0220971B2 (enExample
Inventor
Seiji Onaka
Kosei Kajiwara
Hiroshi Komeno
Kazutoshi Nagano
Kosuke Yasuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13095180A priority Critical patent/JPS5754939A/ja
Publication of JPS5754939A publication Critical patent/JPS5754939A/ja
Publication of JPH0220971B2 publication Critical patent/JPH0220971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP13095180A 1980-09-19 1980-09-19 Optical mask and its manufacture Granted JPS5754939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13095180A JPS5754939A (en) 1980-09-19 1980-09-19 Optical mask and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13095180A JPS5754939A (en) 1980-09-19 1980-09-19 Optical mask and its manufacture

Publications (2)

Publication Number Publication Date
JPS5754939A true JPS5754939A (en) 1982-04-01
JPH0220971B2 JPH0220971B2 (enExample) 1990-05-11

Family

ID=15046455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13095180A Granted JPS5754939A (en) 1980-09-19 1980-09-19 Optical mask and its manufacture

Country Status (1)

Country Link
JP (1) JPS5754939A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60502120A (ja) * 1983-03-01 1985-12-05 エスタ−ライヒッシェス　フォルシュングスツェントルム　ザイベルスドルフ　ゲ−・エム・ベ−・ハ− 光学的に構成されたフィルタおよびその製造方法
JPH02248949A (ja) * 1989-03-22 1990-10-04 Toshiba Corp フォトマスク
US5352550A (en) * 1988-11-22 1994-10-04 Hitachi, Ltd. Mask for manufacturing semiconductor devices and method of manufacture thereof
USRE35315E (en) * 1989-10-02 1996-08-20 Okamoto; Yoshihiko Mask for manufacturing semiconductor device and method of manufacture thereof
US9046783B2 (en) 2012-03-27 2015-06-02 Panasonic Intellectual Property Management Co., Ltd. Photomask, and pattern formation method and exposure apparatus using the photomask

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4861157A (enExample) * 1971-12-01 1973-08-27
JPS4877850A (enExample) * 1972-01-18 1973-10-19
JPS5097276A (enExample) * 1973-12-25 1975-08-02

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4861157A (enExample) * 1971-12-01 1973-08-27
JPS4877850A (enExample) * 1972-01-18 1973-10-19
JPS5097276A (enExample) * 1973-12-25 1975-08-02

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60502120A (ja) * 1983-03-01 1985-12-05 エスタ−ライヒッシェス　フォルシュングスツェントルム　ザイベルスドルフ　ゲ−・エム・ベ−・ハ− 光学的に構成されたフィルタおよびその製造方法
US5352550A (en) * 1988-11-22 1994-10-04 Hitachi, Ltd. Mask for manufacturing semiconductor devices and method of manufacture thereof
US5358807A (en) * 1988-11-22 1994-10-25 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US5484671A (en) * 1988-11-22 1996-01-16 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US6733933B2 (en) 1988-11-22 2004-05-11 Renesas Technology Corporation Mask for manufacturing semiconductor device and method of manufacture thereof
US7008736B2 (en) 1988-11-22 2006-03-07 Renesas Technology Corp. Semiconductor integrated circuit device fabrication method using a mask having a phase shifting film covering region and an opening region
JPH02248949A (ja) * 1989-03-22 1990-10-04 Toshiba Corp フォトマスク
USRE35315E (en) * 1989-10-02 1996-08-20 Okamoto; Yoshihiko Mask for manufacturing semiconductor device and method of manufacture thereof
US9046783B2 (en) 2012-03-27 2015-06-02 Panasonic Intellectual Property Management Co., Ltd. Photomask, and pattern formation method and exposure apparatus using the photomask

Also Published As

Publication number Publication date
JPH0220971B2 (enExample) 1990-05-11

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