JPH02189906A - Soft magnetic film - Google Patents
Soft magnetic filmInfo
- Publication number
- JPH02189906A JPH02189906A JP854689A JP854689A JPH02189906A JP H02189906 A JPH02189906 A JP H02189906A JP 854689 A JP854689 A JP 854689A JP 854689 A JP854689 A JP 854689A JP H02189906 A JPH02189906 A JP H02189906A
- Authority
- JP
- Japan
- Prior art keywords
- flux density
- magnetic flux
- coercive force
- saturation magnetic
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 45
- 239000010409 thin film Substances 0.000 claims description 13
- 230000004907 flux Effects 0.000 abstract description 16
- 239000000203 mixture Substances 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000011162 core material Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910000702 sendust Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 229910001004 magnetic alloy Inorganic materials 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 description 2
- 229910017082 Fe-Si Inorganic materials 0.000 description 1
- 229910017133 Fe—Si Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野］
本発明は磁気ヘッドの材料等として好適な軟磁性薄膜に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a soft magnetic thin film suitable as a material for a magnetic head.
［発明の背景］
例えばオーディオテープレコーダやＶＴＲ（ビデオテー
プレコーダ）等の磁気記録再生装置においては、記録信
号の高密度化や高品質化等が進められており、この高記
録密度化に対応して、磁気記録媒体として磁性粉にＦｅ
、Ｃｏ、ＮＬ等の金属あるいは合金からなる粉末を用い
た。いわゆるメタルテープや９強磁性金属材料を真空薄
膜形成技術によりベースフィルム上に直接被着した。い
わゆる蒸着テープ等が開発され、各分野で実用化されて
いる。[Background of the Invention] For example, in magnetic recording and reproducing devices such as audio tape recorders and VTRs (video tape recorders), the density and quality of recording signals are increasing, and it is necessary to cope with this increase in recording density. Fe is added to magnetic powder as a magnetic recording medium.
, Co, NL, or other metals or alloys were used. A so-called metal tape or 9 ferromagnetic metal material was deposited directly onto the base film by vacuum thin film formation technology. So-called vapor deposition tapes have been developed and put into practical use in various fields.
［従来の技術及び発明が解決しようとする課１ａ１］と
ころで、このような所定の抗磁力を有する磁気記録媒体
の特性を発揮せしめるためには、磁気ヘッドのコア材料
の特性として、高い飽和磁束密度を有するとともに、同
一の磁気ヘッドで再生を行なおうとする場合においては
、高透磁率を併せて有することが要求される。例えば、
従来磁気ヘッドのコア材料として多用されているフェラ
イト材では飽和磁束密度が低く、また、パーマロイでは
耐摩耗性に問題がある。[Issue 1a1 to be solved by the prior art and the invention] By the way, in order to exhibit the characteristics of a magnetic recording medium having a predetermined coercive force, a high saturation magnetic flux density is required as a characteristic of the core material of the magnetic head. In addition to having a high magnetic permeability, if reproduction is to be performed using the same magnetic head, it is also required to have a high magnetic permeability. for example,
Ferrite materials, which have conventionally been widely used as core materials for magnetic heads, have a low saturation magnetic flux density, and permalloy has problems with wear resistance.
従来、かかる諸要求を満たすコア材料として。Conventionally, it has been used as a core material that satisfies these various requirements.
Ｆｅ−Ａｌ１−８ｉ系合金からなるセンダスト合金が好
適であると考えられ、すでに実用に供されている。Sendust alloy consisting of Fe-Al1-8i alloy is considered suitable and has already been put into practical use.
しかしながら、このセンダスト合金のように軟磁気特性
に優れた材料においては、磁歪λＳと結晶磁気異方性Ｋ
が共に零付近であることが望ましく、磁気ヘッドに使用
可能な材料組成はこれら両者の値を考慮して決められる
。したがって、飽和磁束密度もこの組成に対応して一義
的に決まり。However, in materials with excellent soft magnetic properties such as this Sendust alloy, magnetostriction λS and magnetocrystalline anisotropy K
It is desirable that both of these values be around zero, and the material composition that can be used in the magnetic head is determined by taking these two values into consideration. Therefore, the saturation magnetic flux density is also uniquely determined according to this composition.
センダスト合金の場合、１０〜ＩＬｋガウスが限界であ
る。In the case of Sendust alloy, the limit is 10 to ILk Gauss.
そのため、」二層センダスト合金にかわり、高周波数領
域での透磁率の低下が少なく高い飽和磁束密度を有する
Ｃｏ系非晶質磁性合金材料（いわゆるアモルファス磁性
合金材料）も開発されているが、この非晶質磁性合金材
料でも飽和磁束密度は１４にガウス程度である。Therefore, in place of the two-layer Sendust alloy, a Co-based amorphous magnetic alloy material (so-called amorphous magnetic alloy material), which has a high saturation magnetic flux density with little decrease in magnetic permeability in the high frequency range, has been developed. Even in an amorphous magnetic alloy material, the saturation magnetic flux density is on the order of 14 Gauss.
本発明は上記従来の技術の欠点を改良した。高飽和磁束
密度を有する軟磁性薄膜を提供することを目的とする。The present invention has improved the above-mentioned drawbacks of the prior art. An object of the present invention is to provide a soft magnetic thin film having a high saturation magnetic flux density.
［課題を解決するための手段］
本発明によれば、１２〜２０原子％（ａｔ％）の８１と
８原子％以下のＮと残部Ｆｅとを主成分として成る軟磁
性薄膜により、」−記１」的を達成することができる。[Means for Solving the Problem] According to the present invention, a soft magnetic thin film mainly composed of 12 to 20 atomic % (at%) of 81, 8 atomic % or less of N, and the balance Fe, 1” can be achieved.
［好適な実施態様及び作用コ
本発明の軟磁性薄膜は、１２〜２０原子％のＳｉと８原
子％以下のＮと残部Ｆｅとを主成分として成る。８原子
％以下のＮの存在により、飽和磁束密度Ｂｓを所定の値
より低下させることなく保磁力ｌｉｅを低下させること
ができ、また耐食性を向」ニさせ硬度を大きくすること
ができる。Ｎは１例えば０．１原子％あれば有意の効果
を示し、Ｎの好ましい範囲は１〜７原子％である。Ｎが
８原子％を越えるにつれて保磁力１１ｃはかえって所望
の値（３０ｅ）より増大するので、Ｎは８原子％以下に
する。[Preferred Embodiment and Effects] The soft magnetic thin film of the present invention is mainly composed of 12 to 20 atomic % of Si, 8 atomic % or less of N, and the balance Fe. The presence of N at 8 atomic % or less allows the coercive force to be lowered without lowering the saturation magnetic flux density Bs below a predetermined value, and also improves corrosion resistance and increases hardness. N exhibits a significant effect if it is present at 1, for example, 0.1 atom %, and the preferred range of N is 1 to 7 atom %. As the N content exceeds 8 atomic %, the coercive force 11c actually increases beyond the desired value (30e), so the N content is set to 8 atomic % or less.
Ｓｉが１２〜２０原子％の場合は前記特定量のＮの添加
により飽和磁束密度Ｂｓを所定の値より低下させること
なく保磁力Ｈｅを減少させることができる。しかし、前
記特定量のＮが存在する場合であっても、Ｓｉが１２原
子％未満になるにつれて又は２０原子％を越えるにつれ
て保磁力１１ｃが上昇（軟磁性の低下）して３ ０ｅを
越えてしまうので。When Si is 12 to 20 atomic %, the coercive force He can be reduced by adding the specified amount of N without lowering the saturation magnetic flux density Bs below a predetermined value. However, even when the specified amount of N is present, as Si becomes less than 12 atomic % or exceeds 20 atomic %, the coercive force 11c increases (decreases soft magnetism) and exceeds 30e. I'll put it away.
Ｓｉは１２〜２０原子％にする。Ｓｉの好ましい範囲は
１２〜１７原子％である。The content of Si is 12 to 20 atomic %. The preferred range of Si is 12 to 17 at%.
本発明の軟磁性薄膜は２例えばＲＦスパッタ法等の気相
析着法により製膜しこれを２００〜５００°Ｃ程度で熱
処理して製造することができる。前記熱処理は１例えば
、１時間程度で行なうことができる。The soft magnetic thin film of the present invention can be produced by forming the film by a vapor phase deposition method such as RF sputtering, and then heat-treating the film at about 200 to 500°C. The heat treatment can be performed for about 1 hour, for example.
前記熱処理を２００°Ｃ未満で行なうと、軟磁性を得ら
れないことが多いので好ましくなく、逆に。If the heat treatment is performed at a temperature lower than 200°C, it is not preferable because soft magnetic properties are often not obtained.
５００℃を越えた温度で行なうと軟磁性はかえって低下
することが多い。好ましいのは凡そ、３００〜４００℃
の範囲である。If it is carried out at a temperature exceeding 500°C, soft magnetism often deteriorates on the contrary. Preferable temperature is approximately 300-400℃
is within the range of
［実施例］
Ｆｅ−Ｓｉ合金のターゲットを用い雰囲気ガスとしてＡ
ｒとＮ２を用いてＲＦスパッタ法により、サファイア基
板上に種々の組成の薄膜を製膜した。膜組成の変更は、
前記ターゲットのＳｉ含有量及び雰囲気ガス中のＮ２分
圧を変化させることにより行なった。前記スパッタ条件
は、陰極電力２００Ｗ 、全ガス（Ａ ｒ 十Ｎ ２
）圧２．０Ｐａであった。前記薄膜を３５０℃１時間で
熱処理して本発明の実施例１〜６の軟磁性薄膜を得てＢ
−Ｉ（カーブ測定を行なった。Ｂ−Ｈカーブは、測定磁
界１ｍ＝ ２５（Ｏｅ）、周波数５０Ｈｚで測定し保磁
力１１ｃ及び磁界２５０ｅをかけた時の磁束密度Ｂ２５
を求めた。これらの結果を第１表に示す。実施例１〜６
の軟磁性薄膜は、 Ｂ ２５＞ １４ＫＧであり、か
ツＨｃ＜ ３ ００である。また、比較例として、Ｓｔ
とＮの双方、又はどちらか一方を含まないもの（比較例
１〜７）のＨｅ及びＢ２．を前記と同様にして求めた。[Example] A Fe-Si alloy target was used as the atmospheric gas.
Thin films of various compositions were formed on sapphire substrates by RF sputtering using r and N2. Changing the film composition is
This was carried out by changing the Si content of the target and the N2 partial pressure in the atmospheric gas. The sputtering conditions are cathode power 200W, total gas (A r 1 N 2
) The pressure was 2.0 Pa. The thin film was heat-treated at 350°C for 1 hour to obtain the soft magnetic thin films of Examples 1 to 6 of the present invention.
-I (Curve measurement was performed. The B-H curve is the magnetic flux density B25 when measured with a magnetic field of 1 m = 25 (Oe) and a frequency of 50 Hz, and a coercive force of 11 c and a magnetic field of 250 e are applied.
I asked for These results are shown in Table 1. Examples 1-6
The soft magnetic thin film has B25>14KG and Hc<300. In addition, as a comparative example, St.
and N (Comparative Examples 1 to 7) containing neither He nor B2. was determined in the same manner as above.
これらの結果を第２表に示す。第１〜２表によれば、Ｓ
ｉ及びＮをＦｅに特定量添加することにより、著しい軟
磁性の向上（Ｈｅの低下）かあるということがわかる。These results are shown in Table 2. According to Tables 1 and 2, S
It can be seen that by adding specific amounts of i and N to Fe, there is a significant improvement in soft magnetism (reduction in He).
（以下余白）
［発明の効果］
本発明の軟磁性薄膜は、 １２〜２０原子％のＳｉと８
原子％以下のＮと残部Ｆｅとを主成分として成るので、
高飽和磁束密度Ｂｓ （例えばＢ２５〉１４ＫＧ）及び
低保磁力Ｈｅ （Ｈｅ＜ ３ ０ｅ）を得ることができ
るとともに高耐食性及び高硬度を有することができる。(The following is a blank space) [Effects of the invention] The soft magnetic thin film of the present invention contains 12 to 20 atomic % of Si and 8
Since the main components are less than atomic % of N and the balance Fe,
It is possible to obtain a high saturation magnetic flux density Bs (for example, B25>14KG) and a low coercive force He (He<30e), and also to have high corrosion resistance and high hardness.
前記磁束密度は、Ｆｅ−ＡＪ−８Ｌ系及びＦｅ−Ｇａ−
８ｉ−Ｒｕ系軟磁性材料の飽和磁束密度よりも大きい。The magnetic flux density is Fe-AJ-8L system and Fe-Ga-
It is larger than the saturation magnetic flux density of the 8i-Ru soft magnetic material.
したがって、この軟磁性薄膜を例えば磁気ヘッドのコア
材料として用いることにより、磁気記録媒体の高抗磁力
化に充分対処することができ、高品質化や高記録密度化
を図ることが可能となる。Therefore, by using this soft magnetic thin film as a core material of a magnetic head, for example, it is possible to sufficiently cope with the increase in coercive force of a magnetic recording medium, and it becomes possible to achieve higher quality and higher recording density.
Claims (1)
とを主成分として成る軟磁性薄膜。12 to 20 atomic% Si, 8 atomic% or less N, and balance Fe
A soft magnetic thin film consisting mainly of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP854689A JPH02189906A (en) | 1989-01-19 | 1989-01-19 | Soft magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP854689A JPH02189906A (en) | 1989-01-19 | 1989-01-19 | Soft magnetic film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02189906A true JPH02189906A (en) | 1990-07-25 |
Family
ID=11696137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP854689A Pending JPH02189906A (en) | 1989-01-19 | 1989-01-19 | Soft magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02189906A (en) |
-
1989
- 1989-01-19 JP JP854689A patent/JPH02189906A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4748000A (en) | Soft magnetic thin film | |
| JP2963003B2 (en) | Soft magnetic alloy thin film and method of manufacturing the same | |
| JP2698814B2 (en) | Soft magnetic thin film | |
| JPS6129105A (en) | Magnetic alloy thin film | |
| JPH02189906A (en) | Soft magnetic film | |
| JP2698813B2 (en) | Soft magnetic thin film | |
| JP3232592B2 (en) | Magnetic head | |
| JP3796137B2 (en) | Soft magnetic thin film and thin film magnetic head using the same | |
| JP3019400B2 (en) | Amorphous soft magnetic material | |
| JPH02174205A (en) | Soft magnetic thin film | |
| JP2727274B2 (en) | Soft magnetic thin film | |
| KR0136419B1 (en) | Soft magnetic alloy thin film substrate | |
| KR970003334B1 (en) | Soft magnetic alloy material | |
| JP2979557B2 (en) | Soft magnetic film | |
| JP2522284B2 (en) | Soft magnetic thin film | |
| JP3279591B2 (en) | Ferromagnetic thin film and manufacturing method thereof | |
| JPS63146417A (en) | Soft magnetic thin film | |
| JP2784105B2 (en) | Soft magnetic thin film | |
| JP2771664B2 (en) | Soft magnetic alloy film | |
| JP3796136B2 (en) | Soft magnetic thin film and thin film magnetic head using the same | |
| JPS633406A (en) | Magnetically soft thin film | |
| JPH0789527B2 (en) | Crystalline soft magnetic thin film | |
| JPS5927373B2 (en) | Fe↓-Co magnetic material | |
| JPS61234510A (en) | Soft magnetic thin film | |
| JPS62104107A (en) | Soft magnetic thin film |