JPH0220823Y2 - - Google Patents
Info
- Publication number
- JPH0220823Y2 JPH0220823Y2 JP1031486U JP1031486U JPH0220823Y2 JP H0220823 Y2 JPH0220823 Y2 JP H0220823Y2 JP 1031486 U JP1031486 U JP 1031486U JP 1031486 U JP1031486 U JP 1031486U JP H0220823 Y2 JPH0220823 Y2 JP H0220823Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- support
- holder
- support rod
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 66
- 239000007788 liquid Substances 0.000 claims description 25
- 239000007921 spray Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 description 8
- 238000011161 development Methods 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000009434 installation Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1031486U JPH0220823Y2 (enrdf_load_stackoverflow) | 1986-01-29 | 1986-01-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1031486U JPH0220823Y2 (enrdf_load_stackoverflow) | 1986-01-29 | 1986-01-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62124844U JPS62124844U (enrdf_load_stackoverflow) | 1987-08-08 |
JPH0220823Y2 true JPH0220823Y2 (enrdf_load_stackoverflow) | 1990-06-06 |
Family
ID=30796490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1031486U Expired JPH0220823Y2 (enrdf_load_stackoverflow) | 1986-01-29 | 1986-01-29 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0220823Y2 (enrdf_load_stackoverflow) |
-
1986
- 1986-01-29 JP JP1031486U patent/JPH0220823Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS62124844U (enrdf_load_stackoverflow) | 1987-08-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100301213B1 (ko) | 웨이퍼 캐리어 회전용 턴 테이블 | |
JP4189141B2 (ja) | 基板処理装置及びこれを用いた基板処理方法 | |
EP1114355B1 (en) | Method and apparatus for developing photoresist patterns | |
KR100814452B1 (ko) | 표면에 가까운 액체 분배 젯트 사이의 상호 오염을 줄이기 위한 방법과 장치 | |
JPH0220823Y2 (enrdf_load_stackoverflow) | ||
JPH0372423B2 (enrdf_load_stackoverflow) | ||
JPH0128676Y2 (enrdf_load_stackoverflow) | ||
JPH049031Y2 (enrdf_load_stackoverflow) | ||
EP1303794B1 (en) | Method for an improved developing process in wafer photolithography | |
JP2001193176A (ja) | 床用目地装置 | |
JP3174496B2 (ja) | 半導体ウェハ保持治具 | |
JPH0446860Y2 (enrdf_load_stackoverflow) | ||
JP2003122021A (ja) | 現像処理装置 | |
JPH0474413A (ja) | 現像処理装置 | |
JP3007009B2 (ja) | 回転式基板処理装置 | |
JP2528108Y2 (ja) | ウエハ保持ホルダ | |
JPH0143870Y2 (enrdf_load_stackoverflow) | ||
JPS59104650A (ja) | レジスト膜形成装置 | |
JP5970864B2 (ja) | スリットノズル | |
JPH0143863Y2 (enrdf_load_stackoverflow) | ||
JPH0662190B2 (ja) | 板状物の収納ケ−ス | |
JPH10319577A (ja) | 斜光検査用基板保持具 | |
JP2872941B2 (ja) | 角形電子部品基板の搬送装置 | |
JP3003756U (ja) | レーザ光線式寸取器 | |
JPH0346431Y2 (enrdf_load_stackoverflow) |