JPH021910B2 - - Google Patents
Info
- Publication number
 - JPH021910B2 JPH021910B2 JP12076181A JP12076181A JPH021910B2 JP H021910 B2 JPH021910 B2 JP H021910B2 JP 12076181 A JP12076181 A JP 12076181A JP 12076181 A JP12076181 A JP 12076181A JP H021910 B2 JPH021910 B2 JP H021910B2
 - Authority
 - JP
 - Japan
 - Prior art keywords
 - vapor deposition
 - monitor
 - rate
 - control
 - central monitor
 - Prior art date
 - Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
 - Expired
 
Links
- 238000007740 vapor deposition Methods 0.000 claims description 14
 - 238000001704 evaporation Methods 0.000 claims description 6
 - 230000008020 evaporation Effects 0.000 claims description 6
 - 238000000034 method Methods 0.000 claims description 6
 - 238000007738 vacuum evaporation Methods 0.000 claims 1
 - 238000000151 deposition Methods 0.000 description 2
 - 230000008021 deposition Effects 0.000 description 2
 - 238000004519 manufacturing process Methods 0.000 description 1
 - 239000000463 material Substances 0.000 description 1
 - 230000000087 stabilizing effect Effects 0.000 description 1
 
Classifications
- 
        
- C—CHEMISTRY; METALLURGY
 - C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
 - C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
 - C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
 - C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
 - C23C14/54—Controlling or regulating the coating process
 - C23C14/542—Controlling the film thickness or evaporation rate
 - C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
 
 
Landscapes
- Chemical & Material Sciences (AREA)
 - Chemical Kinetics & Catalysis (AREA)
 - Engineering & Computer Science (AREA)
 - Materials Engineering (AREA)
 - Mechanical Engineering (AREA)
 - Metallurgy (AREA)
 - Organic Chemistry (AREA)
 - Physical Vapour Deposition (AREA)
 - Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
 
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP12076181A JPS5822378A (ja) | 1981-08-03 | 1981-08-03 | 自動蒸着制御方法 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP12076181A JPS5822378A (ja) | 1981-08-03 | 1981-08-03 | 自動蒸着制御方法 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS5822378A JPS5822378A (ja) | 1983-02-09 | 
| JPH021910B2 true JPH021910B2 (pm) | 1990-01-16 | 
Family
ID=14794331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP12076181A Granted JPS5822378A (ja) | 1981-08-03 | 1981-08-03 | 自動蒸着制御方法 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPS5822378A (pm) | 
- 
        1981
        
- 1981-08-03 JP JP12076181A patent/JPS5822378A/ja active Granted
 
 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS5822378A (ja) | 1983-02-09 | 
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