JPH02207570A - Solid-state image sensing device - Google Patents

Solid-state image sensing device

Info

Publication number
JPH02207570A
JPH02207570A JP1027885A JP2788589A JPH02207570A JP H02207570 A JPH02207570 A JP H02207570A JP 1027885 A JP1027885 A JP 1027885A JP 2788589 A JP2788589 A JP 2788589A JP H02207570 A JPH02207570 A JP H02207570A
Authority
JP
Japan
Prior art keywords
solid
state image
light
image sensor
imaging device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1027885A
Other languages
Japanese (ja)
Inventor
Zensaku Watanabe
渡辺 善作
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1027885A priority Critical patent/JPH02207570A/en
Publication of JPH02207570A publication Critical patent/JPH02207570A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent optical information from being distorted by a method wherein a light- transmitting member is fixed on the photodetecting surface of a solid-state image sensing element. CONSTITUTION:A through hole and a penetrated hole are punched in a fixing material 4, which is a little thickish than the thickness of a solid-state image sensing element 3 having external connecting terminals 2 and consists of a polycarbonate resin, and the element 3 is fitted in the element 3. The material 4 with the element 3 fitted in it is heated and pressed to deform plastically the material 4 and the element 3 is buried in the material 4. Then, wiring patterns 5 are arranged on the material 4 using a resin conductive paste. At this time, external lead-out wiring patterns 6 are respectively provided at the ends, which are located on the side opposite to the connection of the wiring patterns 5 with the bumps 2, of the wiring patterns 5. Moreover, a wiring for making continuity with the rear of the element 3 is connected through the through hole 7. The wiring patterns subsequent to printing are cured and are fixed on the material 4. A photodetecting surface part of the element 3 and a covering material 8 having openings and a covering material 9 are simultaneously superposed on the material 4, are heated and pressed and are laminated. After that, a light- transmitting member 10 is bonded and fixed on the light-photodetecting surface of the element 3 with a transparent resin 11. Thereby, optical information is prevented from being distorted and at the same time, a light and thin solid-state image sensing device 1 is obtained.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は固体撮像装置に関するものである。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a solid-state imaging device.

(従来の技術) 一般に固体撮像装置は、半導体基板上に複数の光電変換
素子を形成して固体撮像素子とし、この固体撮像素子を
セラミック等の外囲器に実装し、所定の配線をすること
によって作製される。第5図に従来の一般的な樹脂埋込
タイプの固体撮像装置50を示す。この固体撮像装置5
0は測距用の撮像装置であって、外部引出し配線パター
ンが形成された下基板52と樹脂封止剤53の外部はみ
出しを防止する上基板54とを接着剤によって貼り合せ
た構造の外囲器内にマウント剤55を介して固体撮像素
子56が固着されている。この固体撮像素子56は、−
次元、あるいは二次元的に配設された複数の光電変換素
子を有する。下基板52の外部引出し配線パターンの所
定部分と固体撮像素子56の外部接続端子とが金あるい
はアルミニウムの細線よりなるボンディングワイヤ57
によって接続されている。また、図示していないが、下
基板52の端部の配線パターンにはスルーホール加工等
によって外部接続用パターンが設けられており、固体撮
像素子56内の半導体集積回路はボンディングワイヤ5
7、下基板52上の配線パターン、そして上記の外部接
続用パターンを介して外部の駆動回路と電気的に接続さ
れることになる。この固体撮像素子56を保護するため
に、樹脂系透明封止剤53を介して透光性部材58が固
着されている。
(Prior Art) In general, a solid-state imaging device is a solid-state imaging device by forming a plurality of photoelectric conversion elements on a semiconductor substrate, mounting this solid-state imaging device in an envelope made of ceramic or the like, and performing predetermined wiring. Created by FIG. 5 shows a conventional general resin-embedded solid-state imaging device 50. As shown in FIG. This solid-state imaging device 5
Reference numeral 0 denotes an imaging device for distance measurement, and the outer enclosure has a structure in which a lower substrate 52 on which an external lead wiring pattern is formed and an upper substrate 54 that prevents the resin sealant 53 from protruding to the outside are bonded together with an adhesive. A solid-state image sensor 56 is fixed inside the container via a mounting agent 55. This solid-state image sensor 56 is -
It has a plurality of photoelectric conversion elements arranged dimensionally or two-dimensionally. A bonding wire 57 is formed between a predetermined portion of the external wiring pattern of the lower substrate 52 and the external connection terminal of the solid-state image sensor 56 and is made of a thin gold or aluminum wire.
connected by. Although not shown, the wiring pattern at the end of the lower substrate 52 is provided with an external connection pattern by through-hole processing, etc., and the semiconductor integrated circuit in the solid-state image sensor 56 is connected to the bonding wire 5.
7. It will be electrically connected to an external drive circuit via the wiring pattern on the lower substrate 52 and the above-mentioned external connection pattern. In order to protect the solid-state image sensor 56, a transparent member 58 is fixed to the solid-state image sensor 56 via a resin-based transparent sealant 53.

この固体撮像装置50によって測距するには、図示して
いない被写体よりの光情報をカメラのレンズ系を通して
、この固体撮像装置50の遮光性部材58、および透明
封止剤53を介して固体撮像索子56の表面に結像させ
る。光電変換された電気量の最大の所が測距している位
置となる。
In order to measure distance using this solid-state imaging device 50, optical information from a subject (not shown) is passed through the lens system of the camera, and the solid-state imaging device An image is formed on the surface of the cord 56. The location where the photoelectrically converted amount of electricity is maximum is the location being measured.

(発明が解決しようとする課題) しかしながら、このようにして得られる固体撮像装置5
0には次のような問題点がある。
(Problem to be solved by the invention) However, the solid-state imaging device 5 obtained in this way
0 has the following problems.

(1) 固体撮像素子を保護する透光性部材が反り、極
端な場合は破壊を誘発し、光情報を遮断する。破壊にい
たらなくても二次元固体撮像装置のように光電変換素子
が微細である場合、透光性部材が反ることにより、光情
報がゆがめられて正確な光情報を得られない現象(フレ
ア現象)を引起す。特に第5図のような場合は、図中矢
印方向の引張り応力(透光性部材58に対しては曲げ応
力)が樹脂硬化のための加熱後に室温に戻す過程におい
て発生し、透光性部材58に応力を印加しつづけ、前述
したと同様の問題を引起す。
(1) The light-transmitting member that protects the solid-state image pickup device warps, and in extreme cases it may cause destruction and block optical information. Even if it does not lead to destruction, when the photoelectric conversion element is minute like in a two-dimensional solid-state imaging device, the optical information is distorted due to the warping of the light-transmitting member, making it difficult to obtain accurate optical information (flare). phenomenon). Particularly in the case shown in Fig. 5, tensile stress (bending stress for the translucent member 58) in the direction of the arrow in the figure occurs during the process of returning the translucent member to room temperature after heating for curing the resin. 58 continues to be stressed, causing problems similar to those described above.

モして透光性部材58の代表的なものであるガラスはそ
の製法、加工性、および固体撮像装置の小型化等により
、引張り応力による反り量を零に近ずけるためにガラス
の板厚を厚くする必要があるが、厚くするにも限界があ
り、また厚くすることにより大型化、高価格となってし
まう。
Furthermore, due to the manufacturing method, workability, and miniaturization of solid-state imaging devices, glass, which is a typical material for the light-transmitting member 58, has a thickness that can be reduced to bring the amount of warpage due to tensile stress close to zero. It is necessary to make the material thicker, but there is a limit to how thick it can be, and making it thicker also makes it larger and more expensive.

(2) 固体撮像素子56の外部接続端子(ボンディン
グバット)と下基板52上に配設された配線パターン(
インナリード端子部)とが細線によっそ結線されている
為、軽く、薄く、そして小型化するのに限界がある。
(2) The external connection terminal (bonding butt) of the solid-state image sensor 56 and the wiring pattern (
Since the inner lead terminal (inner lead terminal part) is connected loosely with a thin wire, there is a limit to how far it can be made light, thin, and compact.

(3) また透光性部材上に付着したゴミ、異物等をと
りはらうときに、普通アルコール等を浸み込ませた綿棒
等によって掃きとり作業が実施される。このときの外部
圧力または透光性部材の重みによる圧力は、樹脂封止剤
が弾性体である場合、透光性部材を経て透明封止剤ある
いは直接に細線1こ印加される為、細線の変形や破断を
引起す。
(3) Also, when removing dust, foreign matter, etc. adhering to the light-transmitting member, a cleaning operation is performed using a cotton swab or the like soaked with ordinary alcohol or the like. At this time, if the resin sealant is an elastic material, the external pressure or the pressure due to the weight of the transparent member is applied to the transparent sealant or directly to the thin wire through the transparent member. This may cause deformation or breakage.

(4)透光性部材が細線の高さ(ループ高さ)のバラツ
キ、あるいは透明樹脂加熱時に起こる樹脂の流動により
凹状外囲器の中央に配設し、固体撮像素子面と平行にす
ることは非常に困難であり光情報の経路を歪めてしまう
(4) The light-transmitting member is arranged in the center of the concave envelope and parallel to the solid-state image sensor surface due to variations in the height of the thin wire (loop height) or the flow of resin that occurs when heating the transparent resin. is extremely difficult and distorts the path of optical information.

本発明は上記問題点を考慮してなされたものであって、
光情報が歪められることを可及的に防止することができ
るとともに、可及的に軽薄な固体撮像装置を提供するこ
とを目的とする。
The present invention has been made in consideration of the above problems, and includes:
It is an object of the present invention to provide a solid-state imaging device that can prevent optical information from being distorted as much as possible and is as lightweight as possible.

〔発明の構成〕[Structure of the invention]

(課題を解決するための手段) 第1の発明による固体撮像装置は、外部接続端子を有す
る固体撮像素子の厚さにほぼ等しい厚さを有する固定材
に固体撮像素子を埋設固定するための貫通孔を設け、こ
の貫通孔に固体撮像素子を挿入して固体撮像素子の受光
面が露出するように埋設固定し、固体撮像素子を駆動す
る外部の駆動回路と固体撮像素子の外部接続端子を結線
する配線パターンを固定材上に形成し、固体撮像素子の
受光面が露出するように固定材の両面を被覆材で被覆し
、露出された受光面上に透光性部材を固着したことを特
徴とする。
(Means for Solving the Problems) A solid-state imaging device according to a first aspect of the present invention includes a through hole for embedding and fixing a solid-state imaging device in a fixing material having a thickness approximately equal to the thickness of the solid-state imaging device having an external connection terminal. A hole is made, a solid-state image sensor is inserted into this through-hole, and the solid-state image sensor is buried and fixed so that the light-receiving surface of the solid-state image sensor is exposed.The external drive circuit that drives the solid-state image sensor is connected to the external connection terminal of the solid-state image sensor. A wiring pattern is formed on the fixing material, both sides of the fixing material are covered with a covering material so that the light receiving surface of the solid-state image sensor is exposed, and a translucent member is fixed on the exposed light receiving surface. shall be.

第2の発明による固体撮像装置は、外部接続端子を有す
る固体撮像素子の厚さにほぼ等しい厚さを有する固定材
に固体撮像素子を埋設固定するための貫通孔を設け、こ
の貫通孔に固体撮像素子を挿入して固体撮像素子の受光
面が露出するように埋設固定し、固体撮像素子を駆動す
る外部の駆動回路と固体撮像素子の外部接続端子を結線
する配線パターンを固定材上に形成し、固定材の両面の
うち固体撮像素子の受光面側を透光性の材料からなる被
覆材で被覆したことを特徴とする。
In the solid-state imaging device according to the second invention, a through-hole for embedding and fixing the solid-state imaging device is provided in a fixing material having a thickness approximately equal to the thickness of the solid-state imaging device having external connection terminals, and a solid-state imaging device is provided in the through-hole. Insert the image sensor, bury it and fix it so that the light-receiving surface of the solid-state image sensor is exposed, and form a wiring pattern on the fixing material to connect the external drive circuit that drives the solid-state image sensor and the external connection terminal of the solid-state image sensor. However, the fixing material is characterized in that the light-receiving surface side of the solid-state image pickup device of both surfaces thereof is covered with a covering material made of a light-transmitting material.

(作 用) このように構成された第1の発明の固体撮像装置によれ
ば、固体撮像素子の受光面上に透光性部材が固着される
ことにより、固体撮像素子と透光性部材との距離を従来
の固体撮像装置に比べて短くすることができる。これに
より固体撮像素子の受光面と相対する透光性部材の面を
可及的に平行にすることが可能となるばかりでなく透光
性部材に働く曲げ応力を零にすることが可能となり、光
情報が歪められることを可及的に防止することができる
。また、固体撮像素子の厚さにほぼ等しい厚さの固定材
に上記固体撮像素子が埋設固定されていることおよび上
記固体撮像索子の受光面に透光性部材が固着されること
により第1の発明の固体撮像装置の厚さは固体撮像素子
の厚さにほぼ近いものとなる。これにより可及的に軽薄
な固体撮像装置を得ることができる。
(Function) According to the solid-state imaging device of the first invention configured as described above, the light-transmitting member is fixed on the light-receiving surface of the solid-state imaging device, so that the solid-state imaging device and the light-transmitting member are separated from each other. The distance can be made shorter than that of conventional solid-state imaging devices. This not only makes it possible to make the light-receiving surface of the solid-state image sensor and the surface of the light-transmitting member opposite to the light-transmitting member as parallel as possible, but also makes it possible to reduce the bending stress acting on the light-transmitting member to zero. Distortion of optical information can be prevented as much as possible. Further, the solid-state image sensor is embedded and fixed in a fixing material having a thickness approximately equal to the thickness of the solid-state image sensor, and a light-transmitting member is fixed to the light-receiving surface of the solid-state image sensor. The thickness of the solid-state imaging device according to the invention is approximately close to the thickness of the solid-state imaging element. This makes it possible to obtain a solid-state imaging device that is as light and thin as possible.

上述のように構成された第2の発明の固体撮像装置によ
れば、固体撮像素子の厚さにほぼ等しい厚さの固定材に
固体撮像素子が埋設固定されている。また、固定材の両
面のうち固体撮像素子の受光面側が透光性の材料からな
る被覆材で被覆されている。これにより第2の発明の固
体撮像装置の厚さが固体撮像素子の厚さにほぼ近いもの
となるばかりでなく、固体撮像素子と透光性の被覆材と
の距離が従来の固体撮像装置に比べて短くなり、可及的
に軽薄な固体撮像装置を得ることができるばかりでなく
、光情報が歪められることを可及的に防止することので
きる固体撮像装置を得ることができる。
According to the solid-state imaging device of the second invention configured as described above, the solid-state imaging device is embedded and fixed in the fixing material having a thickness substantially equal to the thickness of the solid-state imaging device. Further, of both surfaces of the fixing material, the light-receiving surface side of the solid-state image sensor is covered with a covering material made of a light-transmitting material. As a result, not only does the thickness of the solid-state imaging device of the second invention become almost the same as the thickness of the solid-state imaging device, but also the distance between the solid-state imaging device and the light-transmitting coating material is reduced compared to that of the conventional solid-state imaging device. It is possible not only to obtain a solid-state imaging device that is shorter and thinner than possible, but also to prevent optical information from being distorted as much as possible.

(実施例) 第1図に第1の発明による固体撮像装置の第1の実施例
の断面図を示す。第1図において、外部接続端子(例え
ば半田バンブ)2を有する固体撮像素子3より少し厚め
の、ポリカーボネート樹脂よりなる固定材4にスルーホ
ールおよび固体撮像素子3の埋設用貫通孔をプレス等に
より打抜き、固体撮像素子3をはめ込む。固体撮像索子
3をはめ込んだ固定材4を例えば170〜200℃の温
度で加熱プレスして固定材を塑性変形させて固体撮像素
子3を埋め込む(ただし、固体撮像素子3の受光面は露
出させておく)。このとき固体撮像索子3の周辺部分に
ポリカーボネート樹脂が流れ込み、固体撮像素子3周辺
の絶縁がとられる。このようにして、固体撮像素子3は
固定材4に埋設固定される。次に、バンブ2と結線する
ため、低温厚膜印刷技術により樹脂系の導電性ペースト
を用い、スクリーン印刷により固定材4上に配線パター
ン5を配設する。このとき、バンブ2との結線の反対配
線端に外部引出し配線パターン6を設ける。また、固体
撮像素子3の裏面導通をとるための配線は、スルーホー
ル7を介して結線される。
(Embodiment) FIG. 1 shows a sectional view of a first embodiment of a solid-state imaging device according to the first invention. In FIG. 1, a through hole and a through hole for embedding the solid-state image sensor 3 are punched out using a press or the like in a fixing material 4 made of polycarbonate resin that is slightly thicker than the solid-state image sensor 3 having an external connection terminal (for example, a solder bump) 2. , insert the solid-state image sensor 3. The fixing material 4 into which the solid-state imaging device 3 is fitted is heated and pressed at a temperature of, for example, 170 to 200°C to plastically deform the fixing material and embedding the solid-state imaging device 3 (however, the light-receiving surface of the solid-state imaging device 3 is not exposed). ). At this time, the polycarbonate resin flows into the peripheral portion of the solid-state imaging device 3, and the area around the solid-state imaging device 3 is insulated. In this way, the solid-state image sensor 3 is embedded and fixed in the fixing material 4. Next, in order to connect to the bump 2, a wiring pattern 5 is provided on the fixing material 4 by screen printing using a resin-based conductive paste using low-temperature thick film printing technology. At this time, an external lead wiring pattern 6 is provided at the wiring end opposite to the connection with the bump 2. Further, wiring for establishing conduction on the back surface of the solid-state image sensor 3 is connected via the through hole 7.

なお第1図においては同一面側に外部引出配線パターン
を設けているが、これは外部引出し配線パターンの配設
設計により自由に両面あるいは片面に配設してもよい。
In FIG. 1, the external lead wiring pattern is provided on the same side, but it may be freely provided on both sides or one side depending on the arrangement design of the external lead wiring pattern.

印刷後の配線パターンは150℃前後にてキュアされ固
定材4に固着される。固体撮像素子3の受光面部と外部
引出し配線パターンの取出口となる部分に開口を有する
被覆材8と、固体撮像素子3の裏面側を保護する被覆材
9を同時に固定材4と重ね合わせて加熱プレスし、ラミ
ネートする。
The printed wiring pattern is cured at around 150° C. and fixed to the fixing material 4. A covering material 8 having openings at the light-receiving surface of the solid-state image sensor 3 and a portion that will serve as an outlet for the external lead wiring pattern, and a covering material 9 that protects the back side of the solid-state image sensor 3 are simultaneously overlapped with the fixing material 4 and heated. Press and laminate.

その後、透光性部材10の接着も兼ねた透明樹脂11(
例えばSi樹脂等)ニヨリ120〜150℃前後の温度
で透光性部材10を接着固定する。
Thereafter, a transparent resin 11 (
For example, Si resin, etc.), the translucent member 10 is adhesively fixed at a temperature of about 120 to 150°C.

このようにして構成された固体撮像装置1においては、
透光性部材10と固体撮像素子3との面間の距離は透明
樹脂11による接着剤層の厚さのみの大きさであり、透
光性部材10と固体撮像素子3の面間の平行が出しやす
いばかりでなく、固体撮像装置1全体の厚さも固体撮像
素子3のほぼ厚さ程度で構成でき軽薄化が図れる。また
、透光性部材10に働く曲げ応力もなく、透光性部材1
0により光情報を歪めることもなく、フレア現象の減少
化が図れると同時に曲げ応力がなくなることにより極く
薄い透光性部材10、例えば0.1〜0.3mm程度の
厚さのものが使用可能となり、透光性部材10による光
の吸収の減少を図ることができる。
In the solid-state imaging device 1 configured in this way,
The distance between the surfaces of the light-transmitting member 10 and the solid-state image sensor 3 is equal to the thickness of the adhesive layer made of the transparent resin 11, and the distance between the surfaces of the light-transmitting member 10 and the solid-state image sensor 3 is Not only is it easy to take out the solid-state imaging device 1, but the overall thickness of the solid-state imaging device 1 can be approximately the same as that of the solid-state imaging device 3, making it possible to make it lighter and thinner. Further, there is no bending stress acting on the translucent member 10, and the translucent member 1
0, optical information is not distorted, the flare phenomenon is reduced, and at the same time, bending stress is eliminated, so an extremely thin translucent member 10, for example, one with a thickness of about 0.1 to 0.3 mm is used. This makes it possible to reduce light absorption by the translucent member 10.

第2図に第1の発明による固体撮像装置の第2の実施例
の断面を示す。この第2の実施例の固体撮像装置IAは
、固体撮像素子3の裏面からの発熱量が高い場合にも適
するように裏面における印刷配線パターン5aを、第1
図に示す第1の実施例の固体撮像装置1のそれに比べて
大きくしたものであり、第1の実施例と同様の効果を得
ることができる。
FIG. 2 shows a cross section of a second embodiment of the solid-state imaging device according to the first invention. The solid-state imaging device IA of the second embodiment has a printed wiring pattern 5a on the back surface of the solid-state imaging device 3 with a first
It is larger than that of the solid-state imaging device 1 of the first embodiment shown in the figure, and the same effects as the first embodiment can be obtained.

第3図に第2の発明による固体撮像装置の第1の実施例
の断面を示す。この第1の実施例の固体撮像装置IBは
、固体撮像素子3の受光面側の被覆材8を透明な材料で
形成し、第1図に示す透光性部材10を兼ねたものであ
る。
FIG. 3 shows a cross section of the first embodiment of the solid-state imaging device according to the second invention. In the solid-state imaging device IB of the first embodiment, the covering material 8 on the light-receiving surface side of the solid-state imaging element 3 is formed of a transparent material, and also serves as the translucent member 10 shown in FIG.

この実施例も第1図に示す第1の実施例と同様の効果を
得ることができる。
This embodiment can also obtain the same effects as the first embodiment shown in FIG.

第4図に第2の発明による固体撮像装置の第2の実施例
を示す。この実施例の固体撮像装置は、第3図に示す固
体撮像装置の被覆材8上の領域のうち、固体撮像素子3
の受光面に対応する領域以外の領域(ただし、外部引出
し配線パターンの取出口となる領域も除く)に、光の迷
光成分を遮光するための遮光膜12を配設したものであ
る。この実施例も第3図に示す固体撮像装置と同様の効
果を得ることができる。
FIG. 4 shows a second embodiment of the solid-state imaging device according to the second invention. In the solid-state imaging device of this embodiment, the solid-state imaging device 3 is located on the covering material 8 of the solid-state imaging device shown in FIG.
A light-shielding film 12 for shielding stray light components is disposed in a region other than the region corresponding to the light-receiving surface of the light receiving surface (excluding the region serving as the exit of the external lead-out wiring pattern). This embodiment can also obtain the same effects as the solid-state imaging device shown in FIG.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明によれば、光情報が歪められる
ことを可及的に防止することができるとともに、可及的
に軽薄な固体撮像装置を得ることができる。
As described above, according to the present invention, distortion of optical information can be prevented as much as possible, and a solid-state imaging device that is as light and thin as possible can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は第1の発明による固体撮像装置の第1の実施例
の断面図、第2図は第1の発明による固体撮像装置の第
2の実施例を示す断面図、第3図は第2の発明による固
体撮像装置の第1の実施例を示す断面図、第4図は第2
の発明による固体撮像装置の第2の実施例を示す断面図
、第5図は従来の固体撮像装置の断面図である。 1・・・固体撮像装置、2・・・外部接続端子、3・・
・固体撮像素子、4・・・固定材、5・・・配線パター
ン、8.9・・・被覆材、10・・・透光性部材、11
・・・透明樹脂。 出願人代理人  佐  藤  −雄
FIG. 1 is a cross-sectional view of a first embodiment of the solid-state imaging device according to the first invention, FIG. 2 is a cross-sectional view showing a second embodiment of the solid-state imaging device according to the first invention, and FIG. 2 is a cross-sectional view showing the first embodiment of the solid-state imaging device according to the invention of No.
FIG. 5 is a sectional view of a conventional solid-state imaging device. 1... Solid-state imaging device, 2... External connection terminal, 3...
- Solid-state image sensor, 4... Fixing material, 5... Wiring pattern, 8.9... Covering material, 10... Translucent member, 11
...Transparent resin. Applicant's agent Mr. Sato

Claims (1)

【特許請求の範囲】 1、外部接続端子を有する固体撮像素子の厚さにほぼ等
しい厚さを有する固定材に前記固体撮像素子を埋設固定
するための貫通孔を設け、この貫通孔に前記固体撮像素
子を挿入して前記固体撮像素子の受光面が露出するよう
に埋設固定し、前記固体撮像素子を駆動する外部の駆動
回路と前記固体撮像素子の外部接続端子を結線する配線
パターンを前記固定材上に形成し、前記固体撮像素子の
受光面が露出するように前記固定材の両面を被覆材で被
覆し、前記露出された受光面上に透光性部材を固着した
ことを特徴とする固体撮像装置。 2、外部接続端子を有する固体撮像素子の厚さにほぼ等
しい厚さを有する固定材に前記固体撮像素子を埋設固定
するための貫通孔を設け、この貫通孔に前記固体撮像素
子を挿入して前記固体撮像素子の受光面が露出するよう
に埋設固定し、前記固体撮像素子を駆動する外部の駆動
回路と前記固体撮像素子の外部接続端子を結線する配線
パターンを前記固定材上に形成し、前記固定材の両面の
うち前記固体撮像素子の受光面側を透光性の材料からな
る被覆材で被覆したことを特徴とする固体撮像装置。 3、前記透光性の材料からなる被覆材上の領域のうち前
記固体撮像素子の受光面に対応する領域以外の領域を遮
光膜で被覆したことを特徴とする請求項2記載の固体撮
像装置。
[Claims] 1. A through hole for embedding and fixing the solid-state image sensor is provided in a fixing material having a thickness approximately equal to the thickness of the solid-state image sensor having an external connection terminal, and the solid-state image sensor is provided in the through hole. An image sensor is inserted and buried and fixed so that the light-receiving surface of the solid-state image sensor is exposed, and a wiring pattern for connecting an external drive circuit that drives the solid-state image sensor and an external connection terminal of the solid-state image sensor is fixed. The fixing material is formed on a material, both sides of the fixing material are covered with a covering material so that the light receiving surface of the solid-state image sensor is exposed, and a translucent member is fixed on the exposed light receiving surface. Solid-state imaging device. 2. A through hole for embedding and fixing the solid-state image sensor is provided in a fixing material having a thickness approximately equal to the thickness of the solid-state image sensor having an external connection terminal, and the solid-state image sensor is inserted into the through hole. burying and fixing the solid-state image sensor so that its light-receiving surface is exposed, and forming a wiring pattern on the fixing material to connect an external drive circuit that drives the solid-state image sensor and an external connection terminal of the solid-state image sensor; A solid-state imaging device characterized in that, of both surfaces of the fixing material, a light-receiving surface side of the solid-state imaging device is covered with a covering material made of a light-transmitting material. 3. The solid-state imaging device according to claim 2, wherein a region other than the region corresponding to the light-receiving surface of the solid-state imaging device among the regions on the covering material made of the light-transmitting material is covered with a light-shielding film. .
JP1027885A 1989-02-07 1989-02-07 Solid-state image sensing device Pending JPH02207570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1027885A JPH02207570A (en) 1989-02-07 1989-02-07 Solid-state image sensing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1027885A JPH02207570A (en) 1989-02-07 1989-02-07 Solid-state image sensing device

Publications (1)

Publication Number Publication Date
JPH02207570A true JPH02207570A (en) 1990-08-17

Family

ID=12233349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1027885A Pending JPH02207570A (en) 1989-02-07 1989-02-07 Solid-state image sensing device

Country Status (1)

Country Link
JP (1) JPH02207570A (en)

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